Patents by Inventor Garrett Lin

Garrett Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multilayer structure for absorbing electromagnetic wave and manufacturing method thereof
    Patent number: 6972366
    Abstract: A film structure for absorbing electromagnetic wave and manufacturing method thereof is provided. The multilayer film structure is composed of a plurality of polymer films and a plurality of permeability films. The polymer films have a multi-film stacking structure and the polymer films are composed of a carbon group compound structure. The permeability films are formed on each surface of the polymer films. Thus, every neighboring permeability films will have magnetic moments in opposite direction, and all the emitted electromagnetic waves will be cancelled by the permeability films, or be reflected in any one of the polymer films until the energies of the electromagnetic waves are consumed, or be absorbed by the carbon group compound structure and be transferred into thermal energy.
    Type: Grant
    Filed: July 17, 2003
    Date of Patent: December 6, 2005
    Inventors: Li-Hsien Yen, Garrett Lin
  • MULTILAYER STRUCTURE FOR ABSORBING ELECTROMAGNATIC WAVE AND MANUFACTURING METHOD THEREOF
    Publication number: 20050025986
    Abstract: A film structure for absorbing electromagnetic wave and manufacturing method thereof is provided. The multilayer film structure is composed of a plurality of polymer films and a plurality of permeability films. The polymer films have a multi-film stacking structure and the polymer films are composed of a carbon group compound structure. The permeability films are formed on each surface of the polymer films. Thus, every neighboring permeability films will have magnetic moments in opposite direction, and all the emitted electromagnetic waves will be cancelled by the permeability films, or be reflected in any one of the polymer films until the energies of the electromagnetic waves are consumed, or be absorbed by the carbon group compound structure and be transferred into thermal energy.
    Type: Application
    Filed: September 30, 2004
    Publication date: February 3, 2005
    Inventors: Li-Hsien Yen, Garrett Lin
  • [MULTILAYER STRUCTURE FOR ABSORBING ELECTROMAGNATIC WAVE AND MANUFACTURING METHOD THEREOF]
    Publication number: 20040234750
    Abstract: A film structure for absorbing electromagnetic wave and manufacturing method thereof is provided. The multilayer film structure is composed of a plurality of polymer films and a plurality of permeability films. The polymer films have a multi-film stacking structure and the polymer films are composed of a carbon group compound structure. The permeability films are formed on each surface of the polymer films. Thus, every neighboring permeability films will have magnetic moments in opposite direction, and all the emitted electromagnetic waves will be cancelled by the permeability films, or be reflected in any one of the polymer films until the energies of the electromagnetic waves are consumed, or be absorbed by the carbon group compound structure and be transferred into thermal energy.
    Type: Application
    Filed: July 17, 2003
    Publication date: November 25, 2004
    Inventors: Li-Hsien Yen, Garrett Lin