Patents by Inventor Gaiping LU

Gaiping LU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11644719
    Abstract: A liquid crystal display panel includes an array substrate, a color filter substrate, a plurality of pad structures disposed between the array substrate and the color filter substrate, a display area, and a light transmissive functional area. The pad structures are correspondingly disposed on the display area. The display area includes a predetermined area disposed at a periphery of the light transmissive functional area, and a thickness of each of the pad structures disposed on the predetermined area gradually decreases along a direction from the predetermined area to the light transmissive functional area.
    Type: Grant
    Filed: August 21, 2019
    Date of Patent: May 9, 2023
    Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd.
    Inventors: Wei Tang, Gaiping Lu
  • Patent number: 11573471
    Abstract: The present application provides an array substrate and a liquid crystal display panel. The array substrate includes: a substrate including a display area and a light-transmitting functional area; a buffer layer disposed on the substrate and covering the display area and the light-transmitting functional area; a thin film transistor array layer disposed on the buffer layer, the thin film transistor array layer is provided with an aperture, and the aperture and the light-transmitting functional area are aligned with each other; and a support filling structure disposed in the aperture.
    Type: Grant
    Filed: August 21, 2019
    Date of Patent: February 7, 2023
    Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd.
    Inventors: Wei Tang, Gaiping Lu
  • Publication number: 20220214572
    Abstract: The present application provides an array substrate and a liquid crystal display panel. The array substrate includes: a substrate including a display area and a light-transmitting functional area; a buffer layer disposed on the substrate and covering the display area and the light-transmitting functional area; a thin film transistor array layer disposed on the buffer layer, the thin film transistor array layer is provided with an aperture, and the aperture and the light-transmitting functional area are aligned with each other; and a support filling structure disposed in the aperture.
    Type: Application
    Filed: August 21, 2019
    Publication date: July 7, 2022
    Inventors: Wei TANG, Gaiping LU
  • Publication number: 20210364842
    Abstract: A liquid crystal display panel includes an array substrate, a color filter substrate, a plurality of pad structures disposed between the array substrate and the color filter substrate, a display area, and a light transmissive functional area. The pad structures are correspondingly disposed on the display area. The display area includes a predetermined area disposed at a periphery of the light transmissive functional area, and a thickness of each of the pad structures disposed on the predetermined area gradually decreases along a direction from the predetermined area to the light transmissive functional area.
    Type: Application
    Filed: August 21, 2019
    Publication date: November 25, 2021
    Inventors: Wei TANG, Gaiping LU
  • Patent number: 10983634
    Abstract: A touch array substrate and a touch display panel are provided, including a base substrate, a TFT layer, a flat layer, a metal wiring layer, an insulating layer, a bottom transparent electrode, a passivation layer and a top transparent electrode. The metal wiring layer includes a touch signal line, a dummy wiring and a connection wiring connecting the touch signal line and the dummy wiring. The critical dimension of the connection wiring is smaller than the critical dimensions of the touch signal line and the dummy wiring, or a portion of the connection wiring close to the first via is bent away from the first via, to enlarge the distance between the connection wiring and the first via. The connection wiring is prevented from falling into the first via and contacting the TFT layer, and the top transparent electrode and the bottom transparent electrode are prevented from being directly short-circuited.
    Type: Grant
    Filed: December 15, 2018
    Date of Patent: April 20, 2021
    Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Wei Tang, Gaiping Lu
  • Patent number: 10983393
    Abstract: A liquid crystal display panel and a substrate manufacturing method are provided. The liquid crystal display panel includes an array substrate, a color filter substrate, and a liquid crystal layer disposed between the array substrate and the color filter substrate. A first protrusion is disposed on a surface of the array substrate away from the liquid crystal layer, a second protrusion is disposed on a surface of the color filter substrate away from the liquid crystal layer, and the first protrusion is opposite to the second protrusion.
    Type: Grant
    Filed: November 11, 2019
    Date of Patent: April 20, 2021
    Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Jianlong Huang, Gaiping Lu
  • Publication number: 20210033919
    Abstract: A liquid crystal display panel and a substrate manufacturing method are provided. The liquid crystal display panel includes an array substrate, a color filter substrate, and a liquid crystal layer disposed between the array substrate and the color filter substrate. A first protrusion is disposed on a surface of the array substrate away from the liquid crystal layer, a second protrusion is disposed on a surface of the color filter substrate away from the liquid crystal layer, and the first protrusion is opposite to the second protrusion.
    Type: Application
    Filed: November 11, 2019
    Publication date: February 4, 2021
    Inventors: Jianlong HUANG, Gaiping LU
  • Patent number: 10901282
    Abstract: The present disclosure provides a thin film transistor (TFT) substrate and a manufacturing method thereof. The TFT substrate include a TFT; a flat layer to cover the TFT; an opening hole defined in the flat layer and corresponding to a drain of the TFT; a bottom of the opening hole to retain a part of the flat layer for forming a flat layer sheet; a first metal layer formed on the flat layer; a first insulating layer formed on the first metal; a second metal formed on the first insulating layer and pass through the flat layer sheet for electrically connecting to the drain.
    Type: Grant
    Filed: October 1, 2018
    Date of Patent: January 26, 2021
    Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd.
    Inventors: Gaiping Lu, Jiawei Zhang, Wei Tang
  • Publication number: 20210004119
    Abstract: A touch array substrate and a touch display panel are provided, including a base substrate, a TFT layer, a flat layer, a metal wiring layer, an insulating layer, a bottom transparent electrode, a passivation layer and a top transparent electrode. The metal wiring layer includes a touch signal line, a dummy wiring and a connection wiring connecting the touch signal line and the dummy wiring. The critical dimension of the connection wiring is smaller than the critical dimensions of the touch signal line and the dummy wiring, or a portion of the connection wiring close to the first via is bent away from the first via, to enlarge the distance between the connection wiring and the first via. The connection wiring is prevented from falling into the first via and contacting the TFT layer, and the top transparent electrode and the bottom transparent electrode are prevented from being directly short-circuited.
    Type: Application
    Filed: December 15, 2018
    Publication date: January 7, 2021
    Inventors: Wei TANG, Gaiping Lu
  • Publication number: 20200401002
    Abstract: An antistatic display panel and a manufacturing method thereof are provided. The antistatic display panel includes a display area, a flexible circuit board, a driving chip, and an electrostatic discharge circuit. The driving chip is fixed on a surface of the flexible circuit board and is bound to a lower edge of the display area. A plurality of pins of the driving chip are electrically connected to the electrostatic discharge circuit, and the pins form a closed loop with the electrostatic discharge circuit.
    Type: Application
    Filed: April 9, 2019
    Publication date: December 24, 2020
    Inventor: Gaiping LU
  • Publication number: 20190244982
    Abstract: The present disclosure provides a thin film transistor (TFT) substrate and a manufacturing method thereof. The TFT substrate include a TFT; a flat layer to cover the TFT; an opening hole defined in the flat layer and corresponding to a drain of the TFT; a bottom of the opening hole to retain a part of the flat layer for forming a flat layer sheet; a first metal layer formed on the flat layer; a first insulating layer formed on the first metal; a second metal formed on the first insulating layer and pass through the flat layer sheet for electrically connecting to the drain.
    Type: Application
    Filed: October 1, 2018
    Publication date: August 8, 2019
    Inventors: Gaiping Lu, Jiawei Zhang, Wei Tang
  • Patent number: 10192975
    Abstract: The disclosure relates to a low temperature polycrystalline silicon thin film transistor including: a substrate; a buffer layer formed on the substrate; a semiconductor layer formed on the buffer layer; a gate insulation layer formed on the buffer layer and the semiconductor layer; gates formed on the gate insulation layer; a dielectric layer formed on the gate insulation layer and the gates; a passivation layer formed on the dielectric layer; a first contact hole and a second contact hole formed respectively inside the passivation layer, the dielectric layer and the gate insulation layer, and sources ad drains formed respectively on the first contact hole and the second contact hole; the semiconductor layer being a low temperature poly silicon layer, and a reflective layer and/or an insulation layer disposed between the buffer layer and the semiconductor layer. The disclosure further relates to a manufacturing method for aforementioned thin film transistor.
    Type: Grant
    Filed: January 20, 2016
    Date of Patent: January 29, 2019
    Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd
    Inventor: Gaiping Lu
  • Patent number: 9947696
    Abstract: A method of forming an LTPS TFT substrate includes: Step 1: providing a substrate and depositing a buffer layer; Step 2: depositing an a-Si layer; Step 3: depositing and patterning a silicon oxide layer; Step 4: taking the silicon oxide layer as a photomask and annealing the a-Si layer with excimer laser, so that the a-Si layer crystalizes and turns into a poly-Si layer; Step 5: forming a first poly-Si region and a second poly-Si region; Step 6: defining a heavily N-doped area and a lightly N-doped area on the first and second poly-Si regions, and forming an LDD area; Step 7: depositing and patterning a gate insulating layer; Step 8: forming a first gate and a second gate; Step 9: forming via holes; and Step 10: forming a first source/drain and a second source/drain.
    Type: Grant
    Filed: December 29, 2016
    Date of Patent: April 17, 2018
    Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
    Inventor: Gaiping Lu
  • Publication number: 20180047830
    Abstract: The disclosure relates to a low temperature polycrystalline silicon thin film transistor including: a substrate; a buffer layer formed on the substrate; a semiconductor layer formed on the buffer layer; a gate insulation layer formed on the buffer layer and the semiconductor layer; gates formed on the gate insulation layer; a dielectric layer formed on the gate insulation layer and the gates; a passivation layer formed on the dielectric layer; a first contact hole and a second contact hole formed respectively inside the passivation layer, the dielectric layer and the gate insulation layer, and sources ad drains formed respectively on the first contact hole and the second contact hole; the semiconductor layer being a low temperature poly silicon layer, and a reflective layer and/or an insulation layer disposed between the buffer layer and the semiconductor layer. The disclosure further relates to a manufacturing method for aforementioned thin film transistor.
    Type: Application
    Filed: January 20, 2016
    Publication date: February 15, 2018
    Applicant: Wuhan China Star Optoelectronics Technology Co., Ltd.
    Inventor: Gaiping LU
  • Publication number: 20170110489
    Abstract: A method of forming an LTPS TFT substrate includes: Step 1: providing a substrate and depositing a buffer layer; Step 2: depositing an a-Si layer; Step 3: depositing and patterning a silicon oxide layer; Step 4: taking the silicon oxide layer as a photomask and annealing the a-Si layer with excimer laser, so that the a-Si layer crystalizes and turns into a poly-Si layer; Step 5: forming a first poly-Si region and a second poly-Si region; Step 6: defining a heavily N-doped area and a lightly N-doped area on the first and second poly-Si regions, and forming an LDD area; Step 7: depositing and patterning a gate insulating layer; Step 8: forming a first gate and a second gate; Step 9: forming via holes; and Step 10: forming a first source/drain and a second source/drain.
    Type: Application
    Filed: December 29, 2016
    Publication date: April 20, 2017
    Applicant: Shenzhen China Star Optoelectronics Technology Co. , Ltd.
    Inventor: Gaiping LU
  • Patent number: 9589985
    Abstract: A method of forming an LTPS TFT substrate includes: Step 1: providing a substrate (1) and depositing a buffer layer (2); Step 2: depositing an a-Si layer (3); Step 3: depositing and patterning a silicon oxide layer (4); Step 4: taking the silicon oxide layer (4) as a photomask and annealing the a-Si layer (3) with excimer laser, so that the a-Si layer crystalizes and turns into a poly-Si layer; Step 5: forming a first poly-Si region (31) and a second poly-Si region (32); Step 6: defining a heavily N-doped area and a lightly N-doped area on the first and second poly-Si regions (31) and (32), and forming an LDD area; Step 7: depositing and patterning a gate insulating layer (5); Step 8: forming a first gate (61) and a second gate (62); Step 9: forming via holes (70); and Step 10: forming a first source/drain (81) and a second source/drain (82).
    Type: Grant
    Filed: February 9, 2015
    Date of Patent: March 7, 2017
    Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
    Inventor: Gaiping Lu
  • Patent number: 9515103
    Abstract: A method of forming an LTPS TFT substrate includes: Step 1: providing a substrate (1) and depositing a buffer layer (2); Step 2: depositing an a-Si layer (3); Step 3: depositing and patterning a silicon oxide layer (4); Step 4: taking the silicon oxide layer (4) as a photomask and annealing the a-Si layer (3) with excimer laser, so that the a-Si layer crystallizes and turns into a poly-Si layer; Step 5: forming a first poly-Si region (31) and a second poly-Si region (32); Step 6: defining a heavily N-doped area and a lightly N-doped area on the first and second poly-Si regions (31) and (32), and forming an LDD area; Step 7: depositing and patterning a gate insulating layer (5); Step 8: forming a first gate (61) and a second gate (62); Step 9: forming via holes (70); and Step 10: forming a first source/drain (81) and a second source/drain (82).
    Type: Grant
    Filed: February 9, 2015
    Date of Patent: December 6, 2016
    Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
    Inventor: Gaiping Lu
  • Publication number: 20160233249
    Abstract: A method of forming an LTPS TFT substrate includes: Step 1: providing a substrate (1) and depositing a buffer layer (2); Step 2: depositing an a-Si layer (3); Step 3: depositing and patterning a silicon oxide layer (4); Step 4: taking the silicon oxide layer (4) as a photomask and annealing the a-Si layer (3) with excimer laser, so that the a-Si layer crystalizes and turns into a poly-Si layer; Step 5: forming a first poly-Si region (31) and a second poly-Si region (32); Step 6: defining a heavily N-doped area and a lightly N-doped area on the first and second poly-Si regions (31) and (32), and forming an LDD area; Step 7: depositing and patterning a gate insulating layer (5); Step 8: forming a first gate (61) and a second gate (62); Step 9: forming via holes (70); and Step 10: forming a first source/drain (81) and a second source/drain (82).
    Type: Application
    Filed: February 9, 2015
    Publication date: August 11, 2016
    Applicant: Shenzhen China Star Optoelectronics Technology Co. Ltd.
    Inventor: Gaiping LU
  • Publication number: 20160190169
    Abstract: A method of forming an LTPS TFT substrate includes: Step 1: providing a substrate (1) and depositing a buffer layer (2); Step 2: depositing an a-Si layer (3); Step 3: depositing and patterning a silicon oxide layer (4); Step 4: taking the silicon oxide layer (4) as a photomask and annealing the a-Si layer (3) with excimer laser, so that the a-Si layer crystalizes and turns into a poly-Si layer; Step 5: forming a first poly-Si region (31) and a second poly-Si region (32); Step 6: defining a heavily N-doped area and a lightly N-doped area on the first and second poly-Si regions (31) and (32), and forming an LDD area; Step 7: depositing and patterning a gate insulating layer (5); Step 8: forming a first gate (61) and a second gate (62); Step 9: forming via holes (70); and Step 10: forming a first source/drain (81) and a second source/drain (82).
    Type: Application
    Filed: February 9, 2015
    Publication date: June 30, 2016
    Applicant: Shenzhen China Star Optoelectronics Technology Co. Ltd.
    Inventor: Gaiping LU