Patents by Inventor Gail Shelton

Gail Shelton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for enhancing anti-reflective coatings used in photolithography of electronic devices
    Patent number: 6527867
    Abstract: A method of fabricating an integrated circuit using photolithography and an antireflective coating. An antireflective coating is formed on a substrate wherein the antireflective coating is electrically polarizable. A photoresist coating is formed on the antireflective coating on a side opposite from the substrate and the photoresist is exposed to activating radiation. The antireflective coating is subjected to an applied electric field at substantially the same time as the photoresist is exposed to activating radiation. The radiation absorption coefficient of said antireflective coating is increased and the refractive index of said antireflective coating is changed to be substantially equal to the refractive index of said photoresist coating.
    Type: Grant
    Filed: May 30, 2000
    Date of Patent: March 4, 2003
    Assignee: LSI Logic Corporation
    Inventors: Kunal Taravade, Gayle Miller, Gail Shelton
  • Method for enhancing anti-reflective coatings used in photolithography of electronic devices
    Patent number: 6225215
    Abstract: A method of fabricating an integrated circuit using photolithography and an antireflective coating. An antireflective coating is formed on a substrate wherein the antireflective coating is electrically polarizable. A photoresist coating is formed on the antireflective coating on a side opposite from the substrate and the photoresist is exposed to activating radiation. The antireflective coating is subjected to an applied electric field at substantially the same time as the photoresist is exposed to activating radiation. The radiation absorption coefficient of said antireflective coating is increased and the refractive index of said antireflective coating is changed to be substantially equal to the refractive index of said photoresist coating.
    Type: Grant
    Filed: September 24, 1999
    Date of Patent: May 1, 2001
    Assignee: LSI Logic Corporation
    Inventors: Kunal Taravade, Gayle Miller, Gail Shelton