Abstract: A sheet stretching device is provided which is capable of preventing a sheet from being slacked, with the sheet stretched over a frame, by possibly preventing unnecessary motions of a retaining member for fixedly drawing the sheet into the frame. A retaining groove (2a) is formed along the length direction of the frame on the front surface side of a frame (2). Retaining plates (4), with a rectangular cross section, to be fitted into the retaining groove are attached to the peripheral edge portion of a sheet (3). The retaining plate is formed of an elastic material and substantially equal in thickness to the width of the retaining groove. A plurality of projections (4a) at certain intervals in the depth direction of the retaining groove are formed on at least one of the inner wall surface of the retaining groove and the side surface of the retaining plate.

Abstract: A sheet stretching device is provided which is capable of preventing a sheet from being slacked, with the sheet stretched over a frame, by possibly preventing unnecessary motions of a retaining member for fixedly drawing the sheet into the frame. A retaining groove (2a) is formed along the length direction of the frame on the front surface side of a frame (2). Retaining plates (4), with a rectangular cross section, to be fitted into the retaining groove are attached to the peripheral edge portion of a sheet (3). The retaining plate is formed of an elastic material and substantially equal in thickness to the width of the retaining groove. A plurality of projections (4a) at certain intervals in the depth direction of the retaining groove are formed on at least one of the inner wall surface of the retaining groove and the side surface of the retaining plate.

Abstract: A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the formula (1) and a repeating unit of the general formula (2); and a fluorine-containing solvent. In the general formula (2), R1 represents a C1-C15 straight, C3-C15 branched or C3-C15 cyclic hydrocarbon group in which at least one hydrogen atom may be replaced by a fluorine atom or chlorine atom and which may have a hydroxy group. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element as the composition can form a fluororesin film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.

Abstract: A film-forming composition according to the present invention include fluororesin having a repeating unit of the general formula (1); and a fluorine-containing solvent. In the general formula (1), R1 each independently represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; and R2 each independently represents C1-C15 straight, C3-C15 branched or C3-C15cyclic fluorine-containing hydrocarbon gr which any hydrogen atom may be replaced by a fluorine atom with the proviso that the repeating unit contains at least one fluorine atom. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element because the composition can form a film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.

Abstract: A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the general formula (1); and a fluorine-containing solvent. In the general formula (1), R1 each independently represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; and R2 each independently represents a C1-C15 straight, C3-C15 branched or C3-C15 cyclic fluorine-containing hydrocarbon group in which any hydrogen atom may be replaced by a fluorine atom with the proviso that the repeating unit contains at least one fluorine atom; and This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element because the composition can form a film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.

Abstract: A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the formula (1) and a repeating unit of the general formula (2); and a fluorine-containing solvent. In the general formula (2), R1 represents a C1-C15 straight, C3-C15 branched or C3-C15 cyclic hydrocarbon group in which at least one hydrogen atom may be replaced by a fluorine atom or chlorine atom and which may have a hydroxy group. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element as the composition can form a fluororesin film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.