Abstract: A deposition apparatus and a method for depositing deposition material on a web is described. The deposition apparatus includes a first sputter device support defining a first axis for a first rotatable sputter device, a second sputter device support defining a second axis for a second rotatable sputter device, and a coating window. The first sputter device support and the second sputter device support are adapted for supporting the first rotatable sputter device and the second rotatable sputter device to provide at least a component of the deposition material to be deposited on the web over a coating drum. Further, the distance between the first axis and the second axis is smaller than 200 mm.

Abstract: A lock valve is adapted for locking a process chamber. The lock valve includes a valve flap adapted for sealing an aperture of the process chamber where a substrate to be processed may be inserted or ejected. A cooling unit is adapted for cooling the valve flap by means of a cooling fluid. At least one valve flap hinge is adapted for connecting the process chamber with the valve flap. The valve flap hinge furthermore includes at least one pipe in fluid communication with the cooling unit of the valve flap.