Abstract: To clean components in semiconductor manufacturing equipment, such as an optical system or an electron beam system, a component is heated in a chamber. A supercritical fluid formulation is applied to the component in the chamber, which removes molecular and/or particulate contaminants. The supercritical fluid formulation can include one or more of carbon dioxide, water, HCF, alkane, alkene, nitrous oxide, methanol, ethanol, or acetone.

Abstract: An enclosure surrounding the optical component can be connected with a vapor source. The vapor source can provide a vapor to the enclosure with a vapor level from 500 ppm to 15000 ppm. The concentration of vapor in the enclosure can increase the lifespan of the optical component in the enclosure.

Abstract: An enclosure surrounding the optical component can be connected with a vapor source. The vapor source can provide a vapor to the enclosure with a vapor level from 500 ppm to 15000 ppm. The concentration of vapor in the enclosure can increase the lifespan of the optical component in the enclosure.

Abstract: An electron extractor of an electron source capable of absorbing contaminant materials from a cavity proximate to the extractor is disclosed. The electron extractor includes a body. The body of the electron extractor is formed from one or more non-evaporable getter materials. The one or more non-evaporable getter materials absorb one or more contaminants contained within a region proximate to the body of the electron extractor. The body of the electron extractor is further configured to extract electrons from one or more emitters posited proximate to the body of the electron extractor.

Abstract: The invention relates to a method for manufacturing an electronic device, particularly a device including a flexible and/or low-cost substrate and/or carbon nanotubes, and also relates to electronic devices produced using said method.

Abstract: A system for imaging a sample through a protective pellicle is disclosed. The system includes an electron beam source configured to generate an electron beam and a sample stage configured to secure a sample and a pellicle, wherein the pellicle is disposed above the sample. The system also includes an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through the pellicle and onto a portion of the sample. In addition, the system includes a detector assembly positioned above the pellicle and configured to detect electrons emanating from the surface of the sample.

Abstract: The invention relates to a method for manufacturing an electronic device, particularly a device including a flexible and/or low-cost substrate and/or carbon nanotubes, and also relates to electronic devices produced using said method.

Abstract: An apparatus for cross-flow purging for optical components in a chamber, including: a housing with first and second axial ends, a side wall extending in an axial direction and connecting the first and second axial ends, and the chamber formed by the first and second axial ends and the side wall; an optical component disposed within the chamber and fixed with respect to the housing via at least one connecting point on the optical component; an inlet port aligned with the side wall, between the first and second axial ends in the axial direction, in a radial direction orthogonal to the axial direction and arranged to inject a purge gas into the chamber and across the optical component in a radial direction orthogonal to the axial direction; and an exhaust port aligned with the side wall in the radial direction and arranged to exhaust the purge gas from the chamber.

Abstract: An apparatus for producing a high purity stream of ozone including a reaction chamber having an inlet and an outlet, a gaseous feed stream having a first purified component and an ultraviolet source. The gaseous feed stream enters the reaction chamber through the inlet, the first purified component includes oxygen, the ultraviolet source forms ozone from the oxygen, and the ozone exits the reaction chamber through the outlet.

Abstract: An electron extractor of an electron source capable of absorbing contaminant materials from a cavity proximate to the extractor is disclosed. The electron extractor includes a body. The body of the electron extractor is formed from one or more non-evaporable getter materials. The one or more non-evaporable getter materials absorb one or more contaminants contained within a region proximate to the body of the electron extractor. The body of the electron extractor is further configured to extract electrons from one or more emitters posited proximate to the body of the electron extractor.

Abstract: A system for imaging a sample through a protective pellicle is disclosed. The system includes an electron beam source configured to generate an electron beam and a sample stage configured to secure a sample and a pellicle, wherein the pellicle is disposed above the sample. The system also includes an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through the pellicle and onto a portion of the sample. In addition, the system includes a detector assembly positioned above the pellicle and configured to detect electrons emanating from the surface of the sample.

Abstract: An optical component arranged for use in a low pressure environment including: a surface arranged to receive extreme ultra-violet (EUV) light and a coating, on the surface, arranged to block at least one contaminant in the low pressure environment from binding to the surface. A method of mitigating contamination of a surface of an optical component, including: inserting the optical component into a chamber for a semi-conductor inspection system, controlling a temperature and a pressure within the chamber, introducing a blocking material, in a gaseous state, into the chamber, coating a surface of the optical component with the blocking material, and preventing, using the coating, a contaminant in the chamber from binding to the optical component.

Abstract: An apparatus for cross-flow purging for optical components in a chamber, including: a housing with first and second axial ends, a side wall extending in an axial direction and connecting the first and second axial ends, and the chamber formed by the first and second axial ends and the side wall; an optical component disposed within the chamber and fixed with respect to the housing via at least one connecting point on the optical component; an inlet port aligned with the side wall, between the first and second axial ends in the axial direction, in a radial direction orthogonal to the axial direction and arranged to inject a purge gas into the chamber and across the optical component in a radial direction orthogonal to the axial direction; and an exhaust port aligned with the side wall in the radial direction and arranged to exhaust the purge gas from the chamber.

Abstract: A system and method to clean surfaces and components of mask and wafer inspection systems based on the positive column of a glow discharge plasma are disclosed. The surface may be the surface of an optical component in a vacuum chamber or an interior wall of the vacuum chamber. A cathode and an anode may be used to generate the glow discharge plasma. The negative glow associated with the cathode may be isolated and the positive column associated with the anode may be used to clean the optical component or the interior wall of the vacuum chamber. As such, an in situ cleaning process, where the cleaning is done within the vacuum chamber, may be performed.

Abstract: A duct device for insulated delivery of temperature controlled air. The device comprises an elongated, tubular member configured as a conduit for delivery of air and having a tubular wall fabricated of non-load-bearing insulative material. This insulated material includes at least one continuous gap formed into the tubular wall and extending along the tubular member. This gap is filled with a rigid binder which bonds to the insulative material and is capable of reinforcing the structural strength of the tubular member. This binder filled gap operates as a strut, which may be positioned longitudinally along the tubular member, or in other patterns such as a helical configuration. Reinforcing structure is also disclosed for the end sections of the tubular member, along with interconnecting structure.

Abstract: A ceiling vent diffuses air from a heating or cooling system in a laminar flow into a room for optimum dispersion in the room. Inlet air strikes a hinged vane within the vent. The vane deflects the air in a narrowing air way along a continuous concave curvature and extending all the way to the outlet opening of the vent. The vane responds to the force of air flow to narrow or enlarge the air way and, thus, regulate the velocity of air exiting the vent. A curved air catch associated with the vane directs the outflow of air and also laterally disperses air within the vent. The vent maintains a relatively constant velocity and diffusion of air into a room despite variable flow rates from the source of air.