Patents by Inventor Gakuo Komatsubara

Gakuo Komatsubara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for electron beam irradiation
    Patent number: 6831278
    Abstract: An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.
    Type: Grant
    Filed: November 1, 2002
    Date of Patent: December 14, 2004
    Assignees: Sony Corporation, JEOL Ltd.
    Inventors: Masanobu Yamamoto, Hiroshi Kawase, Jun Sasaki, Minoru Takeda, Gakuo Komatsubara, Mitsuru Koizumi, Setsuo Norioka, Naoki Date
  • Electron beam irradiation apparatus and electron beam irradiating method
    Patent number: 6737660
    Abstract: An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18.
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: May 18, 2004
    Assignees: Sony Corporation, Jeol Ltd.
    Inventors: Yoshihisa Miura, Yuichi Aki, Hiroshi Kawase, Masanobu Yamamoto, Naoki Date, Setsuo Norioka, Mitsuru Koizumi, Gakuo Komatsubara
  • Electron beam irradiation apparatus and electron beam irradiating method
    Publication number: 20030178581
    Abstract: An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18.
    Type: Application
    Filed: February 24, 2003
    Publication date: September 25, 2003
    Inventors: Yoshihisa Miura, Yuichi Aki, Hiroshi Kawase, Masanobu Yamamoto, Naoki Date, Setsuo Norioka, Mitsuru Koizumi, Gakuo Komatsubara
  • System and method for electron beam irradiation
    Publication number: 20030116718
    Abstract: An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.
    Type: Application
    Filed: November 1, 2002
    Publication date: June 26, 2003
    Applicant: SONY CORPORATION
    Inventors: Masanobu Yamamoto, Hiroshi Kawase, Jun Sasaki, Minoru Takeda, Gakuo Komatsubara, Mitsuru Koizumi, Setsuo Norioka, Naoki Date