Patents by Inventor Gabriele Weirauch

Gabriele Weirauch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Illumination system for microlithography
    Patent number: 7911584
    Abstract: The present invention relates to an illumination system for microlithography, especially for wavelengths ?193 nm, especially preferably for EUV lithography for illuminating a field in a field plane with at least one optical integrator which splits up a light bundle emitted by a light source into a plurality of light channels each having a light intensity, characterized in that a filter is provided in the light path from the light source to the field plane, with the filter comprising filter elements which are configured in such a way that the light intensity of at least one light channel is reduced in the light path after the filter element.
    Type: Grant
    Filed: April 13, 2004
    Date of Patent: March 22, 2011
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Wolfgang Singer, Joachim Wietzorrek, Joachim Hainz, Gabriele Weirauch, Manfred Maul
  • Illumination system for microlithography
    Publication number: 20070058274
    Abstract: The present invention relates to an illumination system for microlithography, especially for wavelengths ?193 nm, especially preferably for EUV lithography for illuminating a field in a field plane with at least one optical integrator which splits up a light bundle emitted by a light source into a plurality of light channels each having a light intensity, characterized in that a filter is provided in the light path from the light source to the field plane, with the filter comprising filter elements which are configured in such a way that the light intensity of at least one light channel is reduced in the light path after the filter element.
    Type: Application
    Filed: April 13, 2004
    Publication date: March 15, 2007
    Applicant: Carl Zeiss SMT AG
    Inventors: Wolfgang Singer, Joachim Wietzorrek, Joachim Hainz, Gabriele Weirauch, Manfred Maul