Patents by Inventor Günther Röska

Günther Röska has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7081768
    Abstract: A device for testing printed circuit boards (1) that have contact points (3) arranged in a pattern. The device includes a needle plate (4) that is parallel to the printed circuit board (1) and can be displaced towards the printed circuit board. The plate is equipped with fixed needles (6), whose points are arranged in the pattern of the contact points (3). The needles (6) and their points are arranged so that they can be repositioned in the (x,y) direction of the plane of the needle plate (4).
    Type: Grant
    Filed: May 2, 2003
    Date of Patent: July 25, 2006
    Assignee: Scorpion Technologies AG
    Inventors: Günther Röska, Karim Hosseini-Dehkorki, Manfred Buks
  • Patent number: 4960489
    Abstract: For self-aligned manufacture of contacts referred to as vias between interconnects that are contained in wiring levels arranged above one another in an integrated circuit, a pillar technique is employed where the contacts are produced before the deposition of an inter-metal dielectric to produce the pillar, a layer structure is produced that contains at least one metal layer for the lower wiring level and at least one conductive layer for the contacts. The longitudinal expanse of the contact is defined by a mask that reliably overlaps the desired width of the lower interconnect. The transversal expanse of the contact is defined by the mask needed for producing the lower interconnect. The contacts and the lower interconnects are produced by step-by-step etching.
    Type: Grant
    Filed: December 18, 1989
    Date of Patent: October 2, 1990
    Assignee: Siemens Aktiengesellschaft
    Inventors: Guenther Roeska, Josef Winnerl, Franz Neppl
  • Patent number: 4910580
    Abstract: To improve the planarization and reliability of low-impedance aluminum metallizations, a substrate provided with a titanium/titanium nitride double layer diffusion barrier layer and having a contact hole is provided or, respectively, filled with an aluminum/silicon alloy sandwich structure composed of a sequence of n aluminum/silicon layers having n-1 intermediate layers of titanium applied thereon, whereby the layer thickness ratio of the titanium intermediate layers to the overall layer thickness d of the metallization behaves like 1:10. The multisandwich metallization manufactured in this way is used in VLSI circuits and, given the same specific resistance achieves a life expectancy that is 10 through 100 times higher than that of the aluminum/silicon/titanium alloys that are otherwise standard.
    Type: Grant
    Filed: August 1, 1988
    Date of Patent: March 20, 1990
    Assignee: Siemens Aktiengesellschaft
    Inventors: Peter Kuecher, Guenther Roeska