Abstract: There is provided a deep learning-based overlay key centering system and a method thereof that may precisely measure and examine an alignment state of fine patterns of a semiconductor substrate. The method includes collecting an input data set from at least one device, the input data set comprising measurement image data of an overlay key and label data including information on a position and bounding box size of the overlay; and training the model by inputting the input data set to a model for deep learning. The step of training the model may include a step of calculating a loss function by comparing result data predicted by the model with the label data; and a step of optimizing an algorithm of the model by modifying a weight of the model so that a loss value calculated with the loss function may become smaller than a reference value.

Abstract: There is provided a deep learning-based overlay key centering system and a method thereof that may precisely measure and examine an alignment state of fine patterns of a semiconductor substrate. The method includes collecting an input data set from at least one device, the input data set comprising measurement image data of an overlay key and label data including information on a position and bounding box size of the overlay; and training the model by inputting the input data set to a model for deep learning. The step of training the model may include a step of calculating a loss function by comparing result data predicted by the model with the label data; and a step of optimizing an algorithm of the model by modifying a weight of the model so that a loss value calculated with the loss function may become smaller than a reference value.