Patents by Inventor Fung-Hsu Wu

Fung-Hsu Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150153013
    Abstract: The invention is related to a light adjusting film. The light adjusting film includes a transparent substrate, a plurality of micro lens structures on a light incident surface of the transparent substrate and a plurality of micro triangular prism structures on a light emitting surface of the transparent substrate. The curvature of the micro lens structures is in a range of 50 ?m?1 to 500 ?m?1, and the position of each of micro lens structures is corresponding to that of one or more of the micro triangular prism structures. By designing of the micro lens structures together with the triangular prism structures, sunlight can be used effectively so as to achieve energy saving performance.
    Type: Application
    Filed: November 6, 2014
    Publication date: June 4, 2015
    Inventors: Fung-Hsu WU, Meng-Chieh CHOU
  • Patent number: 8917363
    Abstract: An anti-peeping privacy device is provided, including a polarizing element, a liquid crystal member and a diffusing element. The liquid crystal member is disposed on the polarizing element. The diffusing element is disposed on the liquid crystal member, comprising a transparent layer and a liquid crystal layer. The transparent layer having a refractive index and adjacent to the liquid crystal member includes a plurality of concave-convex stripe microstructures on the top side thereof, wherein the plurality of concave-convex stripe microstructure is arranged in a direction substantially orthogonal to the polarized light. The liquid crystal layer disposed on the concave-convex stripe microstructures of the transparent resin layer.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: December 23, 2014
    Assignee: BenQ Materials Corporation
    Inventor: Fung-Hsu Wu
  • Patent number: 8887396
    Abstract: A method for producing a roller used for manufacturing a retarder film is provided. The method includes providing the roller having a roller surface; providing an embossing tool having an embossing end and embossing the roller surface with the embossing tool. The embossing end has a plurality of first microgroove structures and second microgroove structures. The first and second micro-groove structures are both parallel structures. Each one of the first microgroove structures is symmetric to each one of the second microgroove structures with respect to a symmetry line. An included angle of the symmetry line between each first micro-groove structure and that between each second micro-groove structure are 45±8 degrees.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: November 18, 2014
    Assignee: Benq Materials Corporation
    Inventors: Lung-Hai Wu, Cyun-Tai Hong, Fung-Hsu Wu
  • Patent number: 8867001
    Abstract: A patterned retardation film including a base substrate, a patterned resin layer and a liquid crystal layer is provided. The patterned resin layer having plurality of first areas and a plurality of second areas is disposed on the base substrate. The combination of the first and second areas is a grating-like stripe structure. The patterned resin layer includes an aligning micron structure. The aligning micron structure includes a plurality of first sub micron grooves and a plurality of second sub micron grooves respectively located in the first areas and the second areas. The liquid crystal layer is disposed on the patterned resin layer and aligned with the aligning micron structure. The liquid crystal layer disposed above the first areas provides a first phase retardation. The liquid crystal layer disposed above the second areas provides a second phase retardation.
    Type: Grant
    Filed: October 26, 2011
    Date of Patent: October 21, 2014
    Assignee: Benq Materials Corp.
    Inventors: Fung-Hsu Wu, Lung-Hai Wu
  • Publication number: 20140268325
    Abstract: Disclosed herein is a patterned retarder film for 3D display. The patterned retarder film includes a substrate, a patterned retarder layer and a micro-louver structure. The patterned retarder layer on the surface of the substrate has a plurality of first retardation micro structures and a plurality of second retardation micro structures and can split the image into two phase of images to form stereo image; the micro-louver structure is disposed between the substrate and the patterned retarder layer at the boundary of the first retardation micro structures and the second retardation micro structures. The micro-louver structure can decrease the crosstalk of the 3D display at vertical viewing angle and does not decrease the brightness of the 3D display at normal viewing angle.
    Type: Application
    Filed: March 18, 2013
    Publication date: September 18, 2014
    Applicant: BENQ MATERIALS CORPORATION
    Inventor: Fung-Hsu WU
  • Publication number: 20140240627
    Abstract: An anti-peeping privacy device is provided, including a polarizing element, a liquid crystal member and a diffusing element. The liquid crystal member is disposed on the polarizing element. The diffusing element is disposed on the liquid crystal member, comprising a transparent layer and a liquid crystal layer. The transparent layer having a refractive index and adjacent to the liquid crystal member includes a plurality of concave-convex stripe microstructures on the top side thereof, wherein the plurality of concave-convex stripe microstructure is arranged in a direction substantially orthogonal to the polarized light. The liquid crystal layer disposed on the concave-convex stripe microstructures of the transparent resin layer.
    Type: Application
    Filed: March 18, 2013
    Publication date: August 28, 2014
    Applicant: BENQ MATERIALS CORPORATION
    Inventor: Fung-Hsu WU
  • Patent number: 8780318
    Abstract: A patterned phase retardation film is disclosed, which includes substrate, a phase retardation layer on the substrate comprising a plurality of first regions of liquid crystal materials and a plurality of second regions of curable resin, wherein the first regions and the second regions are in a grating stripe structure which is parallel and interleaved with each other the top part of the second regions is formed with at least one inclined plane; and a planarization layer for planarizing the phase retardation layer; wherein the first regions provide a first phase retardation and second regions provide a second phase retardation, the first phase retardation and the second phase retardation have a phase difference of 180°. The method for manufacturing the patterned phase retardation film is also disclosed.
    Type: Grant
    Filed: May 21, 2012
    Date of Patent: July 15, 2014
    Assignee: BenQ Materials Corporation
    Inventors: Lung-Hai Wu, Chen-Kuan Kuo, Fung-Hsu Wu, Cyun-Tai Hong, Chih-Haw Wang
  • Patent number: 8553187
    Abstract: A patterned retarder film with a plurality of first retardation regions and a plurality of second retardation regions and a method for manufacturing the same are provided. The method includes providing a base film; forming an alignment layer on a first surface of the base film; coating a liquid crystal material on the alignment layer as a liquid crystal layer; aligning the liquid crystal layer with the alignment layer; embossing the liquid crystal layer with a predetermined pattern to form a patterned layer with a plurality of first and second retardation regions. The structure of the first and second retardation regions are grating-like stripe structure and parallel to each other and the structure of the second retardation regions are grooving-like stripe structure and interleaved with each other. The patterned liquid crystal layer is cured. The phase retardation of the first and second retardation regions is different by 180°.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: October 8, 2013
    Assignee: BenQ Materials Corp.
    Inventor: Fung-Hsu Wu
  • Patent number: 8520175
    Abstract: A patterned retarder film comprises a first substrate, a pattern configuration, an alignment layer formed on the pattern configuration, and a liquid crystal layer disposed on the alignment layer. The pattern configuration comprises a plurality of first regions and a plurality of second regions, wherein the first regions are grating relief structure and interleaved with the second regions. A liquid crystal layer is coated on the alignment layer to cover the first regions and the second regions of the pattern configuration to a plane with a determined thickness on the surface of the first regions. The first phase retardation of the liquid crystal layer on the first regions and the second phase retardation of the liquid crystal layer on the second regions are different by 180°. The method for manufacturing the same is disclosed.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: August 27, 2013
    Assignee: Benq Materials Corp.
    Inventors: Kuan-Hao Huang, Fung-Hsu Wu
  • Patent number: 8520174
    Abstract: A patterned retarder film and a method for manufacturing the same are provided. A patterned retarder film with a micro-structure comprises a first substrate, a phase retardation layer on the first substrate comprising a plurality of first retardation regions of liquid crystal materials and a plurality of second retardation regions of curable resin, wherein the structures of the first retardation regions and the second retardation regions are grating-like stripe structures and parallelly interleaved with each other and the first retardation regions provide a first phase retardation and the second retardation regions provide a second phase retardation; and a second substrate laminated on the phase retardation layer; wherein the first phase retardation and the second phase retardation are different by 180°.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: August 27, 2013
    Assignee: Benq Materials Corp.
    Inventors: Kuan-Hao Huang, Fung-Hsu Wu
  • Publication number: 20130107194
    Abstract: A patterned phase retardation film is disclosed, which includes substrate, a phase retardation layer on the substrate comprising a plurality of first regions of liquid crystal materials and a plurality of second regions of curable resin, wherein the first regions and the second regions are in a grating stripe structure which is parallel and interleaved with each other the top part of the second regions is formed with at least one inclined plane; and a planarization layer for planarizing the phase retardation layer; wherein the first regions provide a first phase retardation and second regions provide a second phase retardation, the first phase retardation and the second phase retardation have a phase difference of 180°. The method for manufacturing the patterned phase retardation film is also disclosed.
    Type: Application
    Filed: May 21, 2012
    Publication date: May 2, 2013
    Applicant: BENQ MATERIALS CORPORATION
    Inventors: Lung-Hai WU, Chen-Kuan KUO, Fung-Hsu WU, Cyun-Tai HONG, Chih-Haw WANG
  • Publication number: 20130025342
    Abstract: A method for producing a roller used for manufacturing a retarder film is provided. The method includes providing a roller having a roller axis and a roller surface; providing an embossing tool having an embossing end; rotating the roller with respect to the roller axis; embossing the roller surface with the embossing tool with a first depth in a first predetermined distance and a second depth in a second predetermined distance; and removing the embossing from the roller surface. The embossing end has a plurality of parallel microgroove structures. The embossing tool embosses the roller surface to generate a first embossing area having a plurality of first embossing patterns and a second embossing area having a plurality of second embossing patterns.
    Type: Application
    Filed: July 25, 2012
    Publication date: January 31, 2013
    Applicant: BENQ MATERIALS CORPORATION
    Inventor: Fung-Hsu WU
  • Publication number: 20130014628
    Abstract: A method for producing a roller used for manufacturing a retarder film is provided. The method includes providing the roller having a roller surface; providing an embossing tool having an embossing end and embossing the roller surface with the embossing tool. The embossing end has a plurality of first microgroove structures and second microgroove structures. The first and second micro-groove structures are both parallel structures. Each one of the first microgroove structures is symmetric to each one of the second microgroove structures with respect to a symmetry line. An included angle of the symmetry line between each first micro-groove structure and that between each second micro-groove structure are 45±8 degrees.
    Type: Application
    Filed: May 30, 2012
    Publication date: January 17, 2013
    Applicant: BENQ MATERIALS CORPORATION
    Inventors: Lung-Hai WU, Cyun-Tai HONG, Fung-Hsu WU
  • Publication number: 20130010243
    Abstract: A phase retardation film, a manufacturing method thereof and a manufacturing method of a roller used in the manufacturing method are provided. The phase retardation film includes a base film, a patterned resin layer and a phase retardation layer. The patterned resin layer having a plurality of first regions and a plurality of second regions is formed on the base film. The patterned resin layer includes a submicro-scratch structure. The angle between the direction of the submicro-scratch structure and the extending direction of the first and second regions is 45°. A liquid crystal material is disposed on the submicro-scratch structure of the patterned resin layer to form the phase retardation layer. The phase difference between a first phase retardation and a second phase retardation is 180°.
    Type: Application
    Filed: May 29, 2012
    Publication date: January 10, 2013
    Applicant: BENQ MATERIALS CORPORATION
    Inventors: Fung-Hsu WU, Lung-Hai WU
  • Publication number: 20120311861
    Abstract: A manufacturing method of a roller used for manufacturing a patterned retardation film is provided. The manufacturing method includes the following steps. A roller having a rotational axis and a roller surface is provided. An engraving device having an engraving end is provided. The engraving end has a plurality of sub-micron slots which are constructed in parallel with each other. The engraving device engraves the roller surface with a first depth to form a plurality of first sub-micron grooves. The engraving device engraves the roller surface with a second depth to form a plurality of second sub-micron grooves.
    Type: Application
    Filed: December 8, 2011
    Publication date: December 13, 2012
    Applicant: BENQ MATERIALS CORP.
    Inventors: Fung-Hsu Wu, Lung-Hai Wu
  • Publication number: 20120314181
    Abstract: A patterned retardation film including a base substrate, a patterned resin layer and a liquid crystal layer is provided. The patterned resin layer having plurality of first areas and a plurality of second areas is disposed on the base substrate. The combination of the first and second areas is a grating-like stripe structure. The patterned resin layer includes an aligning micron structure. The aligning micron structure includes a plurality of first sub micron grooves and a plurality of second sub micron grooves respectively located in the first areas and the second areas. The liquid crystal layer is disposed on the patterned resin layer and aligned with the aligning micron structure. The liquid crystal layer disposed above the first areas provides a first phase retardation. The liquid crystal layer disposed above the second areas provides a second phase retardation.
    Type: Application
    Filed: October 26, 2011
    Publication date: December 13, 2012
    Applicant: BENQ MATERIALS CORP.
    Inventors: Fung-Hsu Wu, Lung-Hai Wu
  • Patent number: 8258461
    Abstract: An apparatus of generating an optical tweezers with momentum and method thereof and an optical tweezers photo-image for guiding particles are provided. The apparatus generates at least one optical tweezers on an examined object that carries at least one particle. The apparatus includes a laser source, a diffractive optical element and a convergent lens. The laser beam from the laser source passes through the diffractive optical element to produce a diffractive pattern. The laser beam is then received by the convergent lens and then to be focused on a plane of the examined object. The optic axis of the convergent lens is substantially not perpendicular to the plane of the examined object, so that the laser beam is projected onto the plane of the examined object in a skewed manner for providing a lateral momentum to move the particle.
    Type: Grant
    Filed: July 30, 2008
    Date of Patent: September 4, 2012
    Assignee: Raydium Semiconductor Corporation
    Inventors: Long Hsu, Cheng-Hsien Liu, Sheng-Yang Tseng, William Wang, Chung-Cheng Chou, Fung-Hsu Wu, Chen Peng, Ta-Yuan Lee
  • Publication number: 20120133647
    Abstract: A three-dimensional image display includes a liquid crystal display panel, a lenticular layer, and a backlight module, wherein the lenticular layer is disposed on the liquid crystal display panel to separate images generated by the liquid crystal display panel. The backlight module includes a light emitting device and at least one brightness enhancing film. The liquid crystal display panel accepts light from the backlight module and generates a plurality of images. Prisms and lenses are disposed on the brightness enhancing film and the lenticular layer, respectively, wherein orientations of prisms and lenses cross each other. The three-dimensional image display makes the traveling direction of light more perpendicular to the surface of liquid crystal display panel in order to reduce the crosstalk between adjacent images.
    Type: Application
    Filed: October 27, 2011
    Publication date: May 31, 2012
    Inventors: Fung-Hsu WU, Hsin Han HSU
  • Publication number: 20110317262
    Abstract: An optical film used in a display panel is provided. The display panel has a number of pixels. The optical film includes a condenser lens array layer and a prism array layer. The condenser lens array layer, disposed in front of the pixels, includes a number of condenser lenses and at least has a first portion and a second portion, wherein the first portion and the second portion do not overlap with each other. The prism array layer at least includes a first prism sub-array having a number of first prisms. The light passing through the condenser lenses in the first portion of the condenser lens array layer is deflected to a first direction by the first prisms. The light passing through the condenser lenses in the second portion of the condenser lens array layer travels along a second direction. The first direction is different from the second direction.
    Type: Application
    Filed: September 29, 2010
    Publication date: December 29, 2011
    Applicant: BenQ MATERIALS CORP.
    Inventors: Hsin-Han Hsu, Fung-Hsu Wu
  • Publication number: 20110292328
    Abstract: A patterned retarder film with a plurality of first retardation regions and a plurality of second retardation regions and a method for manufacturing the same are provided. The method includes providing a base film; forming an alignment layer on a first surface of the base film; coating a liquid crystal material on the alignment layer as a liquid crystal layer; aligning the liquid crystal layer with the alignment layer; embossing the liquid crystal layer with a predetermined pattern to form a patterned layer with a plurality of first and second retardation regions. The structure of the first and second retardation regions are grating-like stripe structure and parallel to each other and the structure of the second retardation regions are grooving-like stripe structure and interleaved with each other. The patterned liquid crystal layer is cured. The phase retardation of the first and second retardation regions is different by 180°.
    Type: Application
    Filed: December 20, 2010
    Publication date: December 1, 2011
    Applicant: BENQ MATERIALS CORP.
    Inventor: Fung-Hsu Wu