Patents by Inventor Gang Fu

Gang Fu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250166874
    Abstract: Disclosed are a neodymium-iron-boron magnet material, a preparation method, use thereof and a motor. The neodymium-iron-boron magnet material has an amorphous RE-rich phase located in a grain boundary phase. The amorphous RE-rich phase, containing elements TM, RE, Cu and Ga at an atom ratio of TM:RE:Cu:Ga=(15-30):(40-60):(10-25):(10-30), accounts for 3-8% by volume of the grain boundary phase. TM is Fe and Co. RE is a rare earth element. The neodymium-iron-boron magnet material increases the coercivity using none or a small amount of heavy rare earth elements, while maintaining high remanence and magnetic energy.
    Type: Application
    Filed: November 4, 2022
    Publication date: May 22, 2025
    Inventors: Weiguo Mou, Chen Wang, Zhigao Huang, Gang Fu, Deqin Xu
  • Publication number: 20250118543
    Abstract: Methods, apparatuses and systems for detecting and managing arc events during a plasma chamber process include receiving impedance data measured during a plasma chamber process, analyzing the impedance data to determine if an arc event is occurring during the plasma chamber process, and if it is determined that an arc event is occurring, an action is taken to suppress an arc of the arc event. In some instances, a machine learning model that has been trained to recognize when an arc event is occurring from received measurement data is used to determine if an arc event is occurring.
    Type: Application
    Filed: November 15, 2024
    Publication date: April 10, 2025
    Inventors: Tiefeng SHI, Gang FU, Keith A. MILLER
  • Publication number: 20250087394
    Abstract: The invention discloses a neodymium-iron-boron magnet material, a preparation method, and use thereof. The neodymium-iron-boron magnet material of the invention comprises a nanocrystalline Cu-rich phase located in an intergranular triangular zone, wherein: the nanocrystalline Cu-rich phase consists of elements TM, RE, Cu and Ga at an atom ratio of TM:RE:Cu:Ga=(1-20):(20-55):(25-70):(1-15); and a volume percentage of the nanocrystalline Cu-rich phase in the intergranular triangular zone is 4-12%, wherein TM comprises Fe and/or Co, and RE is a rare earth element. The neodymium-iron-boron magnet material of the present invention can improve the intrinsic coercivity and reduce the cost without using heavy rare earth elements or using a small amount of heavy rare earth elements, while maintaining the performances of higher remanence, magnetic energy product and squareness.
    Type: Application
    Filed: November 4, 2022
    Publication date: March 13, 2025
    Inventors: Weiguo MOU, Chen WANG, Zhigao HUANG, Gang FU, Deqin XU
  • Publication number: 20250069785
    Abstract: The invention discloses a neodymium-iron-boron magnet material, a preparation method, and use thereof. The neodymium-iron-boron magnet material comprises following components of: R: 28.00-32.00 wt %, wherein the R is a rare earth element; Al: 0.00-1.00 wt %; Cu: 0.12-0.50 wt %; B: 0.85-1.10 wt %; and a balance of Fe, wherein wt % refers to a weight percentage of respective elements in the neodymium-iron-boron magnet material; a volume percentage of a Nd—O phase having a FCC type crystal structure in an intergranular triangular zone of the neodymium-iron-boron magnet material in a grain boundary phase of the neodymium-iron-boron magnet material is equal to or less than 20%. By reducing the proportion of the Nd—O phase having the FCC type crystal structure, the present invention enhances the demagnetizing coupling ability of the grain boundary phase and improves the consistency of the intrinsic coercivity of the magnet.
    Type: Application
    Filed: November 4, 2022
    Publication date: February 27, 2025
    Applicant: FUJIAN GOLDEN DRAGON RARE-EARTH Co., Ltd.
    Inventors: Weiguo MOU, Chen WANG, Zhigao HUANG, Gang FU, Deqin XU
  • Patent number: 12176190
    Abstract: Methods, apparatuses and systems for detecting and managing arc events during a plasma chamber process include receiving impedance data measured during a plasma chamber process, analyzing the impedance data to determine if an arc event is occurring during the plasma chamber process, and if it is determined that an arc event is occurring, an action is taken to suppress an arc of the arc event. In some instances, a machine learning model that has been trained to recognize when an arc event is occurring from received measurement data is used to determine if an arc event is occurring.
    Type: Grant
    Filed: March 7, 2023
    Date of Patent: December 24, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Tiefeng Shi, Gang Fu, Keith A. Miller
  • Patent number: 12131543
    Abstract: A semantic-based method and apparatus for retrieving a perspective image, an electronic device and a computer-readable storage medium are provided. An method includes obtaining a perspective image for a space containing an inspected object therein. A semantic division on the perspective image is performed using a first method, to obtain a plurality of semantic region units. A feature extraction network is constructed using a second method. Based on the perspective image and each of the plurality of semantic region units, a feature of each semantic region unit is extracted using the feature extraction network. Based on the feature of each semantic region unit, an image most similar to the semantic region unit is retrieved from an image feature database, to assist in determining an inspected object in the semantic region unit.
    Type: Grant
    Filed: March 15, 2021
    Date of Patent: October 29, 2024
    Assignees: Tsinghua University, Nuctech Company Limited
    Inventors: Li Zhang, Zhiqiang Chen, Yuanjing Li, Yuxiang Xing, Fanhua Meng, Qiang Li, Wei Li, Gang Fu
  • Publication number: 20240304429
    Abstract: Methods, apparatuses and systems for detecting and managing arc events during a plasma chamber process include receiving impedance data measured during a plasma chamber process, analyzing the impedance data to determine if an arc event is occurring during the plasma chamber process, and if it is determined that an arc event is occurring, an action is taken to suppress an arc of the arc event. In some instances, a machine learning model that has been trained to recognize when an arc event is occurring from received measurement data is used to determine if an arc event is occurring.
    Type: Application
    Filed: March 7, 2023
    Publication date: September 12, 2024
    Inventors: Tiefeng SHI, Gang FU, Keith A. MILLER
  • Publication number: 20240145137
    Abstract: A main and auxiliary alloy-based neodymium-iron-boron magnet material and the preparation method thereof. The raw material composition for the main and auxiliary alloy-based neodymium-iron-boron magnet material includes a main alloy raw material and an auxiliary alloy raw material, wherein the mass percentage of the auxiliary alloy raw material in the raw material composition for the main and auxiliary alloy-based neodymium-iron-boron magnet material is 1.0-15.0 mass %. For the main and auxiliary alloy-based neodymium-iron-boron magnet material prepared by using the raw material composition, the coercivity is increased while high remanence is ensured, and the preparation method therefor can be suitable for engineering applications.
    Type: Application
    Filed: January 17, 2022
    Publication date: May 2, 2024
    Applicant: Fujian Changting Golden Dragon Rare-Earth Co., Ltd
    Inventors: Xing WEI, Jiaying HUANG, Zhihui TANG, Qingfang HUANG, Zhipeng JIANG, Deqin XU, Dakun CHEN, Gang FU
  • Patent number: 11972363
    Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for obtaining a plurality of model representations of predictive models, each model representation associated with a respective user and expresses a respective predictive model, and selecting a model implementation for each of the model representations based on one or more system usage properties associated with the user associated with the corresponding model representation.
    Type: Grant
    Filed: May 22, 2020
    Date of Patent: April 30, 2024
    Assignee: Google LLC
    Inventors: Wei-Hao Lin, Travis H. K. Green, Robert Kaplow, Gang Fu, Gideon S. Mann
  • Publication number: 20240112886
    Abstract: Embodiments provided herein generally include apparatus, plasma processing systems and methods for dynamic impedance matching across multiple frequency bands of a power source. An example method includes amplifying a broadband signal, splitting the amplified broadband signal across a plurality of channel paths coupled to an impedance matching network, and adjusting at least one first impedance associated with the impedance matching network to achieve a second impedance within a threshold value based at least in part on feedback associated with the broadband signal. The impedance matching network includes a plurality of impedance matching circuits coupled to plasma excitation circuitry, and each of the impedance matching circuits is coupled to a different path of the plurality of channel paths and an output node.
    Type: Application
    Filed: June 13, 2023
    Publication date: April 4, 2024
    Inventors: Tiefeng SHI, Gang FU, Keith A. MILLER
  • Patent number: 11898236
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a processing chamber for processing a substrate comprises a sputtering target, a chamber wall at least partially defining an inner volume within the processing chamber and connected to ground, a power source comprising an RF power source, a process kit surrounding the sputtering target and a substrate support, an auto capacitor tuner (ACT) connected to ground and the sputtering target, and a controller configured to energize the cleaning gas disposed in the inner volume of the processing chamber to create the plasma and tune the sputtering target using the ACT to maintain a predetermined potential difference between the plasma in the inner volume and the process kit during the etch process to remove sputtering material from the process kit, wherein the predetermined potential difference is based on a resonant point of the ACT.
    Type: Grant
    Filed: October 20, 2021
    Date of Patent: February 13, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Zhiyong Wang, Halbert Chong, John C. Forster, Irena H. Wysok, Tiefeng Shi, Gang Fu, Renu Whig, Keith A Miller, Sundarapandian Ramalinga Vijayalakshmi Reddy, Jianxin Lei, Rongjun Wang, Tza-Jing Gung, Kirankumar Neelasandra Savandaiah, Avinash Nayak, Lei Zhou
  • Publication number: 20240037816
    Abstract: A method of training an image decomposition model, a method of decomposing an image, an electronic device, and a storage medium are provided. The method of training the image decomposition model includes: acquiring a training set; inputting first and second training images into first and second adversarial neural networks respectively, so as to determine a first loss function value; inputting a third training image into the first and second adversarial neural networks respectively, so as to determine a second loss function value; determining a third loss function value according to a comparison result between an acquired fusion image and the third training image, where the fusion image is generated by fusing generated images of the first and second adversarial neural networks, and adjusting a parameter of the image decomposition model according to at least one of the first to third loss function values.
    Type: Application
    Filed: July 21, 2023
    Publication date: February 1, 2024
    Inventors: Li ZHANG, Yunda SUN, Zheng HU, Gang FU, Qiang LI
  • Patent number: 11676801
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a matching network for use with a plasma processing chamber comprises an input configured to connect to a power source, an output configured to connect to the plasma processing chamber, a V/I sensor connected between the input of the matching network and an output of the power source, a load capacitor connected in parallel with at least one capacitor connected in series with a load switch, a tuning capacitor connected in series with at least one capacitor connected in parallel with a tuning switch, and a multiple level pulsing phase/magnitude module connected to the V/I sensor and to a multiple level pulsing synchronization switch driver connected to each of the load switch and the tuning switch for activating at least one of the load switch and the tuning switch in response to a control signal, which is based on a V/I sensor measurement, received from the power source.
    Type: Grant
    Filed: May 28, 2021
    Date of Patent: June 13, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Tiefeng Shi, Keith A. Miller, Gang Fu
  • Patent number: 11651982
    Abstract: A drying block structure is provided, including a main body and a protective layer. The main body has a honeycomb and substantially circular shape. The protective layer covers the main body and has a porous structure. The main body and the protective layer are integrally formed as one piece.
    Type: Grant
    Filed: October 11, 2019
    Date of Patent: May 16, 2023
    Assignee: WINBOND ELECTRONICS CORP.
    Inventors: Cheng-Gang Fu, Bo-Ren Chi, Tze-Ching Chuang, Te-Wei Chu
  • Publication number: 20230144433
    Abstract: Provided is a method of verifying an authenticity of declaration information. The method includes: acquiring a machine-detected radiation image obtained by scanning a container loaded with an article; acquiring a declaration information for declaring the article in the container; performing an identification on an image information of the article in the machine-detected radiation image to obtain an image feature corresponding to the machine-detected radiation image; performing an identification on a text information of the article in the declaration information to obtain a text feature corresponding to the declaration information; screening a declaration category of the article in the container by taking the image feature as an input information and the text feature as an external introduction feature; and determining that the declaration information is in doubt when a declaration category of at least one article in the container does not belong to a declaration category in the declaration information.
    Type: Application
    Filed: November 4, 2022
    Publication date: May 11, 2023
    Applicants: NUCTECH COMPANY LIMITED, Tsinghua University
    Inventors: Li ZHANG, Yuxiang XING, Hu TANG, Yunda SUN, Gang FU, Qiang LI, Yan ZHANG, Wubin WU
  • Publication number: 20230122956
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a processing chamber for processing a substrate comprises a sputtering target, a chamber wall at least partially defining an inner volume within the processing chamber and connected to ground, a power source comprising an RF power source, a process kit surrounding the sputtering target and a substrate support, an auto capacitor tuner (ACT) connected to ground and the sputtering target, and a controller configured to energize the cleaning gas disposed in the inner volume of the processing chamber to create the plasma and tune the sputtering target using the ACT to maintain a predetermined potential difference between the plasma in the inner volume and the process kit during the etch process to remove sputtering material from the process kit, wherein the predetermined potential difference is based on a resonant point of the ACT.
    Type: Application
    Filed: October 20, 2021
    Publication date: April 20, 2023
    Inventors: Zhiyong WANG, Halbert CHONG, John C. FORSTER, Irena H. WYSOK, Tiefeng SHI, Gang FU, Renu WHIG, Keith A. MILLER, Sundarapandian Ramalinga Vijayalakshmi REDDY, Jianxin LEI, Rongjun WANG, Tza-Jing GUNG, Kirankumar Neelasandra SAVANDAIAH, Avinash NAYAK, Lei ZHOU
  • Publication number: 20220384149
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a matching network for use with a plasma processing chamber comprises an input configured to connect to a power source, an output configured to connect to the plasma processing chamber, a V/I sensor connected between the input of the matching network and an output of the power source, a load capacitor connected in parallel with at least one capacitor connected in series with a load switch, a tuning capacitor connected in series with at least one capacitor connected in parallel with a tuning switch, and a multiple level pulsing phase/magnitude module connected to the V/I sensor and to a multiple level pulsing synchronization switch driver connected to each of the load switch and the tuning switch for activating at least one of the load switch and the tuning switch in response to a control signal, which is based on a V/I sensor measurement, received from the power source.
    Type: Application
    Filed: May 28, 2021
    Publication date: December 1, 2022
    Inventors: Tiefeng SHI, Keith A. MILLER, Gang FU
  • Patent number: D1015453
    Type: Grant
    Filed: January 21, 2022
    Date of Patent: February 20, 2024
    Inventor: Gang Fu
  • Patent number: D1016190
    Type: Grant
    Filed: December 16, 2021
    Date of Patent: February 27, 2024
    Inventor: Gang Fu
  • Patent number: D1031879
    Type: Grant
    Filed: August 29, 2022
    Date of Patent: June 18, 2024
    Inventor: Gang Fu