Patents by Inventor Fumitsuu FUKUYO

Fumitsuu FUKUYO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100203678
    Abstract: A semiconductor substrate cutting method which can efficiently cut a semiconductor substrate having a front face formed with a functional device together with a die bonding resin layer is provided. A wafer 11 having a front face 3 formed with a functional device 15 is irradiated with laser light L while positioning a light-converging point P within the wafer 11 with the rear face 17 of the wafer 11 acting as a laser light incident face, so as to generate multiphoton absorption, thereby forming a starting point region for cutting 8 due to a molten processed region 13 within the wafer 11 along a line along which the substrate should be cut 5. Consequently, a fracture can be generated from the starting point region for cutting 8 naturally or with a relatively small force, so as to reach the front face 3 and rear face 17.
    Type: Application
    Filed: October 21, 2009
    Publication date: August 12, 2010
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Kenshi FUKUMITSU, Fumitsuu FUKUYO, Naoki UCHIYAMA, Ryuji SUGIURA, Kazuhiro ATSUMI