Patents by Inventor Gabriel MUGNY

Gabriel MUGNY has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11949035
    Abstract: A single photon avalanche diode (SPAD) includes a PN junction in a semiconductor well doped with a first type of dopant. The PN junction is formed between a first region doped with the first type of dopant and a second region doped with a second type of dopant opposite to the first type of dopant. The first doped region is shaped so as to incorporate local variations in concentration of dopants that are configured, in response to a voltage between the second doped region and the semiconductor well that is greater than or equal to a level of a breakdown voltage of the PN junction, to generate a monotonic variation in the electrostatic potential between the first doped region and the semiconductor well.
    Type: Grant
    Filed: December 9, 2021
    Date of Patent: April 2, 2024
    Assignees: STMicroelectronics (Crolles 2) SAS, STMicroelectronics (Research & Development) Limited
    Inventors: Denis Rideau, Dominique Golanski, Alexandre Lopez, Gabriel Mugny
  • Publication number: 20230178676
    Abstract: An avalanche photodiode includes a stack of layers. The stack of layers includes an avalanche diode (of PN or PIN type) and a layer having quantum dots located therein. The stack of layers further includes: a charge extraction layer over the layer which includes quantum dots; a transparent conducting layer over the charge extraction layer; and an insulating layer over the transparent conducting layer. The quantum dots includes ligands formed by molecules of dopants.
    Type: Application
    Filed: December 6, 2022
    Publication date: June 8, 2023
    Applicants: STMicroelectronics (Crolles 2) SAS, STMicroelectronics (Grenoble 2) SAS
    Inventors: Arthur ARNAUD, Gabriel MUGNY
  • Publication number: 20220190184
    Abstract: A single photon avalanche diode (SPAD) includes a PN junction in a semiconductor well doped with a first type of dopant. The PN junction is formed between a first region doped with the first type of dopant and a second region doped with a second type of dopant opposite to the first type of dopant. The first doped region is shaped so as to incorporate local variations in concentration of dopants that are configured, in response to a voltage between the second doped region and the semiconductor well that is greater than or equal to a level of a breakdown voltage of the PN junction, to generate a monotonic variation in the electrostatic potential between the first doped region and the semiconductor well.
    Type: Application
    Filed: December 9, 2021
    Publication date: June 16, 2022
    Applicants: STMicroelectronics (Crolles 2) SAS, STMicroelectronics (Research & Development) Limited
    Inventors: Denis RIDEAU, Dominique GOLANSKI, Alexandre LOPEZ, Gabriel MUGNY