Patents by Inventor Gérard Benas-Sayag

Gérard Benas-Sayag has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7573050
    Abstract: Column for simultaneously producing a focused particle beam and a focused light beam and method for treating a sample using the column. The column has lateral walls, an input electrode having a particle aperture for emitting a particle beam, an electrostatic lens, an optical focusing device within the lens, and a deflection optical mirror. The method comprises locating the sample below the column, passing the particle beam through entry aperture and exit aperture of the lens to be focused on a selected location on the sample, and injecting an optical beam into the lens through the entry aperture. The lens incorporates convex and concave optical mirrors. The optical beam is injected into the lens to reflect from the convex optical mirror towards the concave optical mirror and then reflect from the concave optical mirror to exit from the exit aperture to be focused on the selected location on the sample.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: August 11, 2009
    Assignee: DCG Systems, Inc.
    Inventors: Gérard Benas-Sayag, Patrick Bouchet, Antoine Corbin, Pierre Sudraud
  • Publication number: 20080111084
    Abstract: Column for simultaneously producing a focused particle beam and a focused light beam and method for treating a sample using the column. The column has lateral walls, an input electrode having a particle aperture for emitting a particle beam, an electrostatic lens, an optical focusing device within the lens, and a deflection optical mirror. The method comprises locating the sample below the column, passing the particle beam through entry aperture and exit aperture of the lens to be focused on a selected location on the sample, and injecting an optical beam into the lens through the entry aperture. The lens incorporates convex and concave optical mirrors. The optical beam is injected into the lens to reflect from the convex optical mirror towards the concave optical mirror and then reflect from the concave optical mirror to exit from the exit aperture to be focused on the selected location on the sample.
    Type: Application
    Filed: October 31, 2007
    Publication date: May 15, 2008
    Inventors: Gerard Benas-Sayag, Patrick Bouchet, Antoine Corbin, Pierre Sudraud
  • Patent number: 7297948
    Abstract: The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterized in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said output orifice.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: November 20, 2007
    Assignee: Credence Systems Corporation
    Inventors: Gerard Benas-Sayag, Patrick Bouchet, Antoine Corbin, Pierre Sudraud
  • Patent number: 7045791
    Abstract: The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterized in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said output orifice.
    Type: Grant
    Filed: March 19, 2001
    Date of Patent: May 16, 2006
    Assignees: Credence Systems Corporation, Orsay-Physics, S.A.
    Inventors: Gérard Benas-Sayag, Patrick Bouchet, Antoine Corbin, Pierre Sudraud
  • Publication number: 20060097198
    Abstract: The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterized in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said output orifice.
    Type: Application
    Filed: December 6, 2005
    Publication date: May 11, 2006
    Inventors: Gerard Benas-Sayag, Patrick Bouchet, Antoine Corbin, Pierre Sudraud
  • Publication number: 20030102436
    Abstract: The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterised in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said out-put orifice.
    Type: Application
    Filed: January 13, 2003
    Publication date: June 5, 2003
    Inventors: Gerard Benas-Sayag, Patrick Bouchet, Antoine Corbin, Pierre Sudraud