Patents by Inventor G. Hugo Urbina

G. Hugo Urbina has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for semiconductor planarization
    Patent number: 6135856
    Abstract: The disclosed polishing apparatus includes a lower pad and an upper pad. The upper pad is disposed over the lower pad and has an upper abrasive surface. The lower pad has an upper surface defining one or more grooves. When the upper pad is placed over the lower pad, channels may form in the upper pad abrasive surface over the grooves. These channels improve the distribution of slurry in the polishing apparatus. The upper pad may define a first polishing region and a second polishing region, the total area of channels in the first polishing region being greater than the total area of the channels in the second polishing region.
    Type: Grant
    Filed: December 17, 1997
    Date of Patent: October 24, 2000
    Assignee: Micron Technology, Inc.
    Inventors: Kevin Tjaden, G. Hugo Urbina
  • Method and system to increase delivery of slurry to the surface of large substrates during polishing operations
    Patent number: 5899799
    Abstract: Grooves are cut into an under pad of a polishing pad assembly formed by an under pad and an over pad. The grooves cause channeling of the over pad so that slurry received on the polishing face of the pad assembly is delivered across the pad assembly's surface in a controlled fashion.
    Type: Grant
    Filed: January 19, 1996
    Date of Patent: May 4, 1999
    Assignee: Micron Display Technology, Inc.
    Inventors: Kevin Tjaden, G. Hugo Urbina