Patents by Inventor Gary D. Lutz

Gary D. Lutz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering assembly and target therefor
    Patent number: 6395146
    Abstract: A cathode assembly includes a monolithic target having a first surface and a center region. In addition, a sculpted section is formed in the first surface, and the sculpted section is generally recessed from the first surface and extends around the center in a racetrack configuration. The racetrack has a concentric centerline, and the sculpted section preferably is generally symmetric about the centerline. A magnetic field generator is disposed adjacent to the target and produces a magnetic field having an in-plane component. The magnetic field generator is tuned so that a distribution of the magnitude of the in-plane component in a direction transverse to the centerline at a point along the racetrack is characterized by two peaks that have a generally equal magnitude.
    Type: Grant
    Filed: June 7, 2001
    Date of Patent: May 28, 2002
    Assignee: Veeco Instrument, Inc.
    Inventors: Robert G. Hieronymi, Gary D. Lutz
  • Sputtering assembly and target therefor
    Publication number: 20010045353
    Abstract: A cathode assembly includes a monolithic target having a first surface and a center region. In addition, a sculpted section is formed in the first surface, and the sculpted section is generally recessed from the first surface and extends around the center in a racetrack configuration. The racetrack has a concentric centerline, and the sculpted section preferably is generally symmetric about the centerline. A magnetic field generator is disposed adjacent to the target and produces a magnetic field having an in-plane component. The magnetic field generator is tuned so that a distribution of the magnitude of the in-plane component in a direction transverse to the centerline at a point along the racetrack is characterized by two peaks that have a generally equal magnitude.
    Type: Application
    Filed: June 7, 2001
    Publication date: November 29, 2001
    Applicant: VEECO INSTRUMENT INC.
    Inventors: Robert G. Hieronymi, Gary D. Lutz
  • Sputtering assembly and target therefor
    Patent number: 6299740
    Abstract: A cathode assembly includes a monolithic target having a first surface and a center region. In addition, a sculpted section is formed in the first surface, and the sculpted section is generally recessed from the first surface and extends around the center in a racetrack configuration. The racetrack has a concentric centerline, and the sculpted section preferably is generally symmetric about the centerline. A magnetic field generator is disposed adjacent to the target and produces a magnetic field having an in-plane component. The magnetic field generator is tuned so that a distribution of the magnitude of the in-plane component in a direction transverse to the centerline at a point along the racetrack is characterized by two peaks that have a generally equal magnitude.
    Type: Grant
    Filed: January 19, 2000
    Date of Patent: October 9, 2001
    Assignee: Veeco Instrument, Inc.
    Inventors: Robert G. Hieronymi, Gary D. Lutz