Patents by Inventor Fu-Shun HSU

Fu-Shun HSU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOSENSITIVE POLYIMIDE AND NEGATIVE TYPE PHOTORESIST COMPOSITION CONTAINING THE SAME
    Publication number: 20140178823
    Abstract: A photosensitive polyimide and negative type photo-resist composition containing the same are provided. The photosensitive polyimide is represented by formula (I): wherein X1 and X3 are the same or different organic functional groups having four covalent bonds; X2 and X4 are the same or different organic functional groups having two covalent bonds, and X2 contains functional groups of OH or COOH and any one selected from the functional groups below: wherein R is H or CH3, p and q are integers of 1 to 20, and m and n in formula (I) are numbers of repeat units.
    Type: Application
    Filed: June 3, 2013
    Publication date: June 26, 2014
    Inventors: Chen-Lung LIN, Fu-Shun HSU, Kuo-Chan CHIOU