Patents by Inventor Gary Reid

Gary Reid has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250145620
    Abstract: The present invention provides methods of preparing heteroaryl-ketone fused azadecalin glucocorticoid receptor modulators, and compositions having low impurity levels.
    Type: Application
    Filed: October 18, 2024
    Publication date: May 8, 2025
    Inventors: Jeffrey Mark DENER, Hazel Joan HUNT, Travis LEMONS, Gary REID, Kilian GARREC, Thomas C. STEPHENS, Adam Daisuke GAMMACK YAMAGATA, Yunguo LU
  • Patent number: 12152028
    Abstract: The present invention provides methods of preparing heteroaryl-ketone fused azadecalin glucocorticoid receptor modulators, and compositions having low impurity levels.
    Type: Grant
    Filed: December 22, 2021
    Date of Patent: November 26, 2024
    Assignee: Corcept Therapeutics Incorporated
    Inventors: Jeffrey Mark Dener, Hazel Joan Hunt, Travis Lemons, Gary Reid, Kilian Garrec, Thomas C. Stephens, Adam Daisuke Gammack Yamagata, Yunguo Lu
  • Publication number: 20220227753
    Abstract: The present invention provides methods of preparing heteroaryl-ketone fused azadecalin glucocorticoid receptor modulators, and compositions having low impurity levels.
    Type: Application
    Filed: December 22, 2021
    Publication date: July 21, 2022
    Inventors: Jeffrey Mark DENER, Hazel Joan HUNT, Travis LEMONS, Gary REID, Kilian GARREC, Thomas C. STEPHENS, Adam Daisuke GAMMACK YAMAGATA, Yunguo LU
  • Patent number: 9964847
    Abstract: The present disclosure relates to lithographic masks and, more particularly, to a lithographic mask substrate structure and methods of manufacture. The mask includes a sub-resolution assist feature (SRAF) formed on a quartz substrate and composed of a patterned transition film and absorber layer.
    Type: Grant
    Filed: June 20, 2016
    Date of Patent: May 8, 2018
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Richard Wistrom, Mark S. Lawliss, A. Gary Reid
  • Publication number: 20170365471
    Abstract: The present disclosure relates to lithographic masks and, more particularly, to a lithographic mask substrate structure and methods of manufacture. The mask includes a sub-resolution assist feature (SRAF) formed on a quartz substrate and composed of a patterned transition film and absorber layer.
    Type: Application
    Filed: June 20, 2016
    Publication date: December 21, 2017
    Inventors: Richard Wistrom, Mark S. Lawliss, A. Gary Reid
  • Patent number: 7960288
    Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist. The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.
    Type: Grant
    Filed: October 9, 2007
    Date of Patent: June 14, 2011
    Assignee: International Business Machines Corporation
    Inventors: Shaun Crawford, Cuc K. Huynh, A. Gary Reid, Adam C. Smith, Thomas M. Wagner
  • Patent number: 7955988
    Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist. The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.
    Type: Grant
    Filed: September 27, 2007
    Date of Patent: June 7, 2011
    Assignee: International Business Machines Corporation
    Inventors: Shaun Crawford, Cuc K. Huynh, A. Gary Reid, Adam C. Smith, Thomas M. Wagner
  • Patent number: 7304000
    Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.
    Type: Grant
    Filed: August 19, 2004
    Date of Patent: December 4, 2007
    Assignee: International Business Machines Corporation
    Inventors: Shaun Crawford, Cuc K. Huynh, A. Gary Reid, Adam C. Smith, Thomas M. Wagner
  • Patent number: D732247
    Type: Grant
    Filed: March 31, 2014
    Date of Patent: June 16, 2015
    Inventor: Gary Reid
  • Patent number: D769104
    Type: Grant
    Filed: May 8, 2015
    Date of Patent: October 18, 2016
    Inventor: Gary Reid