Patents by Inventor Gabi Grutzner

Gabi Grutzner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition suitable for use as a release-optimized material for nanoimprint processes and uses thereof
    Patent number: 10126648
    Abstract: The present invention relates to a composition suitable for use as a release-optimized material for nanoimprint processes, process of production and uses thereof.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: November 13, 2018
    Assignee: MICRO RESIST TECHNOLOGY GESELLSCHAFT FÜR CHEMISCHE MATERIALIEN SPEZIELLER PROTORESISTSYSTEME GMBH
    Inventors: Hakki Hakan Atasoy, Gabi Grützner, Marko Vogler
  • COMPOSITION SUITABLE FOR USE AS A RELEASE-OPTIMIZED MATERIAL FOR NANOIMPRINT PROCESSES AND USES THEREOF
    Publication number: 20150079351
    Abstract: The present invention relates to a composition suitable for use as a release-optimized material for nanoimprint processes, process of production and uses thereof.
    Type: Application
    Filed: May 24, 2013
    Publication date: March 19, 2015
    Applicant: MICRO RESIST TECHNOLOGY GESELLSCHAFT FÜR CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH
    Inventors: Hakki Hakan Atasoy, Gabi Grützner, Marko Vogler
  • Light-sensitive resist which can be developed in an aqueous-alkali manner and operates negatively
    Patent number: 6398640
    Abstract: The invention relates top a light sensitive, aqueous alkali developing, negatively acting resist, comprising a phenolic resin as a binder, and a diazostilbene disulfonic acid ester light sensitive component, a solvent or mixture of solvents, and film forming and/or film stabilizing additives, and to a process for preparing the light sensitive component.
    Type: Grant
    Filed: October 18, 1999
    Date of Patent: June 4, 2002
    Assignee: Micro Resist Technology GmbH
    Inventors: Gabi Grützner, Anja Voigt, Jürgen Bendig, Ines Schmidt, Erika Sauer
  • Black matrix in color picture tubes and a process for producing said black matrix
    Patent number: 6159645
    Abstract: The invention relates to a black matrix in color picture tubes, a positive photoresist composition, an agent for protecting a black matrix, and a process for producing said black matrix. The invention is based on the object of providing a black matrix produced using a positive photoresist composition which permits good capability of structuring between exposed and non-exposed areas, and reducing the process for producing the black matrix to a few technological steps.
    Type: Grant
    Filed: February 9, 1998
    Date of Patent: December 12, 2000
    Assignee: Samsung Display Devices Co., Ltd.
    Inventors: Andre Wilpert, Gabi Grutzner, Kerstin Schulze-Matthai, Jurgen Bendig, Klaus Tummel