Patents by Inventor Ga Ram CHOI

Ga Ram CHOI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240015965
    Abstract: There are provided a semiconductor memory device and a method of manufacturing the semiconductor memory device. The semiconductor memory device includes a doped semiconductor layer including an upper surface facing a first direction, a multifunctional stack including a plurality of interlayer insulating layers and a plurality of conductive layers stacked alternately with each other in the first direction above the doped semiconductor layer, the multifunctional stack including a groove, a liner insulating layer on a bottom surface of the groove, a liner semiconductor layer on the liner insulating layer, and a first electrode and a second electrode spaced apart from each other in the groove and extending in the first direction from the liner semiconductor layer.
    Type: Application
    Filed: December 2, 2022
    Publication date: January 11, 2024
    Applicant: SK hynix Inc.
    Inventors: Ga Ram CHOI, Dae Hyun KIM, Changhan Kim
  • Publication number: 20230183192
    Abstract: The present invention relates to a compound of formula 1 and a pharmaceutical composition containing same. This compound may be useful as: a therapeutic agent for degenerative brain diseases including dementia or cranial nerve diseases and developmental disorders caused by neural cell damage, various degenerative neural diseases, ischemic nerve diseases, or neural damage diseases; a learning ability-improving agent; and a cognitive function-improving agent. [Formula 1] in formula 1 above, B represents a part derived from retinoic acid.
    Type: Application
    Filed: August 25, 2020
    Publication date: June 15, 2023
    Applicants: ETNOVA THERAPEUTICS CORP., KYUNGPOOK NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Sha Joung CHANG, Yeoun Hee KIM, Jung Jin LEE, Ga Ram CHOI, Yong Min CHANG
  • Patent number: 11651813
    Abstract: A clock correction circuit in which a correction accuracy of a duty cycle is increased is provided.
    Type: Grant
    Filed: July 20, 2021
    Date of Patent: May 16, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hun-Dae Choi, Ga Ram Choi
  • Publication number: 20220165322
    Abstract: A clock correction circuit in which a correction accuracy of a duty cycle is increased is provided.
    Type: Application
    Filed: July 20, 2021
    Publication date: May 26, 2022
    Inventors: Hun-Dae CHOI, Ga Ram CHOI
  • Patent number: 9242230
    Abstract: The present invention relates to a method for preparing a cobalt-based catalyst for Fischer-Tropsch synthesis, more particularly to a method for preparing a cobalt-based catalyst represented by Ir—Co/?-Al2O3 wherein cobalt and iridium are supported at high density by repeating impregnation and drying tens of times on a spherical ?-alumina support having many acidic sites. The catalyst prepared according to the present invention can provide improved conversion rate of carbon monoxide and selectivity for liquid hydrocarbons when used for Fischer-Tropsch synthesis.
    Type: Grant
    Filed: August 20, 2013
    Date of Patent: January 26, 2016
    Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Dong Ju Moon, Jae Sun Jung, Jae Suk Lee, Eun Hyeok Yang, Hyun Jin Kim, Bang Hee Kim, Seung Hwan Lee, Yun Ju Lee, Ga Ram Choi
  • Patent number: 9242228
    Abstract: The present invention relates to a method for preparing a nickel-based catalyst for steam carbon dioxide reforming (SCR) of natural gas using steam and carbon dioxide, more particularly to a method for preparing a nickel-based catalyst represented by Ni/?-Al2O3, which is prepared by supporting nickel on a spherical ?-alumina support having many acid sites at high density by repeating impregnation and drying tens of times. The catalyst prepared according to the present invention exhibits superior catalytic activity when used in steam carbon dioxide reforming reaction (SCR) even under harsh conditions of high temperature and high pressure and hardly exhibits carbon deposition due to superior durability.
    Type: Grant
    Filed: April 30, 2014
    Date of Patent: January 26, 2016
    Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Dong Ju Moon, Jae Sun Jung, Eun Hyeok Yang, Sang Woo Kim, Jae Suk Lee, Bang Hee Kim, Jong Tae Jung, Hyun Jin Kim, Ga Ram Choi, Byoung Sung Ahn
  • Publication number: 20140349845
    Abstract: The present invention relates to a method for preparing a cobalt-based catalyst for Fischer-Tropsch synthesis, more particularly to a method for preparing a cobalt-based catalyst represented by Ir—Co/?-Al2O3 wherein cobalt and iridium are supported at high density by repeating impregnation and drying tens of times on a spherical ?-alumina support having many acidic sites. The catalyst prepared according to the present invention can provide improved conversion rate of carbon monoxide and selectivity for liquid hydrocarbons when used for Fischer-Tropsch synthesis.
    Type: Application
    Filed: August 20, 2013
    Publication date: November 27, 2014
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Dong Ju MOON, Jae Sun JUNG, Jae Suk LEE, Eun Hyeok YANG, Hyun Jin KIM, Bang Hee KIM, Seung Hwan LEE, Yun Ju LEE, Ga Ram CHOI
  • Publication number: 20140349836
    Abstract: The present invention relates to a method for preparing a nickel-based catalyst for steam carbon dioxide reforming (SCR) of natural gas using steam and carbon dioxide, more particularly to a method for preparing a nickel-based catalyst represented by Ni/?-Al2O3, which is prepared by supporting nickel on a spherical ?-alumina support having many acid sites at high density by repeating impregnation and drying tens of times. The catalyst prepared according to the present invention exhibits superior catalytic activity when used in steam carbon dioxide reforming reaction (SCR) even under harsh conditions of high temperature and high pressure and hardly exhibits carbon deposition due to superior durability.
    Type: Application
    Filed: April 30, 2014
    Publication date: November 27, 2014
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Dong Ju MOON, Jae Sun JUNG, Eun Hyeok YANG, Sang Woo KIM, Jae Suk LEE, Bang Hee KIM, Jong Tae JUNG, Hyun Jin KIM, Ga Ram CHOI, Byoung Sung AHN