Patents by Inventor Gary Taan

Gary Taan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10372114
    Abstract: A process control technique uses production data from multiple manufacturing tools and multiple inspection or metrology tools. Total measurement uncertainty (TMU) can be calculated on the production data, which can include measurements of one or more devices manufactured using the manufacturing tools. Manufacturing steps can be ranked or otherwise compared by TMU. All production modes and recipes can be continually monitored using production data.
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: August 6, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Karen Biagini, Bryant Stanford Mantiply, Ravichander Jayantha Rao, Gary Taan
  • Patent number: 10360671
    Abstract: Systems and methods for tool health monitoring and matching through integrated real-time data collection, event prioritization, and automated determination of matched states through image analysis are disclosed. Data from the semiconductor production tools can be received in real-time. A control limit impact (CLI) of the parametric data and the defect attributes data can be determined and causation factors can be prioritized. Image analysis techniques can compare images and can be used to judge tool matching, such as by identifying one of the states at which the two or more of the semiconductor manufacturing tools match.
    Type: Grant
    Filed: July 11, 2017
    Date of Patent: July 23, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Ravichander Rao, Gary Taan, Andreas Russ, Bjorn Brauer, Roger Davis, Bryant Mantiply, Swati Ramanathan, Karen Biagini
  • Publication number: 20190019280
    Abstract: Systems and methods for tool health monitoring and matching through integrated real-time data collection, event prioritization, and automated determination of matched states through image analysis are disclosed. Data from the semiconductor production tools can be received in real-time. A control limit impact (CLI) of the parametric data and the defect attributes data can be determined and causation factors can be prioritized. Image analysis techniques can compare images and can be used to judge tool matching, such as by identifying one of the states at which the two or more of the semiconductor manufacturing tools match.
    Type: Application
    Filed: July 11, 2017
    Publication date: January 17, 2019
    Inventors: Ravichander Rao, Gary Taan, Andreas Russ, Bjorn Brauer, Roger Davis, Bryant Mantiply, Swati Ramanathan, Karen Biagini
  • Publication number: 20180113441
    Abstract: A process control technique uses production data from multiple manufacturing tools and multiple inspection or metrology tools. Total measurement uncertainty (TMU) can be calculated on the production data, which can include measurements of one or more devices manufactured using the manufacturing tools. Manufacturing steps can be ranked or otherwise compared by TMU. All production modes and recipes can be continually monitored using production data.
    Type: Application
    Filed: October 21, 2016
    Publication date: April 26, 2018
    Inventors: Karen Biagini, Bryant Stanford Mantiply, Ravichander Jayantha Rao, Gary Taan