Patents by Inventor Fusayuki Takashita

Fusayuki Takashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090290109
    Abstract: A photoalignment material includes an alignment polymer, a photoalignment additive including a compound represented by the following Chemical Formula 1 and an organic solvent. In Chemical Formula 1, R1 represents a cyclic compound. A and B independently represent a single bond or —(CnH2n)—. “n” represents an integer in a range of 1 to 12. Each —CH2— of A and/or B may be replaced with R3 represents an alkyl group having 1 to 12 carbon atoms, and each —CH2— of A and/or B may be replaced with —O—. R4 represents In Chemical Formula 1, each hydrogen atom excluding hydrogen atoms of R4 may be replaced with chlorine (Cl) or fluorine (F). Thus, an alignment layer having an orientation may be formed without an alignment polymer having a photoreactive portion, and the density of the alignment layer may be increased.
    Type: Application
    Filed: March 20, 2009
    Publication date: November 26, 2009
    Inventors: Jun-Woo LEE, Fusayuki Takashita, Baek-Kyun Jeon, Tae-Sung Jung, Hoi-Lim Kim, Jeong-Hye Choi, Sung-Yi Kim