Patents by Inventor Gary K Jones

Gary K Jones has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for overlay control using multiple targets
    Patent number: 6815232
    Abstract: A method includes measuring a first overlay error between a first process layer and a second process layer using a first overlay target formed on the second process layer. A second overlay error between the first process layer and a third process layer is measured using a second overlay target formed on the third process layer. At least one parameter of an operating recipe for performing a photolithography process on the first process layer is determined based on the first and second overlay error measurements. A system includes a metrology tool and a controller. The metrology tool is configured to measure a first overlay error between a first process layer and a second process layer using a first overlay target formed on the second process layer and measure a second overlay error between the first process layer and a third process layer using a second overlay target formed on the third process layer.
    Type: Grant
    Filed: November 26, 2002
    Date of Patent: November 9, 2004
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Gary K Jones, Christopher A Bode, Richard D Edwards
  • Method and apparatus for overlay control using multiple targets
    Publication number: 20040101983
    Abstract: A method includes measuring a first overlay error between a first process layer and a second process layer using a first overlay target formed on the second process layer. A second overlay error between the first process layer and a third process layer is measured using a second overlay target formed on the third process layer. At least one parameter of an operating recipe for performing a photolithography process on the first process layer is determined based on the first and second overlay error measurements. A system includes a metrology tool and a controller. The metrology tool is configured to measure a first overlay error between a first process layer and a second process layer using a first overlay target formed on the second process layer and measure a second overlay error between the first process layer and a third process layer using a second overlay target formed on the third process layer.
    Type: Application
    Filed: November 26, 2002
    Publication date: May 27, 2004
    Inventors: Gary K. Jones, Christopher A. Bode, Richard D. Edwards