Abstract: A gas distribution injector for chemical vapor deposition reactors has precursor gas inlets disposed at spaced-apart locations on an inner surface facing downstream toward a substrate carrier, and has carrier openings disposed between the precursor gas inlets. One or more precursor gases are introduced through the precursor gas inlets, and a carrier gas substantially nonreactive with the precursor gases is introduced through the carrier gas openings. The carrier gas minimizes deposit formation on the injector. The carrier gas openings may be provided by a porous plate defining the surface or via carrier inlets interspersed between precursor inlets. The gas inlets may removable or coaxial.

Abstract: A system and a method for depositing films of a multi-component material by MOCVD utilizes a flash evaporator for providing vaporized reactant material at a high flow rate. The high flow rate enables film deposition to occur at a higher deposition rate that what is possible with conventional MOCVD systems. The system may be a single-chamber system or part of a multiple-chamber system. The multiple-chamber system allows multi-layer structures to be deposited and/or processed in situ.

Abstract: This invention relates to a smart portable detection apparatus and method that provides portable detection in a cost effective manner. The invention includes a portable computer communicatively connected to a detector. The detector transmits a signal to the portable computer when a detection is made by the detector, and the portable computer produces an alarm in response to the signal. The alarm, as well as the location of the detector, are transmitted via a communication device to a central command location, and the smart apparatus may accept external input to update situational awareness and accept commands.

Abstract: A gas distribution injector for chemical vapor deposition reactors has precursor gas inlets disposed at spaced-apart locations on an inner surface facing downstream toward a substrate carrier, and has carrier openings disposed between the precursor gas inlets. One or more precursor gases are introduced through the precursor gas inlets, and a carrier gas substantially nonreactive with the precursor gases is introduced through the carrier gas openings. The carrier gas minimizes deposit formation on the injector. The carrier gas openings may be provided by a porous plate defining the surface or via carrier inlets interspersed between precursor inlets. The gas inlets may removable or coaxial.

Abstract: A “hardened by design” approach is described that identifies a radiation-sensitive region of a microelectronic device, constructing wells in the region with low volume, constructing a conductive path in the region so as to shield sensitive region and constructing the conductive path from low resistance material. An exemplary SRAM cell uses these principles and may be divided and interleaved in order to further radiation harden the device.

Abstract: An apparatus for the synthesis of multi-component substances, comprising entities of at least two elements, molecules, grains, crystals, structural units, or phases of matter, in which the scale of the distribution of the elements, molecules, or phases of matter may range from on the order of nanometers or less, to about one millimeter, depending upon the specific materials and process conditions that are chosen. The apparatus of the present invention comprises a vacuum chamber, a target assembly, an energy source for generating a plasma containing materials ablated from the target assembly, and a reagent gas supply for directing gas into the vacuum chamber toward the plasma.