Patents by Inventor Gary Fan

Gary Fan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for adaptively scanning a sample during electron beam inspection
    Patent number: 9734987
    Abstract: A system for adaptive electron beam scanning may include an inspection sub-system configured to scan an electron beam across the surface of a sample. The inspection sub-system may include an electron beam source, a sample stage, a set of electron-optic elements, a detector assembly and a controller communicatively coupled to one or more portions of the inspection sub-system. The controller may assess one or more characteristics of one or more portions of an area of the sample for inspection and, responsive to the assessed one or more characteristics, adjust one or more scan parameters of the inspection sub-system.
    Type: Grant
    Filed: February 8, 2016
    Date of Patent: August 15, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Gary Fan, David Chen, Vivekanand Kini, Hong Xiao
  • Method and System for Adaptively Scanning a Sample During Electron Beam Inspection
    Publication number: 20160155605
    Abstract: A system for adaptive electron beam scanning may include an inspection sub-system configured to scan an electron beam across the surface of a sample. The inspection sub-system may include an electron beam source, a sample stage, a set of electron-optic elements, a detector assembly and a controller communicatively coupled to one or more portions of the inspection sub-system. The controller may assess one or more characteristics of one or more portions of an area of the sample for inspection and, responsive to the assessed one or more characteristics, adjust one or more scan parameters of the inspection sub-system.
    Type: Application
    Filed: February 8, 2016
    Publication date: June 2, 2016
    Inventors: Gary Fan, David Chen, Vivekanand Kini, Hong Xiao
  • Method and system for adaptively scanning a sample during electron beam inspection
    Patent number: 9257260
    Abstract: A system for adaptive electron beam scanning may include an inspection sub-system configured to scan an electron beam across the surface of a sample. The inspection sub-system may include an electron beam source, a sample stage, a set of electron-optic elements, a detector assembly and a controller communicatively coupled to one or more portions of the inspection sub-system. The controller may assess one or more characteristics of one or more portions of an area of the sample for inspection and, responsive to the assessed one or more characteristics, adjust one or more scan parameters of the inspection sub-system.
    Type: Grant
    Filed: April 23, 2014
    Date of Patent: February 9, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Gary Fan, David Chen, Vivekanand Kini, Hong Xiao
  • Method and System for Adaptively Scanning a Sample During Electron Beam Inspection
    Publication number: 20140319342
    Abstract: A system for adaptive electron beam scanning may include an inspection sub-system configured to scan an electron beam across the surface of a sample. The inspection sub-system may include an electron beam source, a sample stage, a set of electron-optic elements, a detector assembly and a controller communicatively coupled to one or more portions of the inspection sub-system. The controller may assess one or more characteristics of one or more portions of an area of the sample for inspection and, responsive to the assessed one or more characteristics, adjust one or more scan parameters of the inspection sub-system.
    Type: Application
    Filed: April 23, 2014
    Publication date: October 30, 2014
    Applicant: KLA-Tencor Corporation
    Inventors: Gary Fan, David Chen, Vivekanand Kini, Hong Xiao