Patents by Inventor Ganachev IvanPetrov

Ganachev IvanPetrov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etching amount measurement apparatus for dry etching apparatus
    Patent number: 9612205
    Abstract: According to one embodiment, an etching amount measurement pattern is provided in a surface of a substrate. The pattern comprises a plurality of components two-dimensionally disposed and causing light incident on the pattern to be diffracted, A configuration of the component has 4-fold rotational symmetry. The plurality of components is arranged in a disposition having 4-fold rotational symmetry.
    Type: Grant
    Filed: August 20, 2014
    Date of Patent: April 4, 2017
    Assignee: SHIBAURA MECHATRONICS CORPORATION
    Inventors: Ganachev IvanPetrov, Munenori Iwami
  • ETCHING AMOUNT MEASUREMENT PATTERN, ETCHING AMOUNT MEASUREMENT APPARATUS, AND ETCHING AMOUNT MEASUREMENT METHOD
    Publication number: 20150062578
    Abstract: According to one embodiment, an etching amount measurement pattern is provided in a surface of a substrate. The pattern comprises a plurality of components two-dimensionally disposed and causing light incident on the pattern to be diffracted, A configuration of the component has 4-fold rotational symmetry. The plurality of components is arranged in a disposition having 4-fold rotational symmetry.
    Type: Application
    Filed: August 20, 2014
    Publication date: March 5, 2015
    Inventors: Ganachev IvanPetrov, Munenori Iwami