Patents by Inventor Günes NAKIBOGLU
Günes NAKIBOGLU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190101837Abstract: A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system has: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.Type: ApplicationFiled: February 16, 2017Publication date: April 4, 2019Applicant: ASML, NETHERLANDS B.V.Inventors: Hakki Ergün CEKLI, Günes NAKÍBOGLU, Frank Johannes Jacobus, Jean-Philippe XAVIER, Richard Johannes Franciscus
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Patent number: 10241422Abstract: A lithography apparatus includes: a projection system configured to project a desired image onto a substrate; an active module that generates a time-varying heat load; a temperature conditioning system configured to maintain a component of the lithography apparatus at a predetermined target temperature; and a heat buffer including a phase change material in thermal contact with the active module, the phase change material having a phase change temperature such that the phase change material is caused to undergo a phase change by the time-varying heat load, and wherein the phase change material is stationary relative to the projection system during critical operations of the lithography apparatus.Type: GrantFiled: February 16, 2016Date of Patent: March 26, 2019Assignee: ASML NETHERLANDS B.V.Inventor: Günes Nakiboglu
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Patent number: 10222713Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.Type: GrantFiled: November 21, 2016Date of Patent: March 5, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Laurentius Johannes Adrianus Van Bokhoven, Ruud Hendrikus Martinus Johannes Bloks, Günes Nakiboglu, Marinus Jan Remie, Johan Gertrudis Cornelis Kunnen
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Publication number: 20190041761Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.Type: ApplicationFiled: October 9, 2018Publication date: February 7, 2019Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Jan Steven Christiaan WESTERLAKEN, Frank Johannes Jacobus VAN BOXTEL, Maria del Carmen MERCADO CARMONA, Thibault Simon Mathieu LAURENT
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Publication number: 20180364584Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.Type: ApplicationFiled: November 2, 2016Publication date: December 20, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Daan Daniel Johannes Antonius VAN SOMMEREN, Coen Hubertus Matheus BALTIS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Johannes Cornelis Paulus MELMAN, Günes NAKIBOGLU, Theodorus Wilhelmus POLET, Walter Theodorus Matheus STALS, Yuri Johannes Gabriël VAN DE VIJVER, Josephus Peter VAN LIESHOUT, Jorge Alverto VIEYRA SALAS, Aleksandar Nikolov ZDRAVKOV
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Publication number: 20180356740Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.Type: ApplicationFiled: November 21, 2016Publication date: December 13, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Laurentius Johannes Adrianus VAN BOKHOVEN, Ruud Hendrikus Martinus Johannes BLOKS, Günes NAKIBOGLU, Marinus Jan REMIE, Johan Gertrudis Cornelis KUNNEN
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Patent number: 10133197Abstract: A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.Type: GrantFiled: June 8, 2015Date of Patent: November 20, 2018Assignee: ASML Netherlands B.V.Inventors: Günes Nakiboglu, Frank Johannes Jacobus Van Boxtel, Thomas Petrus Hendricus Warmerdam, Jan Steven Christiaan Westerlaken, Johannes Pieter Kroes
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Patent number: 10114299Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.Type: GrantFiled: May 7, 2015Date of Patent: October 30, 2018Assignee: ASML Netherlands B.V.Inventors: Günes Nakiboglu, Mark Constant Johannes Baggen, Gerard Johannes Boogaard, Nicolaas Rudolf Kemper, Sander Kerssemakers, Robertus Mathijs Gerardus Rijs, Frank Johannes Jacobus Van Boxtel, Erwin Antonius Henricus Franciscus Van Den Boogaert, Marc Wilhelmus Maria Van Der Wijst, Martinus Van Duijnhoven, Jessica Henrica Anna Verdonschot, Hendrikus Herman Marie Cox
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Patent number: 10114295Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.Type: GrantFiled: October 13, 2015Date of Patent: October 30, 2018Assignee: ASML Netherlands B.V.Inventors: Günes Nakiboglu, Jan Steven Christiaan Westerlaken, Frank Johannes Jacobus Van Boxtel, Maria del Carmen Mercado, Thibault Simon Mathieu Laurent
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Publication number: 20180299796Abstract: A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.Type: ApplicationFiled: March 29, 2016Publication date: October 18, 2018Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Maarten HOLTRUST, Martinus VAN DUIJNHOVEN, Francis FAHRNI, Frank Johannes Jacobus VAN BOXTEL, Anne Willemijn Bertine QUIST, Bart Dinand PAARHUIS, Daan Daniel Johannes VAN SOMMEREN
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Publication number: 20180239258Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.Type: ApplicationFiled: April 20, 2018Publication date: August 23, 2018Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Suzanne Johanna Antonetta Geertruda COSIJNS, Anne Willemijn Bertine QUIST, Lukasz SOSNIAK, Frank Johannes Jacobus VAN BOXTEL, Engelbertus Antonius Fransiscus VAN DER PASCH
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Patent number: 9977348Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.Type: GrantFiled: June 25, 2015Date of Patent: May 22, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Günes Nakiboglu, Suzanne Johanna Antonetta Geertruda Cosijns, Anne Willemijn Bertine Quist, Lukasz Sosniak, Frank Johannes Jacobus Van Boxtel, Engelbertus Antonius Fransiscus Van Der Pasch
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Publication number: 20180101099Abstract: A lithographic apparatus has shield which protects a functional subsystem form acoustic disturbances. The shield comprises a locally resonant sonic material for implementing the protecting. In an embodiment the shield comprises a panel formed by a cell or a plurality of cells comprising: a frame; an elastic membrane whose edge is fixed to the frame; and a mass attached to a location at the membrane at a non-zero distance from the edge.Type: ApplicationFiled: March 8, 2016Publication date: April 12, 2018Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Marc Wilhelmus Maria VAN DER WIJST, Martinus VAN DUIJNHOVEN, Cornelius Adrianus Lambertus DE HOON, Frank Johannes Jacobus VAN BOXTEL
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Patent number: 9939740Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.Type: GrantFiled: January 20, 2015Date of Patent: April 10, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Günes Nakiboglu, Martijn Van Baren, Frank Johannes Jacobus Van Boxtel, Koen Cuypers, Jeroen Gerard Gosen, Laurentius Johannes Adrianus Van Bokhoven
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Publication number: 20180074416Abstract: A lithography apparatus includes: a projection system configured to project a desired image onto a substrate; an active module that generates a time-varying heat load; a temperature conditioning system configured to maintain a component of the lithography apparatus at a predetermined target temperature; and a heat buffer including a phase change material in thermal contact with the active module, the phase change material having a phase change temperature such that the phase change material is caused to undergo a phase change by the time-varying heat load, and wherein the phase change material is stationary relative to the projection system during critical operations of the lithography apparatus.Type: ApplicationFiled: February 16, 2016Publication date: March 15, 2018Applicant: ASML Netherlands B.V.Inventor: Günes NAKIBOGLU
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Publication number: 20170219930Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.Type: ApplicationFiled: June 25, 2015Publication date: August 3, 2017Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Suzanne Johanna Antonetta Geertruda GOSIJNS, Anne Willemijn Bertine QUIST, Lukasz SOSNIAK, Frank Johannes Jacobus VAN BOXTEL, Engelbertus Antonius Fransiscu VAN DER PASCH
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Publication number: 20170160653Abstract: A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.Type: ApplicationFiled: June 8, 2015Publication date: June 8, 2017Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Frank Johannes Jacobus VAN BOXTEL, Thomas Petrus Hendricus WARMERDAM, Jan Steven Christiaan WESTERLAKEN, Johannes Pieter KROES
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Publication number: 20170090296Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of Cthrough-holes (102), between the chamber and the compartment.Type: ApplicationFiled: May 7, 2015Publication date: March 30, 2017Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Mark Constant Johannes BAGGEN, Gerard Johannes BOOGAARD, Nicolaas Rudolf KEMPER, Sander KERSSEMAKERS, Robertus Mathijs Gerardus RIJS, Frank Johannes Jacobus VAN BOXTEL, Erwin Antonius Henricus Franciscus VAN DEN BOOGAERT, Marc Wilhelmus Maria VAN DER WIJST, Martinus VAN DUIJNHOVEN, Jessica Henrica Anna VERDONSCHOT, Hendrikus Herman Marie COX
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Publication number: 20160349631Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.Type: ApplicationFiled: January 20, 2015Publication date: December 1, 2016Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Martijn VAN BAREN, Frank Johannes Jacobs VAN BOXTEL, Koen CUYPERS, Jeroen Gerard GOSEN, Laurentius Johannes Adrianus VAN BOKHOVEN