Abstract: A spot welding method including: a main energization step of energizing a pair of opposing electrodes in pressure contact with both outer surfaces of a set of sheets where multiple sheet materials are stacked, thereby to cause melting between facing surfaces of the sheet materials; and a pressing variation step of, prior to the main energization step, causing a pulsation of pressing force applied to the set of sheets from the electrodes. A resin material such as an adhesive or a sealant may be interposed between the facing surfaces of at least a pair of the sheet materials. The period of the pulsation is 0.01 to 0.7 seconds. The amplitude of the pulsation is 10% to 90% with respect to a reference value of the pressing force. The set of sheets may include a first and a second steel sheet, and an aluminum alloy sheet that are stacked in order.

Abstract: A method of manufacturing a member for fastening by joining a nut with a tubular joint portion extending from a main body formed with an internal thread to a panel with a mounting hole for the nut on an aluminum base material. The joint portion has a rotation-preventing portion with a concave and convex shaped outer peripheral surface and a guide portion extending from the rotation-preventing portion to one side. After the guide portion is inserted into the mounting hole, the nut is energized by electrodes in contact with both nut end surface sides. The nut then generates heat, and the periphery of the mounting hole is heated and softened. When the nut is pressurized with the electrodes, the rotation-preventing portion bites into the mounting hole, and the one end portion of the guide portion is swaged to become a retaining portion on one surface side of the panel.

Abstract: A conductive film comprises a phosphide particle coated film formed by attaching raw material particles including phosphide particles comprising a compound of Ti and/or Fe, and P to a surface of a substrate material. This conductive film exhibits good corrosion resistant conductivity, and can be easily formed at low costs because of comprising the phosphide particle coated film. A corrosion-resistant conduction film comprises an iron-containing titanium phosphide layer containing Ti, Fe and P as essential basic elements. A corrosion-resistant conduction material having this corrosion-resistant conduction film on a surface of a substrate exhibits good corrosion resistance or conductivity. This corrosion-resistant conduction material can be obtained, for example, by a process comprising a plating step of forming an Ni plating layer on a surface of a Ti-based material substrate and a nitriding step of applying nitriding treatment to the Ti-based material substrate after the plating step at not more than 880 deg.

Abstract: There is provided an electron conductive and corrosion-resistant material 3 containing titanium (Ti), boron (B) and nitrogen (N) in an atomic ratio satisfying 0.05?[Ti]?0.40, 0.20?[B]?0.40, and 0.35?[N]?0.55 (provided that [Ti]+[B]+[N]=1). Further, there is provided a method of manufacturing an electron conductive and corrosion-resistant material 3, wherein boron nitride powder adheres to the surface of a substrate 2 of which at least the surface is made of titanium or a titanium alloy, and is then heated. Furthermore, there is provided a method of manufacturing an electron conductive and corrosion-resistant material 3, wherein the surface of a substrate 2 of which at least the surface is made of titanium or a titanium alloy is borided and then heated. In addition, there is provided a method of manufacturing an electron conductive and corrosion-resistant material 3, wherein a TiB2 layer formed of TiB2 particles is formed by spraying TiB2 powder onto a metal substrate 2 and then nitriding the TiB2 layer.

Abstract: The amorphous carbon film of the present invention is an amorphous carbon film comprising carbon and hydrogen, wherein the amorphous carbon film contains not more than 30 atomic % (excluding 0%) of hydrogen and, when the entire amount of the carbon is taken as 100 atomic %, carbon having an sp2 hybrid orbital is present in an amount of not less than 70 atomic % and less than 100 atomic %. Conductivity is imparted to an amorphous carbon film by controlling the contents of hydrogen, Csp3 and the like to increase a structure comprising Csp2. This amorphous carbon film can be formed by plasma CVD using a reaction gas containing one or more gases selected from a carbocyclic compound gas containing carbon having an sp2 hybrid orbital, and a heterocyclic compound gas containing carbon having an sp2 hybrid orbital and silicon and/or nitrogen. By forming the amorphous carbon film on a surface of a substrate, a conductive member can be obtained.

Abstract: A conductive film comprises a phosphide particle coated film formed by attaching raw material particles including phosphide particles comprising a compound of Ti and/or Fe, and P to a surface of a substrate material. This conductive film exhibits good corrosion resistant conductivity, and can be easily formed at low costs because of comprising the phosphide particle coated film. A corrosion-resistant conduction film comprises an iron-containing titanium phosphide layer containing Ti, Fe and P as essential basic elements. A corrosion-resistant conduction material having this corrosion-resistant conduction film on a surface of a substrate exhibits good corrosion resistance or conductivity. This corrosion-resistant conduction material can be obtained, for example, by a process comprising a plating step of forming an Ni plating layer on a surface of a Ti-based material substrate and a nitriding step of applying nitriding treatment to the Ti-based material substrate after the plating step at not more than 880 deg.

Abstract: There is provided an electron conductive and corrosion-resistant material 3 containing titanium (Ti), boron (B) and nitrogen (N) in an atomic ratio satisfying 0.05?[Ti]?0.40, 0.20?[B]?0.40, and 0.35?[N]?0.55 (provided that [Ti]+[B]+[N]=1). Further, there is provided a method of manufacturing an electron conductive and corrosion-resistant material 3, wherein boron nitride powder adheres to the surface of a substrate 2 of which at least the surface is made of titanium or a titanium alloy, and is then heated. Furthermore, there is provided a method of manufacturing an electron conductive and corrosion-resistant material 3, wherein the surface of a substrate 2 of which at least the surface is made of titanium or a titanium alloy is borided and then heated. In addition, there is provided a method of manufacturing an electron conductive and corrosion-resistant material 3, wherein a TiB2 layer formed of TiB2 particles is formed by spraying TiB2 powder onto a metal substrate 2 and then nitriding the TiB2 layer.

Abstract: The amorphous carbon film of the present invention is an amorphous carbon film comprising carbon and hydrogen, wherein the amorphous carbon film contains not more than 30 atomic % (excluding 0%) of hydrogen and, when the entire amount of the carbon is taken as 100 atomic %, carbon having an sp2 hybrid orbital is present in an amount of not less than 70 atomic % and less than 100 atomic %. Conductivity is imparted to an amorphous carbon film by controlling the contents of hydrogen, Csp3 and the like to increase a structure comprising Csp2. This amorphous carbon film can be formed by plasma CVD using a reaction gas containing one or more gases selected from a carbocyclic compound gas containing carbon having an sp2 hybrid orbital, and a heterocyclic compound gas containing carbon having an sp2 hybrid orbital and silicon and/or nitrogen. By forming the amorphous carbon film on a surface of a substrate, a conductive member can be obtained.