Patents by Inventor Ganapathi Raman Sankaranarayanan

Ganapathi Raman Sankaranarayanan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Detecting outliers at a manufacturing system using machine learning
    Patent number: 11842910
    Abstract: Methods and systems for detecting outliers at a manufacturing system using machine learning are provided. Data collected by a sensors at a manufacturing system during a current process performed for a first set of substrates is provided as input to a trained machine learning model. One or more outputs are obtained from the trained machine learning model. A first amount of drift of a first set of parameter values for the first set of substrates from a target set of parameter values for the first set of substrates is extracted from the one or more outputs. A second amount of drift of each of the first set of parameter values for the first set of substrates from a corresponding parameter value of a second set of parameter values for a second set of substrates processed according to the current process at the manufacturing system prior to the performance of the current process for the first set of substrates is also extracted from the one or more outputs.
    Type: Grant
    Filed: February 4, 2021
    Date of Patent: December 12, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Bharath Ram Sundar, Raman K Nurani, Ramkishore Sankarasubramanian, Ramachandran Subramanian, Bharath Muralidharan, Ramaswamy Melatoor Narayanan, Ganapathi Raman Sankaranarayanan
  • DETECTING OUTLIERS AT A MANUFACTURING SYSTEM USING MACHINE LEARNING
    Publication number: 20220246457
    Abstract: Methods and systems for detecting outliers at a manufacturing system using machine learning are provided. Data collected by a sensors at a manufacturing system during a current process performed for a first set of substrates is provided as input to a trained machine learning model. One or more outputs are obtained from the trained machine learning model. A first amount of drift of a first set of parameter values for the first set of substrates from a target set of parameter values for the first set of substrates is extracted from the one or more outputs. A second amount of drift of each of the first set of parameter values for the first set of substrates from a corresponding parameter value of a second set of parameter values for a second set of substrates processed according to the current process at the manufacturing system prior to the performance of the current process for the first set of substrates is also extracted from the one or more outputs.
    Type: Application
    Filed: February 4, 2021
    Publication date: August 4, 2022
    Inventors: Bharath Ram Sundar, Raman K Nurani, Ramkishore Sankarasubramanian, Ramachandran Subramanian, Bharath Muralidharan, Ramaswamy Melatoor Narayanan, Ganapathi Raman Sankaranarayanan