Abstract: The present invention provides a method for detecting an ultra-small defect on a wafer surface, film layer having ultra-small defect that causes abnormalities on the surface of the film layer; form a photoresist pattern with a pattern defect; etching the film layer according to the photoresist pattern to form a film layer pattern with an enlarged defect; and scanning the film layer pattern by using a defect scanner to capture the enlarged defect. In this method, enlarging the size of the ultra-fine particle defect through the exposure defocusing principle; or by adding the photomask consisting of the repeating units, using the repetition pattern as the exposure pattern and combing with the repeating cell to cell comparison method, the capture ability of the detection machine is further improved. Therefore, it can be detected by amplifying the defects of ultrafine particles which cannot be detected by conventional methods.

Abstract: A method for generating an image parameter for a reproducible virtual character includes: receiving a trigger signal for generating a virtual character; acquiring a generation rule of an image parameter of the virtual character, the image parameter comprising n characteristic parameters configured to indicate an image of the virtual character; and generating a gene sequence of an ith characteristic parameter in the n characteristic parameters according to the generation rule.

Abstract: The present invention provides a method for detecting an ultra-small defect on a wafer surface, film layer having ultra-small defect that causes abnormalities on the surface of the film layer; form a photoresist pattern with a pattern defect; etching the film layer according to the photoresist pattern to form a film layer pattern with an enlarged defect; and scanning the film layer pattern by using a defect scanner to capture the enlarged defect. In this method, enlarging the size of the ultra-fine particle defect through the exposure defocusing principle; or by adding the photomask consisting of the repeating units, using the repetition pattern as the exposure pattern and combing with the repeating cell to cell comparison method, the capture ability of the detection machine is further improved. Therefore, it can be detected by amplifying the defects of ultrafine particles which cannot be detected by conventional methods.

Abstract: A method for generating an image parameter for a reproducible virtual character includes: receiving a trigger signal for generating a virtual character; acquiring a generation rule of an image parameter of the virtual character, the image parameter comprising n characteristic parameters configured to indicate an image of the virtual character; and generating a gene sequence of an ith characteristic parameter in the n characteristic parameters according to the generation rule.