Patents by Inventor Fu-Yuan Xiao

Fu-Yuan Xiao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7435663
    Abstract: Simple but practical methods to dice a CMOS-MEMS multi-project wafer are proposed. On this wafer, micromachined microstructures have been fabricated and released. In a method, a photoresist is spun on the full wafer surface, and this photoresist is thick enough to cover all cavities and structures on the wafer, such that the photoresist will protect the released structures free from the chipping, vibrations, and damages in the diamond blade dicing process. In another method, a laser dicing system is utilized to scribe the multi-project wafer placed on a platform, and by precisely controlling the platform moving-track, the dicing path can be programmed to any required shape and region, even it is not straight. In addition, the wafer backside is mounted on a blue-tape at the beginning to enhance the process reliability.
    Type: Grant
    Filed: November 10, 2005
    Date of Patent: October 14, 2008
    Assignee: National Applied Research Laboratories National Chip International Center
    Inventors: Sheng-Hsiang Tseng, Fu-Yuan Xiao, Ying-Zong Juang, Chin-Fong Chiu
  • Patent number: 7435612
    Abstract: A fully CMOS compatible MEMS multi-project wafer process comprises coating a layer of thick photoresist on a wafer surface, patterning the photoresist to define a micromachining region, and performing a micromachining in the micromachining region to form suspended microstructures.
    Type: Grant
    Filed: November 10, 2005
    Date of Patent: October 14, 2008
    Assignee: National Applied Research Laboratories National Chip Implementation Center
    Inventors: Fu-Yuan Xiao, Ying-Zong Juang, Chin-Fong Chiu
  • Publication number: 20060105543
    Abstract: A fully CMOS compatible MEMS multi-project wafer process comprises coating a layer of thick photoresist on a wafer surface, patterning the photoresist to define a micromachining region, and performing a micromachining in the micromachining region to form suspended microstructures.
    Type: Application
    Filed: November 10, 2005
    Publication date: May 18, 2006
    Inventors: Fu-Yuan Xiao, Ying-Zong Juang, Chin-Fong Chiu
  • Publication number: 20060105545
    Abstract: Simple but practical methods to dice a CMOS-MEMS multi-project wafer are proposed. On this wafer, micromachined microstructures have been fabricated and released. In a method, a photoresist is spun on the full wafer surface, and this photoresist is thick enough to cover all cavities and structures on the wafer, such that the photoresist will protect the released structures free from the chipping, vibrations, and damages in the diamond blade dicing process. In another method, a laser dicing system is utilized to scribe the multi-project wafer placed on a platform, and by precisely controlling the platform moving-track, the dicing path can be programmed to any required shape and region, even it is not straight. In addition, the wafer backside is mounted on a blue-tape at the beginning to enhance the process reliability.
    Type: Application
    Filed: November 10, 2005
    Publication date: May 18, 2006
    Inventors: Sheng-Hsiang Tseng, Fu-Yuan Xiao, Ying-Zong Juang, Chin-Fong Chiu