Abstract: Disclosed is an RF power FET or HEMT including an electrically-conductive substrate, a grounding metallization layer disposed on a bottom surface of the electrically-conductive substrate, an active area comprising at least one cell including source, gate and drain electrodes disposed over a top surface of the electrically-conductive substrate, and an electrically-conductive shallow trench electrically connecting the source electrode to the grounding metallization layer by way of the electrically-conductive substrate. This configuration results in the effective RF ground being very close to the active area of the FET in order to reduce parasitic source inductance and resistance. This results in potentially higher gain, higher saturation point, higher 3rd-order intercept, more efficient combining of the input RF signal, and more efficient extraction of the output RF signal.

Abstract: Disclosed is an RF power FET or HEMT including an electrically-conductive substrate, a grounding metallization layer disposed on a bottom surface of the electrically-conductive substrate, an active area comprising at least one cell including source, gate and drain electrodes disposed over a top surface of the electrically-conductive substrate, and an electrically-conductive shallow trench electrically connecting the source electrode to the grounding metallization layer by way of the electrically-conductive substrate. This configuration results in the effective RF ground being very close to the active area of the FET in order to reduce parasitic source inductance and resistance. This results in potentially higher gain, higher saturation point, higher 3rd-order intercept, more efficient combining of the input RF signal, and more efficient extraction of the output RF signal.

Abstract: A power transistor comprises a number of groups of gate fingers of various widths and can include uniform or non-uniform pitch. The widths may include any number of different widths. In one embodiment, there are included three widths W1, W2, and W3, in which W3>W2>W1. The groups of gate fingers are arranged from greater width to lesser width disposed from a periphery to a center of the device. In addition, the gate fingers are configured to have one of a centered justification, a gate pad side justification, and a drain pad side justification, along a dimension of the power transistor layout. In another embodiment, the groups of gate fingers having widths W1, W2, and W3 are configured symmetrically about a center line of the device. The variable gate finger widths provide a level of greater power density at the outside of the die in relation to a power density at the center of the die. Asymmetrical arrangements of gate finger widths are also contemplated.