Abstract: The present disclosure discloses a time service and positioning network system for an underground chain-shaped large space in a coal mine. The system adopts a base station-level network internal time synchronization method which takes an optical fiber time service as a main part and takes a satellite time service as an auxiliary part to construct a time service and positioning network system with an unified time within the ad-hoc network base stations, based on the ad-hoc network base stations linearly arranged in the underground chain-shaped large space in the coal mine. Through the network construction, the network stabilization and the network application, the system unifies the time reference of the base station-level network and improves the positioning accuracy of the network application by utilization of the base station-level network internal time synchronization method.

Abstract: The present disclosure discloses a time service and positioning network system for an underground chain-shaped large space in a coal mine. The system adopts a base station-level network internal time synchronization method which takes an optical fiber time service as a main part and takes a satellite time service as an auxiliary part to construct a time service and positioning network system with an unified time within the ad-hoc network base stations, based on the ad-hoc network base stations linearly arranged in the underground chain-shaped large space in the coal mine. Through the network construction, the network stabilization and the network application, the system unifies the time reference of the base station-level network and improves the positioning accuracy of the network application by utilization of the base station-level network internal time synchronization method.

Abstract: A transparent wear-resistant film layer, a plastic substrate modification method, and a product are provided, the plastic substrate modification method includes the following steps: bombarding with at least one plastic substrate positioned in a chamber of a PECVD coating device with plasma to clean and activate the at least one plastic substrate, and forming a transparent wear-resistant film layer on the at least one surface of the activated plastic substrate by a plasma enhanced chemical vapor deposition using a siloxane monomer as a reaction raw material.

Abstract: A super-hydrophobic film layer, a preparation method thereof, and a product thereof are provided, the preparation method includes using a siloxane monomer as a reaction material to form a super-hydrophobic film layer on a surface of a substrate by a plasma enhanced chemical vapor deposition.

Abstract: Provided in the present disclosure are a coating apparatus and an application thereof, being used for coating on the surface of a substrate, the coating apparatus comprises a feeding device and a device main body, wherein the feeding device is configured to communicate with the apparatus device main body, the feeding device comprises a gas feeding device and a liquid feeding device, the gas feeding device is in communication with the device main body and is used for transmitting a gaseous gas raw material to the device main body, the liquid feeding device is in communication with the device main body and is used for transmitting a liquid gasified gas raw material to the device main body, the device main body is used for preparing a thin film based on the gas raw material, and the same coating apparatus can be used for preparing various thin films or film layers with different properties or of different types on the surface of the substrate.

Abstract: The present disclosure provides an electrode support, a supporting mechanism, a support, a film coating apparatus, and an application. The electrode support is applied to the film coating apparatus. The film coating apparatus allows coating of at least one to-be-coated workpiece. The film coating apparatus comprises a reaction chamber and a pulse power supply; the pulse power supply is used for providing a pulse electric field in the reaction chamber. The electrode support comprises support members arranged in multiple layers; the support member of each layer is separately retained at a preset spacing; at least one layer of the support member is conductively connected to the pulse power supply to serve as a negative electrode of the pulse power supply. The electrode support can uniformly load the to-be-coated workpiece and can be used as an electrode, and wiring between the electrode support and an external power supply is simple.