Patents by Inventor Galina Moutchaidze

Galina Moutchaidze has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7343664
    Abstract: A method for fabricating a magnetic head includes forming a first pole and a flux shaping layer in spaced relation to the first pole. A nonmagnetic layer is formed adjacent the flux shaping layer and positioned on an air bearing surface (ABS) side of the flux shaping layer. A tapered recess is created in the nonmagnetic layer, the taper of the recess increasing (i.e., becoming deeper) towards the flux forming layer. The recess is filled with a magnetic material. A probe layer is formed such that it is in electrical communication with the magnetic material filling the recess.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: March 18, 2008
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Gautam Khera, Sanford J. Lewis, Galina Moutchaidze, Aron Pentek, Hugo Alberto Emilio Santini, Mason Lamar Williams, III
  • Publication number: 20070103813
    Abstract: A method for fabricating a magnetic head includes forming a first pole and a flux shaping layer in spaced relation to the first pole. A nonmagnetic layer is formed adjacent the flux shaping layer and positioned on an air bearing surface (ABS) side of the flux shaping layer. A tapered recess is created in the nonmagnetic layer, the taper of the recess increasing (i.e., becoming deeper) towards the flux forming layer. The recess is filled with a magnetic material. A probe layer is formed such that it is in electrical communication with the magnetic material filling the recess.
    Type: Application
    Filed: December 22, 2006
    Publication date: May 10, 2007
    Inventors: Gautam Khera, Sanford Lewis, Galina Moutchaidze, Aron Pentek, Hugo Emilio Santini, Mason Williams
  • Patent number: 7185415
    Abstract: A method for fabricating a magnetic head includes forming a first pole and a flux shaping layer in spaced relation to the first pole. A nonmagnetic layer is formed adjacent the flux shaping layer and positioned on an air bearing surface (ABS) side of the flux shaping layer. A tapered recess is created in the nonmagnetic layer, the taper of the recess increasing (i.e., becoming deeper) towards the flux forming layer. The recess is filled with a magnetic material. A probe layer is formed such that it is in electrical communication with the magnetic material filling the recess.
    Type: Grant
    Filed: August 29, 2003
    Date of Patent: March 6, 2007
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Gautam Khera, Sanford J. Lewis, Galina Moutchaidze, Aron Pentek, Hugo Alberto Emilio Santini, Mason Lamar Williams, III
  • Publication number: 20050044699
    Abstract: A method for fabricating a magnetic head includes forming a first pole and a flux shaping layer in spaced relation to the first pole. A nonmagnetic layer is formed adjacent the flux shaping layer and positioned on an air bearing surface (ABS) side of the flux shaping layer. A tapered recess is created in the nonmagnetic layer, the taper of the recess increasing (i.e., becoming deeper) towards the flux forming layer. The recess is filled with a magnetic material. A probe layer is formed such that it is in electrical communication with the magnetic material filling the recess.
    Type: Application
    Filed: August 29, 2003
    Publication date: March 3, 2005
    Inventors: Gautam Khera, Sanford Lewis, Galina Moutchaidze, Aron Pentek, Hugo Santini, Mason Williams