Patents by Inventor Gary T. Spinillo

Gary T. Spinillo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antireflective coating for microlithography
    Patent number: 5607824
    Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.
    Type: Grant
    Filed: July 27, 1994
    Date of Patent: March 4, 1997
    Assignee: International Business Machines Corporation
    Inventors: James T. Fahey, Brian W. Herbst, Leo L. Linehan, Wayne M. Moreau, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene
    Patent number: 5561194
    Abstract: A polyalkylmethacrylate co-polymer of polyhydroxystyrene has been found to be an ideal blending partner in a novolak photoresist composition. The preferred co-polymer is poly(p-hydroxystyrene)-co-(methyl methacrylate). The co-polymer is fully miscible with novolaks and has a high thermal stability (>150.degree. C.).
    Type: Grant
    Filed: March 29, 1995
    Date of Patent: October 1, 1996
    Assignee: International Business Machines Corporation
    Inventors: Kathleen M. Cornett, Judy B. Dorn, Margaret C. Lawson, Leo L. Linehan, Wayne M. Moreau, Randolph J. Smith, Gary T. Spinillo
  • Mid and deep-UV antireflection coatings and methods for use thereof
    Patent number: 5554485
    Abstract: An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
    Type: Grant
    Filed: September 29, 1994
    Date of Patent: September 10, 1996
    Assignee: International Business Machines Corporation
    Inventors: Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau, Ratnam Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Mid and deep-uv antireflection coatings and methods for use thereof
    Patent number: 5482817
    Abstract: An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
    Type: Grant
    Filed: September 29, 1994
    Date of Patent: January 9, 1996
    Assignee: International Business Machines Corporation
    Inventors: Robert R. Dichiara, Christopher F. Lyons, Ratnasabapathy Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Mid and deep-UV antireflection coatings and methods for use thereof
    Patent number: 5401614
    Abstract: An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
    Type: Grant
    Filed: February 16, 1993
    Date of Patent: March 28, 1995
    Assignee: International Business Machines Corporation
    Inventors: Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau, Ratnam Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Mid and deep-UV antireflection coatings and methods for use thereof
    Patent number: 5380621
    Abstract: An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
    Type: Grant
    Filed: May 3, 1993
    Date of Patent: January 10, 1995
    Assignee: International Business Machines Corporation
    Inventors: Robert R. Dichiara, Christopher F. Lyons, Ratnasabapathy Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation
    Patent number: 5273856
    Abstract: Positive photoresist compositions which comprise an alkali soluble resin material, a diazoquinone dissolution inhibitor which decompose on exposure to mid and near UV radiation, and a sulfonic acid ester of an imide or oxime which does not absorb such mid or near UV radiation. Resist images of high contrast are formed.
    Type: Grant
    Filed: October 31, 1990
    Date of Patent: December 28, 1993
    Assignee: International Business Machines Corporation
    Inventors: Christopher F. Lyons, Stanley E. Perreault, Gary T. Spinillo, Robert L. Wood