Patents by Inventor Gary M. Delaurentiis

Gary M. Delaurentiis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7838628
    Abstract: A resin recycling system that produces essentially contaminant-free synthetic resin material in an environmentally safe and economical manner. The system includes receiving the resin in container form. A grinder grinds the containers into resin particles. The particles are exposed to a solvent in one or more solvent wash vessels, the solvent contacting the resin particles and substantially removing contaminants on the resin particles. A separator is used to separate the resin particles and the solvent. The resin particles are then placed in solvent removing element where they are exposed to a solvent removing agent which removes any residual solvent remaining on the resin particles after separation.
    Type: Grant
    Filed: June 26, 2006
    Date of Patent: November 23, 2010
    Assignee: Honeywell Federal Manufacturing & Technologies, LLC
    Inventors: George W. Bohnert, Thomas E. Hand, Gary M. DeLaurentiis
  • Publication number: 20100236580
    Abstract: A system that removes PCBs from synthetic resins in an environmentally safe and economical manner. The system includes a solvent wash subsystem (10) including a first tank (44) to expose the resin particles to a solvent for a first predetermined period of time. In the solvent tank (44), the solvent contacts the resin particles, removing the PCBs. Thereafter, a separator is provided to separate the solvent from the resin particles after removal from the first tank (44). The system also includes a carbon dioxide subsystem (34) where, after separation, the resin particles are exposed to carbon dioxide in a vessel for a second predetermined period of time. Exposure to the carbon dioxide substantially removes any residual solvent and trace amounts of PCBs remaining on the resin particles. In various embodiments, the first predetermined period of time and the second predetermined period of time are selected so that the PCBs on the resin particles are reduced to a predetermined acceptable level, for example, 2.
    Type: Application
    Filed: May 13, 2008
    Publication date: September 23, 2010
    Inventor: Gary M. Delaurentiis
  • Patent number: 7473758
    Abstract: A two step solvent and carbon dioxide based system that produces essentially contaminant-free synthetic resin material and which further includes a solvent cleaning system for periodically removing the contaminants from the solvent so that the solvent can be reused and the contaminants can be collected and safely discarded in an environmentally safe manner.
    Type: Grant
    Filed: June 26, 2006
    Date of Patent: January 6, 2009
    Assignee: Honeywell Federal Manufacturing & Technologies, LLC
    Inventors: George W. Bohnert, Thomas E. Hand, Gary M. DeLaurentiis
  • Patent number: 7473759
    Abstract: A two-step resin recycling system and method solvent that produces essentially contaminant-free synthetic resin material. The system and method includes one or more solvent wash vessels to expose resin particles to a solvent, the solvent contacting the resin particles in the one or more solvent wash vessels to substantially remove contaminants on the resin particles. A separator is provided to separate the solvent from the resin particles after removal from the one or more solvent wash vessels. The resin particles are next exposed to carbon dioxide in a closed loop carbon dioxide system. The closed loop system includes a carbon dioxide vessel where the carbon dioxide is exposed to the resin, substantially removing any residual solvent remaining on the resin particles after separation. A separation vessel is also provided to separate the solvent from the solvent laden carbon dioxide. Both the carbon dioxide and the solvent are reused after separation in the separation vessel.
    Type: Grant
    Filed: April 10, 2007
    Date of Patent: January 6, 2009
    Assignee: Honeywell Federal Manufacturing & Technologies, LLC
    Inventors: George W. Bohnert, Thomas E. Hand, Gary M. DeLaurentiis
  • Patent number: 7470766
    Abstract: A method for removing contaminants from synthetic resin material containers using a first organic solvent system and a second carbon dioxide system. The organic solvent is utilized for removing the contaminants from the synthetic resin material and the carbon dioxide is used to separate any residual organic solvent from the synthetic resin material.
    Type: Grant
    Filed: March 27, 2006
    Date of Patent: December 30, 2008
    Assignee: Honeywell Federal Manufacturing & Technologies, LLC
    Inventors: George W. Bohnert, Thomas E. Hand, Gary M. DeLaurentiis
  • Patent number: 7462685
    Abstract: A resin recycling method that produces essentially contaminant-free synthetic resin material in an environmentally safe and economical manner. The method includes receiving the resin in container form. The containers are then ground into resin particles. The particles are exposed to a solvent, the solvent contacting the resin particles and substantially removing contaminants on the resin particles. After separating the particles and the resin, a solvent removing agent is used to remove any residual solvent remaining on the resin particles after separation.
    Type: Grant
    Filed: June 26, 2006
    Date of Patent: December 9, 2008
    Assignee: Honeywell Federal Manufacturing & Technologies, LLC
    Inventors: George W. Bohnert, Thomas E. Hand, Gary M. DeLaurentiis
  • Patent number: 7452962
    Abstract: A method for removing contaminants from synthetic resin material containers using a first organic solvent system and a second carbon dioxide system. The organic solvent is utilized for removing the contaminants from the synthetic resin material and the carbon dioxide is used to separate any residual organic solvent from the synthetic resin material.
    Type: Grant
    Filed: May 31, 2006
    Date of Patent: November 18, 2008
    Assignee: Honeywell Federal Manufacturing & Technologies, LLC
    Inventors: George W. Bohnert, Thomas E. Hand, Gary M. DeLaurentiis
  • Patent number: 7253253
    Abstract: A method for removing contaminants from synthetic resin material containers using a first organic solvent system and a second carbon dioxide system. The organic solvent is utilized for removing the contaminants from the synthetic resin material and the carbon dioxide is used to separate any residual organic solvent from the synthetic resin material.
    Type: Grant
    Filed: April 1, 2005
    Date of Patent: August 7, 2007
    Assignee: Honeywell Federal Manufacturing & Technology, LLC
    Inventors: George W. Bohnert, Thomas E. Hand, Gary M. Delaurentiis