Patents by Inventor Gabriele Jantke

Gabriele Jantke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for determining the crystal orientation in a wafer
    Patent number: 6177285
    Abstract: A method for determining the crystal orientation of a wafer using anisotropic etching in which an etching mask having mask openings such as circle scale marks arranged one beside the other is applied in relation to a preexisting marking of the wafer. Mask openings are configured in a double-T shape and are arranged one beside the other so that their first, transversely extending segments and the second transversely extending segments are situated at a predetermined distance apart and the areas connecting the segments are situated equidistant. The crystal orientation is determined with the distance of the two particular adjacent mask openings, the intervening space of which is least undercut, from the preexisting marking.
    Type: Grant
    Filed: February 5, 1999
    Date of Patent: January 23, 2001
    Assignee: Siemens Aktiengesellschaft
    Inventors: Gabriele Jantke, Arno Steckenborn, Thoralf Winkler