Abstract: A range of motion limiting device, in one example comprising a first armature configured to engage a carriage moving on at least one rail having a first surface and a second surface transversely offset from the first surface of the rail. Also disclosed is an example utilizing a first bumper adjacent the first longitudinal end of the first armature. The first bumper extending transversely from the first transverse side of the first armature, optionally having a distal end with a non-slip surface engaging the first surface of a rail. Also disclosed is a second bumper longitudinally offset from the first bumper on the first armature, the second bumper extending transversely from the second transverse side of the first armature, also optionally having a distal end with a non-slip surface engaging the second surface of the rail.

Abstract: A mounted massage roller comprising in one example: a mounting assembly configured to be mounted to a fixed structure; a pivot assembly attached to the mounting assembly at a hinge forming a horizontal hinge axis about which the hinge rotates; the pivot assembly rotatable about the hinge axis relative to the mounting assembly; the pivot assembly comprising at least one handle configured to be grasped by a patient to rotate the pivot assembly about the hinge; the pivot assembly at least one roller configured to roll about a roller axis parallel to the hinge axis; each roller having a radially outward surface configured to roll against the patient as the patient moves the pivot assembly about the hinge axis.

Abstract: A sensing system for a vehicle includes wheel end sensors (WES), each WES proximate to at least one predetermined tire and configured to sense angular data, including at least one of angular position, angular velocity, angular acceleration, and/or angular displacement. The system includes a plurality of tire pressure monitoring (TPM) sensors, each TPM sensor inside one of the tires and configured to sense pressure, temperature, and angular data within said tire. The sensing system is configured to compare the angular data sensed by each WES to the angular data sensed by each TPM sensor to automatically identify, for each TPM sensor, a corresponding WES, and based on the position on the vehicle of the predetermined tire of the corresponding WES, identify the position on the vehicle corresponding to said TPM sensor.

Abstract: A wind energy collection device configured to be mounted to the roof of a structure, the device optionally comprising: a support frame to be fixed to the roof of a building; a wind turbine impeller mounted to the support frame, the impeller supported by a turbine shaft oriented in a fixed horizontal and vertical position relative to the frame. The impeller optionally coupled to a generator to convert rotational movement of the impeller to power that can be stored and/or transmitted. The device may also comprise at least one directional panel configured to direct the wind to at least one impeller vane of the impeller such that the impeller rotates in a rotational direction due to force exerted by the wind blowing in a first direction; and the directional panel is repositionable so as to direct the wind blowing in a second direction opposed to the first direction such that the impeller rotates in the rotational direction.

Abstract: A range of motion limiting device, in one example comprising a first armature configured to engage a carriage moving on at least one rail having a first surface and a second surface transversely offset from the first surface of the rail. Also disclosed is an example utilizing a first bumper adjacent the first longitudinal end of the first armature. The first bumper extending transversely from the first transverse side of the first armature, optionally having a distal end with a non-slip surface engaging the first surface of a rail. Also disclosed is a second bumper longitudinally offset from the first bumper on the first armature, the second bumper extending transversely from the second transverse side of the first armature, also optionally having a distal end with a non-slip surface engaging the second surface of the rail.

Abstract: A range of motion limiting device, in one example comprising a first armature configured to engage a carriage moving on at least one rail having a first surface and a second surface transversely offset from the first surface of the rail. Also disclosed is an example utilizing a first bumper adjacent the first longitudinal end of the first armature. The first bumper extending transversely from the first transverse side of the first armature, optionally having a distal end with a non-slip surface engaging the first surface of a rail. Also disclosed is a second bumper longitudinally offset from the first bumper on the first armature, the second bumper extending transversely from the second transverse side of the first armature, also optionally having a distal end with a non-slip surface engaging the second surface of the rail.

Abstract: A sensing system for a vehicle includes wheel end sensors (WES), each WES proximate to at least one predetermined tire and configured to sense angular data, including at least one of angular position, angular velocity, angular acceleration, and/or angular displacement. The system includes a plurality of tire pressure monitoring (TPM) sensors, each TPM sensor inside one of the tires and configured to sense pressure, temperature, and angular data within said tire. The sensing system is configured to compare the angular data sensed by each WES to the angular data sensed by each TPM sensor to automatically identify, for each TPM sensor, a corresponding WES, and based on the position on the vehicle of the predetermined tire of the corresponding WES, identify the position on the vehicle corresponding to said TPM sensor.

Abstract: A shuttle training and therapy device including in one example: a floor standing fame having a headward end and a footward end; a carriage slidably attached to the frame; a resistance system of elastic cords attached to the footward end of the frame; the elastic cords selectively attached to the carriage; and a range of motion limiting system comprising a control cord having a first end attached to the carriage, a second end selectively attached to the frame, and an intermediate portion attached to an elastic member attached to the carriage.

Abstract: A barrier chemical mechanical planarization polishing composition is provided that includes suitable chemical additives. The suitable chemical additives are silicate compound and high molecular weight polymers/copolymers. There is also provided a chemical mechanical polishing method using the barrier chemical mechanical planarization polishing composition.

Abstract: Chemical mechanical polishing (CMP) compositions, methods and systems are for polishing patterned semiconductor wafers. The CMP compositions comprising an abrasive and a water soluble aluminum compound additive with a pH>7 suppress CMP stop layer (a silicon containing layer, such as silicon nitride, silicon oxide, or silicon carbide) removal rate. CMP compositions optionally contain surfactant to help wet surface; a corrosion inhibitor to provide corrosion inhibition on metal lines, vias, or trenches; and a pH adjusting agent that is used to adjust pH of the CMP polishing composition.

Abstract: Chemical mechanical polishing (CMP) compositions, methods and systems are for polishing patterned semiconductor wafers. The CMP compositions comprising an abrasive and a water soluble aluminum compound additive with a pH>7 suppress CMP stop layer (a silicon containing layer, such as silicon nitride, silicon oxide, or silicon carbide) removal rate. CMP compositions optionally contain surfactant to help wet surface; a corrosion inhibitor to provide corrosion inhibition on metal lines, vias, or trenches; and a pH adjusting agent that is used to adjust pH of the CMP polishing composition.

Abstract: A shuttle training and therapy device including in one example: a floor standing fame having a headward end and a footward end; a carriage slidably attached to the frame; a resistance system of elastic cords attached to the footward end of the frame; the elastic cords selectively attached to the carriage; and a range of motion limiting system comprising a control cord having a first end attached to the carriage, a second end selectively attached to the frame, and an intermediate portion attached to an elastic member attached to the carriage.

Abstract: Methods of fabricating a glass laminate is provided. According to one embodiment, a glass laminate comprised of a microwave absorbing layer and a microwave transparent layer is formed. The microwave absorbing layer is characterized by a microwave loss tangent ?H that is at least a half order of magnitude larger than a loss tangent ?L of the microwave transparent layer. An area of the glass laminate is exposed to microwave radiation. The exposed area comprises a cross-laminate hot zone having a cross-laminate hot zone temperature profile. Substantially all microwave absorbing layer portions of the hot zone temperature profile and substantially all microwave transparent layer portions of the hot zone temperature profile reside above the glass transition temperature TG of the various layers of the glass laminate prior to impingement by the microwave radiation.

Abstract: A shuttle training and therapy device including in one example: a floor standing fame having a headward end and a footward end; a carriage slidably attached to the frame; a resistance system of elastic cords attached to the footward end of the frame; the elastic cords selectively attached to the carriage; and a range of motion limiting system including a control cord having a first end attached to the carriage, a second end selectively attached to the frame, and an intermediate portion attached to an elastic member attached to the carriage.

Abstract: A barrier chemical mechanical planarization polishing composition is provided that includes suitable chemical additives. The suitable chemical additives are silicate compound and high molecular weight polymers/copolymers. There is also provided a chemical mechanical polishing method using the barrier chemical mechanical planarization polishing composition.

Abstract: A glass manufacturing apparatus comprises a forming device configured to produce a glass ribbon and a control device configured to independently operate a first pull roll apparatus and a second pull roll apparatus such that at least one of a first upstream pair of draw rolls rotates with a substantially constant torque and at least one of a first downstream pair of draw rolls rotates with a substantially constant angular velocity. In further examples, methods of manufacturing a glass ribbon are provided.

Abstract: Chemical mechanical polishing (CMP) compositions, methods and systems are for polishing patterned semiconductor wafers. The CMP compositions comprising an abrasive and a water soluble aluminum compound additive with a pH>7 suppress CMP stop layer (a silicon containing layer, such as silicon nitride, silicon oxide, or silicon carbide) removal rate. CMP compositions optionally contain surfactant to help wet surface; a corrosion inhibitor to provide corrosion inhibition on metal lines, vias, or trenches; and a pH adjusting agent that is used to adjust pH of the CMP polishing composition.

Abstract: A glass manufacturing apparatus comprises a forming device configured to produce a glass ribbon and a control device configured to independently operate a first pull roll apparatus, a second pull roll apparatus, and a third pull roll apparatus such that at least one of a first upstream pair of draw rolls rotates with a substantially constant torque, at least one of a first midstream pair of draw rolls rotates with a substantially constant torque, and at least one of a first downstream pair of draw rolls rotates with a substantially constant angular velocity. In further examples, methods of manufacturing a glass ribbon are provided.

Abstract: A barrier chemical mechanical planarization polishing composition is provided that includes suitable chemical additives. The suitable chemical additives are organic polymer molecules containing ethylene oxide repeating units having the general molecular structure of where n refers to the total numbers of the repeating unit giving the molecular weights of polyethylene oxide ranging from 100,000 to 8,000,000. There is also provided a chemical mechanical polishing method using the barrier chemical mechanical planarization polishing composition.

Abstract: A glass manufacturing apparatus comprises a forming device configured to produce a glass ribbon and a control device configured to independently operate a first pull roll apparatus and a second pull roll apparatus such that at least one of a first upstream pair of draw rolls rotates with a substantially constant torque and at least one of a first downstream pair of draw rolls rotates with a substantially constant angular velocity. In further examples, methods of manufacturing a glass ribbon are provided.