Patents by Inventor Fumitsugu Nakayama

Fumitsugu Nakayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dry etching device
    Patent number: 6491784
    Abstract: It is an object of the present invention to provide an upper electrode which is prevented from being contaminated with an impurity, has a sufficient adhesive strength between the pedestal and electrode plate of silicon, secures high-precision parallelism with the lower electrode, and hence improves the etching characteristics and silicon wafer yield. It is another object of the present invention to provide a dry etching device equipped with the upper electrode. The present invention provides an upper electrode for dry etching devices, comprising an electrode plate of silicon which is supported by a pedestal, wherein (a) the pedestal is made of graphite, and (b) the electrode plate of silicon is joined to the pedestal by an organic adhesive containing a filler having a Young's modulus of 6×109 to 68×109N/m2.
    Type: Grant
    Filed: July 9, 2001
    Date of Patent: December 10, 2002
    Assignee: Nisshinbo Industries, Inc.
    Inventors: Akira Yamaguchi, Fumitsugu Nakayama
  • Dry etching device
    Publication number: 20020043335
    Abstract: It is an object of the present invention to provide an upper electrode which is prevented from being contaminated with an impurity, has a sufficient adhesive strength between the pedestal and electrode plate of silicon, secures high-precision parallelism with the lower electrode, and hence improves the etching characteristics and silicon wafer yield. It is another object of the present invention to provide a dry etching device equipped with the upper electrode. The present invention provides an upper electrode for dry etching devices, comprising an electrode plate of silicon which is supported by a pedestal, wherein (a) the pedestal is made of graphite, and (b) the electrode plate of silicon is joined to the pedestal by an organic adhesive containing a filler having a Young's modulus of 6×109 to 68×109N/m2.
    Type: Application
    Filed: July 9, 2001
    Publication date: April 18, 2002
    Inventors: Akira Yamaguchi, Fumitsugu Nakayama