Patents by Inventor Gap Su Han

Gap Su Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8505559
    Abstract: A cleaning apparatus in which a cleaning process is simplified, a time required for the cleaning process is reduced and which has an excellent cleaning effect, and a high pressure cleaner for use therein are provided.
    Type: Grant
    Filed: July 19, 2010
    Date of Patent: August 13, 2013
    Assignee: Industry-University Cooperation Foundation Sogang University
    Inventors: Gap Su Han, Ki Pung Yoo, Jong Sung Lim, Young Hoon Kwon
  • Patent number: 8080114
    Abstract: Provided is a cleaning process which is simplified and in which a time required for the cleaning process is reduced and which has an excellent cleaning effect. The cleaning process comprises loading a wafer in a high pressure cleaner, injecting high-purity gaseous carbon dioxide (CO2) having low pressure into the high pressure cleaner, injecting CO2 having lower pressure than supercritical cleaning pressure into the high pressure cleaner, cleaning the wafer by injecting a supercritical homogeneous transparent phase mixture in which a cleaning additive and supercritical CO2 are mixed, into the high pressure cleaner under a supercritical cleaning pressure, rinsing the wafer by injecting a supercritical rinsing mixture in which a rinsing additive and supercritical CO2 are mixed, into the high pressure cleaner, and separating CO2 from a mixture discharged from the high pressure cleaner.
    Type: Grant
    Filed: August 4, 2006
    Date of Patent: December 20, 2011
    Assignee: Industry-University Cooperation Foundation Sogang University
    Inventors: Gap Su Han, Ki Pung Yoo, Jong Sung Lim, Young Hoon Kwon
  • Publication number: 20110120507
    Abstract: A cleaning apparatus in which a cleaning process is simplified, a time required for the cleaning process is reduced and which has an excellent cleaning effect, and a high pressure cleaner for use therein are provided.
    Type: Application
    Filed: July 19, 2010
    Publication date: May 26, 2011
    Applicant: Industry-University Cooperation Foundation Sogang University
    Inventors: Gap Su HAN, Ki Pung YOO, Jong Sung LIM, Young Hoon KWON
  • Publication number: 20070169791
    Abstract: Provided is a cleaning process which is simplified and in which a time required for the cleaning process is reduced and which has an excellent cleaning effect. The cleaning process comprises loading a wafer in a high pressure cleaner, injecting high-purity gaseous carbon dioxide (CO2) having low pressure into the high pressure cleaner, injecting CO2 having lower pressure than supercritical cleaning pressure into the high pressure cleaner, cleaning the wafer by injecting a supercritical homogeneous transparent phase mixture in which a cleaning additive and supercritical CO2 are mixed, into the high pressure cleaner under a supercritical cleaning pressure, rinsing the wafer by injecting a supercritical rinsing mixture in which a rinsing additive and supercritical CO2 are mixed, into the high pressure cleaner, and separating CO2 from a mixture discharged from the high pressure cleaner.
    Type: Application
    Filed: August 4, 2006
    Publication date: July 26, 2007
    Inventors: Gap Su Han, Ki Pung Yoo, Jong Sung Lim, Young Hoon Kwon
  • Publication number: 20070169794
    Abstract: A cleaning apparatus in which a cleaning process is simplified, a time required for the cleaning process is reduced and which has an excellent cleaning effect, and a high pressure cleaner for use therein are provided.
    Type: Application
    Filed: August 4, 2006
    Publication date: July 26, 2007
    Inventors: Gap Su Han, Ki Pung Yoo, Jong Sung Lim, Young Hoon Kwon