Abstract: An apparatus for continuously transporting and dipping patterns in a process wherein patterns of a desired shape are dipped in and coated with a liquid that subsequently forms a thin membrane thereon. The apparatus includes an endless roller chain assembly that carries a number of pattern carrier assemblies through a linear dipping span. Each pattern carrier assembly includes a vertical track attached to the roller chain assembly and a carrier arm slidably connected to the track for vertical movement therein between a raised position and a lowered position. A pattern support bar is connected to the carrier arm and extends perpendicular to the dipping span of the roller chain assembly. Two or more parallel rows of patterns are suspended from the pattern support bar with their maximum width dimension extending perpendicular to the bar and with the patterns of each row being closely spaced to the patterns of the adjacent row so that at least two rows are transported simultaneously by the same carrier arm.