Abstract: The present invention provides a chemical mechanical (CMP) polishing pad for polishing three dimensional semiconductor or memory substrates comprising a polishing layer of a polyurethane reaction product of a thermosetting reaction mixture of a curative of 4,4?-methylenebis(3-chloro-2,6-diethylaniline) (MCDEA) or mixtures of MCDEA and 4,4?-methylene-bis-o-(2-chloroaniline) (MbOCA), and a polyisocyanate prepolymer formed from one or two aromatic diisocyanates, such as toluene diisocyanate (TDI), or a mixture of an aromatic diisocyanate and an alicyclic diisocyanate, and a polyol of polytetramethylene ether glycol (PTMEG), polypropylene glycol (PPG), or a polyol blend of PTMEG and PPG and having an unreacted isocyanate (NCO) concentration of from 8.6 to 11 wt. %. The polyurethane in the polishing layer has a Shore D hardness according to ASTM D2240-15 (2015) of from 50 to 90, a shear storage modulus (G?) at 65° C.

Abstract: The present invention is directed towards an electrodepositable coating composition comprising a cationic electrodepositable binder; a phyllosilicate pigment; and a dispersing agent. Also disclosed are methods of making the electrodepositable coating composition, coatings derived therefrom, and substrates coated with the coatings derived from the electrodepositable coating composition.

Abstract: Graphenic carbon nanoparticles that are dispersed in solvents through the use of dispersant resins are disclosed. The graphenic carbon nanoparticles may be milled prior to dispersion. The dispersant resins may comprise a polymeric dispersant resin comprising an addition polymer comprising the residue of a vinyl heterocyclic amide, an addition polymer comprising a homopolymer, a block (co)polymer, a random (co)polymer, an alternating (co)polymer, a graft (co)polymer, a brush (co)polymer, a star (co)polymer, a telechelic (co)polymer, or a combination thereof. The solvents may be aqueous, non-aqueous, inorganic and/or organic solvents. The dispersions are highly stable and may contain relatively high loadings of the graphenic carbon nanoparticles.

Abstract: An electrically or thermally conductive polymer composition, includes: a polyester polymer having a backbone including at least 12 consecutive carbon atoms between ester linkages; and conductive particles dispersed in the polyester polymer. A component including an electrically or thermally conductive polymer composition is also disclosed. A method for self-regulating a temperature of a component is also disclosed.

Abstract: The present invention provides a chemical mechanical (CMP) polishing pad for polishing three dimensional semiconductor or memory substrates comprising a polishing layer of a polyurethane reaction product of a thermosetting reaction mixture of a curative of 4,4?-methylenebis(3-chloro-2,6-diethylaniline) (MCDEA) or mixtures of MCDEA and 4,4?-methylene-bis-o-(2-chloroaniline) (MbOCA), and a polyisocyanate prepolymer formed from one or two aromatic diisocyanates, such as toluene diisocyanate (TDI), or a mixture of an aromatic diisocyanate and an alicyclic diisocyanate, and a polyol of polytetramethylene ether glycol (PTMEG), polypropylene glycol (PPG), or a polyol blend of PTMEG and PPG and having an unreacted isocyanate (NCO) concentration of from 8.6 to 11 wt. %. The polyurethane in the polishing layer has a Shore D hardness according to ASTM D2240-15 (2015) of from 60 to 90, a shear storage modulus (G?) at 65° C.

Abstract: The present invention provides a chemical mechanical (CMP) polishing pad for polishing three dimensional semiconductor or memory substrates comprising a polishing layer of a polyurethane reaction product of a thermosetting reaction mixture of a curative of 4,4?-methylenebis(3-chloro-2,6-diethylaniline) (MCDEA) or mixtures of MCDEA and 4,4?-methylene-bis-o-(2-chloroaniline) (MbOCA), and a polyisocyanate prepolymer formed from one or two aromatic diisocyanates, such as toluene diisocyanate (TDI), or a mixture of an aromatic diisocyanate and an alicyclic diisocyanate, and a polyol of polytetramethylene ether glycol (PTMEG), polypropylene glycol (PPG), or a polyol blend of PTMEG and PPG and having an unreacted isocyanate (NCO) concentration of from 8.6 to 11 wt. %. The polyurethane in the polishing layer has a Shore D hardness according to ASTM D2240-15 (2015) of from 60 to 90, a shear storage modulus (G?) at 65° C.

Abstract: The present invention provides a chemical mechanical (CMP) polishing pad for polishing three dimensional semiconductor or memory substrates comprising a polishing layer of a polyurethane reaction product of a thermosetting reaction mixture of a curative of 4,4?-methylenebis(3-chloro-2,6-diethylaniline) (MCDEA) or mixtures of MCDEA and 4,4?-methylene-bis-o-(2-chloroaniline) (MbOCA), and a polyisocyanate prepolymer formed from one or two aromatic diisocyanates, such as toluene diisocyanate (TDI), or a mixture of an aromatic diisocyanate and an alicyclic diisocyanate, and a polyol of polytetramethylene ether glycol (PTMEG), polypropylene glycol (PPG), or a polyol blend of PTMEG and PPG and having an unreacted isocyanate (NCO) concentration of from 8.6 to 11 wt. %. The polyurethane in the polishing layer has a Shore D hardness according to ASTM D2240-15 (2015) of from 50 to 90, a shear storage modulus (G?) at 65° C.

Abstract: A chemical mechanical polishing pad for polishing a semiconductor substrate is provided containing a polishing layer that comprises a polyurethane reaction product of a reaction mixture comprising a curative and a polyisocyanate prepolymer having an unreacted isocyanate (NCO) concentration of from 8.3 to 9.8 wt. % and formed from a polyol blend of polypropylene glycol (PPG) and polytetramethylene ether glycol (PTMEG) and containing a hydrophilic portion of polyethylene glycol or ethylene oxide repeat units, a toluene diisocyanate, and one or more isocyanate extenders, wherein the polyurethane reaction product exhibits a wet Shore D hardness of from 10 to 20% less than the Shore D hardness of the dry polyurethane reaction product.

Abstract: A chemical mechanical polishing pad for polishing a semiconductor substrate is provided containing a polishing layer that comprises a polyurethane reaction product of a reaction mixture comprising a curative and a polyisocyanate prepolymer having an unreacted isocyanate (NCO) concentration of from 8.3 to 9.8 wt. % and formed from a polyol blend of polypropylene glycol (PPG) and polytetramethylene ether glycol (PTMEG) and containing a hydrophilic portion of polyethylene glycol or ethylene oxide repeat units, a toluene diisocyanate, and one or more isocyanate extenders, wherein the polyurethane reaction product exhibits a wet Shore D hardness of from 10 to 20% less than the Shore D hardness of the dry polyurethane reaction product.

Abstract: Devices, systems, and methods for processing healthcare and financial transactions are provided. A point-of-care terminal for processing a healthcare transaction by a healthcare provider includes a reader configured to read information from a healthcare eligibility and settlement presentation instrument associated with a patient, and a processor configured to process a healthcare transaction based on the information, wherein the healthcare transaction includes at least one of a healthcare eligibility verification transaction and a healthcare settlement transaction.

Abstract: Methods described herein may be useful in the fabrication and/or screening of devices (e.g., sensors, circuits, etc.) including conductive materials. In some embodiments, a conductive material is formed on a substrate using mechanical abrasion. The methods described herein may be useful in fabricating sensors, circuits, tags for remotely-monitored sensors or human/object labeling and tracking, among other devices. In some cases, devices for determining analytes are also provided.

Abstract: Predicting future healthcare costs is disclosed. A method includes: receiving medical care information (e.g., claims data) relating to patients; identifying, by a cost prediction module, a presence of one or more monitored events representing modifiable health risks when the claims data indicates that the patient is receiving medical care that is not in compliance with evidence-based medical standards; mapping, by the cost prediction module, each of the one or more monitored events to utilization and/or cost prediction values based on a status of each of the one or more monitored events; assigning, by the cost prediction module, for each of the one or more monitored events, a probability score for utilization of medical services based on the status of the monitored event; and calculating a prediction of future healthcare utilization and/or cost based on the probability score and status for each of the one or more monitored events.

Abstract: A grit removal apparatus has a central opening between a cylindrical separation chamber above a grit storage chamber. An influent flume introduces a liquid stream directly into a lower portion of the periphery of the separation chamber, and an effluent flume removes a stream through an opening in an upper portion of the separation chamber wall. Outwardly spiraling vanes extend upwardly at the bottom center of the separation chamber, and a vertical cylindrical duct is supported above the vanes. A tunnel is defined in the separation chamber by an upper wall at the bottom of that opening and an inner wall concentric with the separation chamber wall. A ring extends inwardly from the separation chamber wall, with the tunnel upper wall defining a portion of the ring. A propeller inside the duct rotates to draw fluid flow up through the duct toward the upper portion of the separation chamber.

Abstract: Devices, systems, and methods for processing healthcare and financial transactions are provided. A point-of-care terminal for processing a healthcare transaction by a healthcare provider includes a reader configured to read information from a healthcare eligibility and settlement presentation instrument associated with a patient, and a processor configured to process a healthcare transaction based on the information, wherein the healthcare transaction includes at least one of a healthcare eligibility verification transaction and a healthcare settlement transaction.

Abstract: Devices, systems, and methods for processing healthcare and financial transactions are provided. A point-of-care terminal for processing a healthcare transaction by a healthcare provider includes a reader configured to read information from a healthcare eligibility and settlement presentation instrument associated with a patient, and a processor configured to process a healthcare transaction based on the information, wherein the healthcare transaction includes at least one of a healthcare eligibility verification transaction and a healthcare settlement transaction.

Abstract: A grit removal apparatus has a central opening between a cylindrical separation chamber above a grit storage chamber. An influent flume introduces a liquid stream directly into a lower portion of the periphery of the separation chamber, and an effluent flume removes a stream through an opening in an upper portion of the separation chamber wall. Outwardly spiraling vanes extend upwardly at the bottom center of the separation chamber, and a vertical cylindrical duct is supported above the vanes. A tunnel is defined in the separation chamber by an upper wall at the bottom of that opening and an inner wall concentric with the separation chamber wall. A ring extends inwardly from the separation chamber wall, with the tunnel upper wall defining a portion of the ring. A propeller inside the duct rotates to draw fluid flow up through the duct toward the upper portion of the separation chamber.

Abstract: A grit removal unit for a waste water system, including a round grit removal chamber with an input for waste water and an output, a grit storage chamber beneath the grit removal chamber, and an opening between the grit storage chamber and the grit removal chamber. A vertical drive shaft extends through the grit removal chamber into the grit storage chamber, and is rotatable to facilitate waste water flow in the grit removal chamber whereby grit in the waste water is directed toward the opening. A grit size restrictor includes a shear secured to the drive shaft for rotation therewith (the shear including a plate extending radially from the drive shaft above the opening), a first set of bars extending across the opening, and a second set of bars secured to the bottom of the shear plate with the second set of bars positioned adjacent the first set of bars.

Abstract: Systems and methods for providing merchant services with right-time creation and updating of merchant accounts. Merchant-specific information for each merchant is stored in a record and used to process purchase card transactions submitted by the merchant. When a user creates or updates a merchant account record, the user can indicate whether the update is to take effect immediately or at a user-specified later time. An immediate update is processed substantially without delay. Other updates are queued for later processing and processed at the user-specified later time.

Abstract: Systems and methods for providing merchant services with right-time creation and updating of merchant accounts. Merchant-specific information for each merchant is stored in a record and used to process purchase card transactions submitted by the merchant. When a user creates or updates a merchant account record, the user can indicate whether the update is to take effect immediately or at a user-specified later time. An immediate update is processed substantially without delay. Other updates are queued for later processing and processed at the user-specified later time.

Abstract: A grit removal unit for a waste water system, including a round grit removal chamber with an input for waste water and an output, a grit storage chamber beneath the grit removal chamber, and an opening between the grit storage chamber and the grit removal chamber. A vertical drive shaft extends through the grit removal chamber into the grit storage chamber, and is rotatable to facilitate waste water flow in the grit removal chamber whereby grit in the waste water is directed toward the opening. A grit size restrictor includes a shear secured to the drive shaft for rotation therewith (the shear including a plate extending radially from the drive shaft above the opening), a first set of bars extending across the opening, and a second set of bars secured to the bottom of the shear plate with the second set of bars positioned adjacent the first set of bars.