Patents by Inventor GAKU MIYAKE
GAKU MIYAKE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220397355Abstract: Data including a power consumption amount and an ambient temperature of a heat exchanger that discharges heat to an outside of a cooling facility in an operation mode in which the facility is operated in an operation state that requires less power consumption than usual is extracted as degradation determination reference data before degradation determination, and data including the power consumption amount and the ambient temperature in the operation mode in which the cooling facility is operated in the operation state that requires less power consumption than usual is extracted as determination data, whereby the increase in the power consumption amount due to the influence of the disturbance that changes a temperature of an inside of a box-shaped housing can be excluded, and the degradation of the cooling facility can be correctly determined by grasping the increase in the power consumption amount due to aging degradation.Type: ApplicationFiled: June 4, 2022Publication date: December 15, 2022Inventor: GAKU MIYAKE
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Patent number: 11059729Abstract: A liquid treatment device that achieves an effective treatment by forcibly contacting a swirl flow of a hydrogen peroxide-containing treated liquid with a liquid to be treated that has been processed to contain copper ions or iron ions includes a rod-like first electrode, a plate-like second electrode formed of a copper- or iron-containing metal, and a first treatment vessel that causes a liquid to swirl and generate a gas phase in a swirl flow of the liquid. A pulse voltage is applied to the generated gas phase to generate a plasma. The second electrode serves as an anode, and reaches inside of a supply section for a liquid to be treated. The liquid to be treated containing the generated copper ions or iron ions is forcibly brought into contact with hydrogen peroxide generated by the plasma. In this way, the Fenton's reaction effectively takes place, and the liquid treatment performance improves.Type: GrantFiled: November 26, 2018Date of Patent: July 13, 2021Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Takahiro Kitai, Genichiro Matsuda, Gaku Miyake, Yoshio Yamada, Naofumi Hino
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Patent number: 10934183Abstract: A liquid processing apparatus includes a processing tank, a liquid introduction port, a discharge portion, a first electrode, a second electrode, and a power supply. The liquid introduction port is disposed on a first end side of the processing tank, causes a liquid to swirl in the processing tank by introducing the liquid into the processing tank in a tangential direction of the processing tank, and generates a gas phase in a swirling flow of the liquid. The first electrode has a rod shape and is disposed at the first end on a central axis of the processing tank. The second electrode is disposed so as to be exposed to the discharge portion of the processing tank. A voltage is applied between the first electrode and the second electrode to generate plasma in the gas phase.Type: GrantFiled: February 12, 2019Date of Patent: March 2, 2021Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Gaku Miyake, Genichiro Matsuda
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Patent number: 10875790Abstract: An apparatus for producing reforming liquid includes a treatment tank in which an introduced liquid is swirled so as to generate a gas phase in the vicinity of a swirling center of a swirling flow of the liquid, a first electrode which has at least a portion which is disposed in the treatment tank and comes into contact with the liquid in the treatment tank, a second electrode which is disposed so as to come into contact with the liquid in the treatment tank and a power source which is configured to apply a voltage between the first electrode and the second electrode so as to generate plasma in the gas phase. A reformed liquid is produced in a manner that the plasma is generated in the gas phase so as to form a reformed component, and the formed reformed component is dissolved and dispersed in the liquid.Type: GrantFiled: May 17, 2017Date of Patent: December 29, 2020Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Gaku Miyake, Takahiro Kitai, Masanori Minamio, Yoshio Yamada, Genichiro Matsuda
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Patent number: 10843942Abstract: There is provided a liquid treatment apparatus which includes a treatment tank which generates a gas phase in a swirling flow of liquid, by swirling an introduced liquid and which treats liquid by applying a pulse voltage to a generated gas phase to generate plasma, in which an insulator which is an insulating space forming member is disposed on a wall surface of one end of the treatment tank so as to prevent a swirling flow from being affected, faces the space connected via the through-hole of the insulator, and thus the first electrode is disposed.Type: GrantFiled: February 1, 2018Date of Patent: November 24, 2020Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Gaku Miyake, Yoshio Yamada, Genichiro Matsuda, Takahiro Kitai
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Patent number: 10723638Abstract: A liquid treatment device includes a rod-shaped first electrode; a plate-shaped second electrode configured from a metal containing copper or iron; and a treatment vessel in which introduced liquid swirls, and generates a gas phase in a swirl flow of the liquid. A plasma is generated by applying a pulse voltage to the generated gas phase, and a negative DC voltage is applied between the first electrode and the second electrode serving as a cathode and an anode, respectively. Under the applied negative voltage, the plate-like second electrode generates copper ions or iron ions, and the copper or iron ions undergo Fenton's reaction with the hydrogen peroxide generated by the plasma so that liquid can be efficiently treated.Type: GrantFiled: November 14, 2018Date of Patent: July 28, 2020Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Genichiro Matsuda, Takahiro Kitai, Gaku Miyake, Yoshio Yamada
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Patent number: 10723637Abstract: A liquid treatment apparatus including: a tubular treatment tank whose end along a central axis is closed and sectional shape orthogonal to the central axis is a circular shape; a first electrode disposed on one end of the central axis of the treatment tank and having a bar shape; a second electrode disposed on the other end thereof; a power supply applying voltage between the first electrode and the second electrode; a rotation mechanism rotating the first electrode about a central axis of the first electrode; and an air introduction portion introducing the liquid to the one end of the central axis of the treatment tank from a tangential direction of the circular sectional shape of the treatment tank, and causing liquid to swirl about the central axis of the treatment tank therein to generate a gas phase in a swirling flow of the liquid.Type: GrantFiled: January 29, 2018Date of Patent: July 28, 2020Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Genichiro Matsuda, Takahiro Kitai, Gaku Miyake, Yoshio Yamada
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Patent number: 10654730Abstract: A liquid processing apparatus includes a processing tank, a first electrode, an insulator, a liquid introduction port, a discharge portion, a second electrode, an opening portion, and a power supply. The first electrode is disposed at the first end of the processing tank. The insulator covers at least a part of a side surface of the first electrode disposed to protrude from an inner wall of the first end of the processing tank into the processing tank. The liquid introduction port causes a liquid to swirl by introducing the liquid in a tangential direction of the processing tank and generates a gas phase in a swirling flow of the liquid. An outer diameter of the insulator is smaller than an outer diameter of a gas-phase generating space where the gas phase is generated in the processing tank.Type: GrantFiled: January 30, 2019Date of Patent: May 19, 2020Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Genichiro Matsuda, Gaku Miyake, Hiromi Matsumoto, Yoshio Yamada, Yukiko Kitahara
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Patent number: 10610821Abstract: Plasma is generated in a gas phase in a processing tub to produce a reforming component, the produced reforming component is dissolved in a liquid and is dispersed in the liquid to produce a reforming liquid, the produced reforming liquid is discharged from the processing tub to be stored in the storage tub, and gas is supplied from a gas supplier into the reforming liquid in the storage tub. The supplied gas has a bubble shape, comes into contact with the reforming liquid stored in the storage tub, and is deodorized.Type: GrantFiled: April 18, 2018Date of Patent: April 7, 2020Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Gaku Miyake, Genichiro Matsuda, Takahiro Kitai, Yoshio Yamada
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Patent number: 10561760Abstract: A space modification apparatus includes a treatment tank configured to generate a gas phase around a rotating center of a rotating flow of a liquid by rotating the liquid, a first electrode of which at least a part is in the treatment tank so as to be in contact with the liquid in the treatment tank, a second electrode in contact with the liquid in the treatment tank, and a power source configured to apply a voltage between the first electrode and the second electrode to generate plasma in the gas phase to generate modification components, the modification components being dissolved and dispersed in the liquid, and a modification liquid being generated and retained in a storage tank. The modification liquid is sprayed or scattered from a nozzle into a treatment target space via a supply pump in the form of mist.Type: GrantFiled: April 20, 2018Date of Patent: February 18, 2020Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Takahiro Kitai, Genichiro Matsuda, Yoshio Yamada, Gaku Miyake
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Publication number: 20200010340Abstract: There is provided a liquid treatment apparatus which includes a treatment tank which generates a gas phase in a swirling flow of liquid, by swirling an introduced liquid and which treats liquid by applying a pulse voltage to a generated gas phase to generate plasma, in which an insulator which is an insulating space forming member is disposed on a wall surface of one end of the treatment tank so as to prevent a swirling flow from being affected, faces the space connected via the through-hole of the insulator, and thus the first electrode is disposed.Type: ApplicationFiled: February 1, 2018Publication date: January 9, 2020Inventors: GAKU MIYAKE, YOSHIO YAMADA, GENICHIRO MATSUDA, TAKAHIRO KITAI
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Publication number: 20190352199Abstract: A liquid processing apparatus includes a processing tank, a first electrode, an insulator, a liquid introduction port, a discharge portion, a second electrode, an opening portion, and a power supply. The first electrode is disposed at the first end of the processing tank. The insulator covers at least a part of a side surface of the first electrode disposed to protrude from an inner wall of the first end of the processing tank into the processing tank. The liquid introduction port causes a liquid to swirl by introducing the liquid in a tangential direction of the processing tank and generates a gas phase in a swirling flow of the liquid. An outer diameter of the insulator is smaller than an outer diameter of a gas-phase generating space where the gas phase is generated in the processing tank.Type: ApplicationFiled: January 30, 2019Publication date: November 21, 2019Inventors: GENICHIRO MATSUDA, GAKU MIYAKE, HIROMI MATSUMOTO, YOSHIO YAMADA, YUKIKO KITAHARA
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Publication number: 20190292076Abstract: A liquid processing apparatus includes a processing tank, a liquid introduction port, a discharge portion, a first electrode, a second electrode, and a power supply. The liquid introduction port is disposed on a first end side of the processing tank, causes a liquid to swirl in the processing tank by introducing the liquid into the processing tank in a tangential direction of the processing tank, and generates a gas phase in a swirling flow of the liquid. The first electrode has a rod shape and is disposed at the first end on a central axis of the processing tank. The second electrode is disposed so as to be exposed to the discharge portion of the processing tank. A voltage is applied between the first electrode and the second electrode to generate plasma in the gas phase.Type: ApplicationFiled: February 12, 2019Publication date: September 26, 2019Inventors: GAKU MIYAKE, GENICHIRO MATSUDA
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Publication number: 20190256385Abstract: treatment apparatus including: a tubular treatment tank whose end along a central axis is closed and sectional shape orthogonal to the central axis is a circular shape; a first electrode disposed on one end of the central axis of the treatment tank and having a bar shape; a second electrode disposed on the other end thereof; a power supply applying voltage between the first electrode and the second electrode; a rotation mechanism rotating the first electrode about a central axis of the first electrode; and an air introduction portion introducing the liquid to the one end of the central axis of the treatment tank from a tangential direction of the circular sectional shape of the treatment tank, and causing liquid to swirl about the central axis of the treatment tank therein to generate a gas phase in a swirling flow of the liquid.Type: ApplicationFiled: January 29, 2018Publication date: August 22, 2019Inventors: GENICHIRO MATSUDA, TAKAHIRO KITAI, GAKU MIYAKE, YOSHIO YAMADA
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Publication number: 20190177187Abstract: A liquid treatment device that achieves an effective treatment by forcibly contacting a swirl flow of a hydrogen peroxide-containing treated liquid with a liquid to be treated that has been processed to contain copper ions or iron ions includes a rod-like first electrode, a plate-like second electrode formed of a copper- or iron-containing metal, and a first treatment vessel that causes a liquid to swirl and generate a gas phase in a swirl flow of the liquid. A pulse voltage is applied to the generated gas phase to generate a plasma. The second electrode serves as an anode, and reaches inside of a supply section for a liquid to be treated. The liquid to be treated containing the generated copper ions or iron ions is forcibly brought into contact with hydrogen peroxide generated by the plasma. In this way, the Fenton's reaction effectively takes place, and the liquid treatment performance improves.Type: ApplicationFiled: November 26, 2018Publication date: June 13, 2019Inventors: TAKAHIRO KITAI, GENICHIRO MATSUDA, GAKU MIYAKE, YOSHIO YAMADA, NAOFUMI HINO
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Publication number: 20190169051Abstract: A liquid treatment device that can improve liquid treatment performance by taking advantage of the Fenton's reaction while efficiently generating plasma for liquid treatment, in addition to enabling stable plasma generation for extended time periods includes a first electrode that is rod-like in shape; a second electrode that is plate-like in shape and is configured from a metal containing copper or iron; and a treatment vessel in which introduced liquid swirls, and generates a gas phase in a swirl flow of the liquid. A plasma is generated by applying a pulse voltage to the generated gas phase, and a negative DC voltage is applied between the first electrode and the second electrode serving as a cathode and an anode, respectively. Under the applied negative voltage, the plate-like second electrode generates copper ions or iron ions, and the copper or iron ions undergo Fenton's reaction with the hydrogen peroxide generated by the plasma so that liquid can be efficiently treated.Type: ApplicationFiled: November 14, 2018Publication date: June 6, 2019Inventors: GENICHIRO MATSUDA, TAKAHIRO KITAI, GAKU MIYAKE, YOSHIO YAMADA
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Publication number: 20180344889Abstract: There are provided a treatment tank generating a gas phase around a rotating center of a rotating flow of a liquid by rotating the introduced liquid, a first electrode whose at least a part is disposed in the treatment tank and in contact with a liquid in the treatment tank, a second electrode disposed so as to be in contact with the liquid in the treatment tank, and a power source applying a voltage between the first electrode and the second electrode to generate plasma in a gas phase, the plasma is generated in the gas phase to generate modification components, the generated modification components are dissolved and dispersed in the liquid, and a modification liquid is generated and retained in the storage tank. The modification liquid is sprayed or scattered from a nozzle into a treatment target space via a supply pump in the form of mist.Type: ApplicationFiled: April 20, 2018Publication date: December 6, 2018Inventors: TAKAHIRO KITAI, GENICHIRO MATSUDA, YOSHIO YAMADA, GAKU MIYAKE
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Publication number: 20180345210Abstract: Plasma is generated in a gas phase in a processing tub to produce a reforming component, the produced reforming component is dissolved in a liquid and is dispersed in the liquid to produce a reforming liquid, the produced reforming liquid is discharged from the processing tub to be stored in the storage tub, and gas is supplied from a gas supplier into the reforming liquid in the storage tub. The supplied gas has a bubble shape, comes into contact with the reforming liquid stored in the storage tub, and is deodorized.Type: ApplicationFiled: April 18, 2018Publication date: December 6, 2018Inventors: GAKU MIYAKE, GENICHIRO MATSUDA, TAKAHIRO KITAI, YOSHIO YAMADA
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Publication number: 20180327284Abstract: A washing machine rinse water purification device and washing apparatus including the washing machine rinse water purification device. The washing machine rinse water purification device includes a first liquid supplier, a processing tub, a buffer tub and a washing tub. In the first liquid supplier, a first liquid introduced from an introduction portion into a processing tub is swirled from an introduction portion to a discharge portion to generate a swirling flow, plasma is generated in a gas phase to produce a reforming component, the produced reforming component is dissolved in the first liquid and is dispersed in the first liquid to produce a reforming liquid, the produced reforming liquid temporarily passes through a buffer tub from a discharge portion and then is supplied into a washing tub as a second liquid.Type: ApplicationFiled: April 11, 2018Publication date: November 15, 2018Inventors: GAKU MIYAKE, GENICHIRO MATSUDA, TAKAHIRO KITAI, YOSHIO YAMADA
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Publication number: 20180230027Abstract: An apparatus for producing reforming liquid includes a treatment tank in which an introduced liquid is swirled so as to generate a gas phase in the vicinity of a swirling center of a swirling flow of the liquid, a first electrode which has at least a portion which is disposed in the treatment tank and comes into contact with the liquid in the treatment tank, a second electrode which is disposed so as to come into contact with the liquid in the treatment tank and a power source which is configured to apply a voltage between the first electrode and the second electrode so as to generate plasma in the gas phase. A reformed liquid is produced in a manner that the plasma is generated in the gas phase so as to form a reformed component, and the formed reformed component is dissolved and dispersed in the liquid.Type: ApplicationFiled: May 17, 2017Publication date: August 16, 2018Inventors: GAKU MIYAKE, TAKAHIRO KITAI, MASANORI MINAMIO, YOSHIO YAMADA, GENICHIRO MATSUDA