Abstract: Aminosilane precursors for depositing silicon-containing films, and methods for depositing silicon-containing films from these aminosilane precursors, are described herein. In one embodiment, there is provided an aminosilane precursor for depositing silicon-containing film comprising the following formula (I): (R1R2N)nSiR34-n??(I) wherein substituents R1 and R2 are each independently chosen from an alkyl group comprising from 1 to 20 carbon atoms and an aryl group comprising from 6 to 30 carbon atoms, at least one of substituents R1 and R2 comprises at least one electron withdrawing substituent chosen from F, Cl, Br, I, CN, NO2, PO(OR)2, OR, SO, SO2, SO2R and wherein R in the at least one electron withdrawing substituent is chosen from an alkyl group or an aryl group, R3 is chosen from H, an alkyl group, or an aryl group, and n is a number ranging from 1 to 4.

Abstract: A polymeric composition is disclosed for use in personal care products. The composition is, at room temperature, a solid solution of a long-chain alcohol having ten to fifty carbon atoms and a polyalkyl[meth]acrylate polymer having some alkyl side chains pendant the ester group having ten to thirty carbon atoms and other alkyl side chains pendant the ester group having one to eight carbon atoms. The polymer can be formed by a transesterification reaction of a polyalkyl[meth]acrylate and the long chain alcohol in the presence of a catalyst.

Abstract: Novel compositions are provided containing a compound represented by the formula YOSF5 or ZOSF5, where: (a) Y is: (i) an organic cation other than (Me2N)3S+ or (ii) an inorganic cation, provided that when Y is the inorganic cation, the composition further includes a complexing agent; and (b) Z is C1-20 alkyl, aryl, cycloalkyl, combinations thereof, or analogues thereof containing at least one heteroatom, provided that the compound represented by the formula ZOSF5 is a molecular compound. Processes of making the cationic compounds are disclosed as are processes for using the compositions containing cationic compounds in nucleophilic replacement reactions to prepare the compositions containing molecular compounds including the OSF5 group.

Abstract: Aminosilane precursors for depositing silicon-containing films, and methods for depositing silicon-containing films from these aminosilane precursors, are described herein. In one embodiment, there is provided an aminosilane precursor for depositing silicon-containing film comprising the following formula (I): (R1R2N)nSiR34-n ??(I) wherein substituents R1 and R2 are each independently chosen from an alkyl group comprising from 1 to 20 carbon atoms and an aryl group comprising from 6 to 30 carbon atoms, at least one of substituents R1 and R2 comprises at least one electron withdrawing substituent chosen from F, Cl, Br, I, CN, NO2, PO(OR)2, OR, SO, SO2, SO2R and wherein R in the at least one electron withdrawing substituent is chosen from an alkyl group or an aryl group, R3 is chosen from H, an alkyl group, or an aryl group, and n is a number ranging from 1 to 4.

Abstract: A compound having the structure: w-A-x-CY—Z(CF3), where CY is cyclohexane or substituted cyclohexane, exemplified by 4-trifluoromethyl-4-methylcarboxy-4?-propyl-1,1?-(bi)cyclohexane.

Abstract: Partially and fully fluorinated alkyl substituted thienothiophene monomers (and polymers thereof) wherein the monomers are represented by the formula: wherein R is a partially or fully fluorinated primary, secondary or tertiary alkyl having from 1 to 8 carbon atoms; and X and X? are independently selected from the group consisting of H, F, Cl, Br, I, MgCl, ?—COR?, —C?CH, and a polymerizable cyclic pi-conjugated carbon-ring structure optionally comprising S, N or O heteroatoms; wherein R? is a primary, secondary or tertiary alkyl having from 1 to 6 carbon atoms, and R? is H or a primary, or tertiary alkyl having from 1 to 6 carbon atoms.

Abstract: A compound comprising at least one alicyclic or heteroalicyclic ring structure, the ring structure comprising a ring of about four to about eight atoms, wherein at least two adjacent atoms of the ring are carbon atoms and at least one of said carbon atoms is covalently bonded to an —OSF5 functional group and either is bonded to a moiety selected from hydrogen; halogen; C1-C6 substituted or unsubstituted, branched or straight alkyl; C5-C7 substituted or unsubstituted aryl or heteroaryl; C3-C8 aliphatic cyclic; OSF5; or is a member of a fused, bridged, fused-bridged, or spirocyclic ring system; provided that if the moiety is fluorine, then at least one of the other ring atoms are bonded to an atom or functional group other than fluorine; as well as methods for making the same.

Abstract: Metal source containing precursor liquid solutions for chemical vapor deposition processes, including atomic layer deposition, for fabricating conformal metal-containing films on substrates are described. More specifically, the metal source precursor liquid solutions are comprised of (i) at least one metal complex selected from ?-diketonates, ?-ketoiminates, ?-diiminates, alkyl metal, metal carbonyl, alkyl metal carbonyl, aryl metal, aryl metal carbonyl, cyclopentadienyl metal, cyclopentadienyl metal isonitrile, cyclopentadienyl metal nitrile, cyclopentadienyl metal carbonyl, metal alkoxide, metal ether alkoxide, and metal amides wherein the ligand can be monodentate, bidentate and multidentate coordinating to the metal atom and the metal is selected from group 2 to 14 elements, and (ii) a solvent selected from organic amides including linear amides and cyclic amides for such metal source containing precursors.

Abstract: Partially and fully fluorinated alkyl substituted thienothiophene monomers (and polymers thereof) wherein the monomers are represented by the formula: wherein R is a partially or fully fluorinated primary, secondary or tertiary alkyl having from 1 to 8 carbon atoms; and X and X? are independently selected from the group consisting of H, F, Cl, Br, I, MgCl, MgBr, Mgl, Sn(R?)3, CH?CHR?, —OR?, —COOR?, —S—COR?, —B(OR?)2, —COR?, —C?CH, and a polymerizable cyclic pi-conjugated carbon-ring structure optionally comprising S, N or O heteroatoms; wherein R? is a primary, secondary or tertiary alkyl having from 1 to 6 carbon atoms, and R? is H or a primary, secondary or tertiary alkyl having from 1 to 6 carbon atoms.

Abstract: A compound having the structure: w-A-x-CY-Z(CF3), where CY is cyclohexane or substituted cyclohexane, exemplified by 4-trifluoromethyl-4-methylcarboxy-4?-propyl-1,1?-(bi)cyclohexane.

Abstract: A method for preparing a molecule bearing a trifluoromethyl group on a quaternary carbon atom, includes providing a reactant having a quaternary carbon atom bearing a carboxylic acid group and an electron withdrawing group; and reacting the reactant with SF4 in a solvent to substitute the carboxylic acid group with the trifluoromethyl group and provide a reaction product mixture including the molecule bearing the trifluoromethyl group on the quaternary carbon atom.

Abstract: Compositions containing surfactant compounds according to formula (I) R4OCH2CH(OH)CR2R3ZR1 ??(I) wherein Z is S, SO, or SO2, can have a range of equilibrium and/or dynamic surface tensions and a range of foaming performance attributes, depending upon the particular values of Z, R1, R2, R3, and R4. The compounds of formula (I) may be prepared by a process that includes reaction of a thiol with a glycidyl ether.

Abstract: A process for preparing bromo-1-oxypentafluorosulfanylbenzene is provided, the process including the step of brominating pentafluorosulfanyloxybenzene with a bromination agent to provide the bromo-1-oxypentafluorosulfanylbenzene. The process is more effective than prior art processes for preparing such compounds.

Abstract: Novel compositions are provided containing a compound represented by the formula YOSF5 or ZOSF5, where: (a) Y is: (i) an organic cation other than (Me2N)3S+ or (ii) an inorganic cation, provided that when Y is the inorganic cation, the composition further includes a complexing agent; and (b) Z is C1-20 alkyl, aryl, cycloalkyl, combinations thereof, or analogues thereof containing at least one heteroatom, provided that the compound represented by the formula ZOSF5 is a molecular compound. Processes of making the cationic compounds are disclosed as are processes for using the compositions containing cationic compounds in nucleophilic replacement reactions to prepare the compositions containing molecular compounds including the OSF5 group.

Abstract: A process for preparing bromo-1-oxypentafluorosulfanylbenzene is provided, the process including the step of brominating pentafluorosulfanyloxybenzene with a bromination agent to provide the bromo-1-oxypentafluorosulfanylbenzene. The process is more effective than prior art processes for preparing such compounds.

Abstract: Compositions containing surfactant compounds according to formula (I) ROCH2CH(OH)CR1R2ZCR1R2CH(OH)CH2OR,??(I) wherein Z is S, SO, or SO2, can have a range of equilibrium and/or dynamic surface tensions and a range of foaming performance attributes, depending upon the particular values of Z, R, R1, and R2. The compounds of formula (I) may be prepared by a process that includes reaction of a sulfide source such as a metal sulfide or bisulfide with an alkyl glycidyl ether. The compounds may be useful in any of a broad range of applications requiring the use of a surfactant.

Abstract: Compositions containing surfactant compounds according to formula (I) ROCH2CH(OH)CR1R2ZCR1R2CH(OH)CH2OR,??(I) wherein Z is S, SO, or SO2, can have a range of equilibrium and/or dynamic surface tensions and a range of foaming performance attributes, depending upon the particular values of Z, R, R1, and R2. The compounds of formula (I) may be prepared by a process that includes reaction of a sulfide source such as a metal sulfide or bisulfide with an alkyl glycidyl ether. The compounds may be useful in any of a broad range of applications requiring the use of a surfactant.

Abstract: This invention relates to 2-pentafluorosulfanylnapthalene, substituted derivatives thereof and to a process for producing naphthalene carrying an SF5 group. A 3-step process is employed wherein 1,4-dihydronaphthalene is reacted with pentafluorosulfanyl halide. Next the resulting 3-halo-2-pentafluorosulfanylnaphthalene or derivative is converted to 2-pentafluorosulfanyl-1,4-dihydronaphthalene or derivative by treatment with a base and subsequently transformed into pentafluorosulfanylnaphthalene by removing hydrogen atoms.

Abstract: Thienothiophene monomers having an SF5 group and conducting oligomers and polymers formed by the polymerization of such monomers and their use as hole injection materials, charge transport materials, or as semiconductors. The compound may be of the formula: where X and X? are independently H, halogen atoms (e.g., F, Cl, Br, and I), MgCl, MgBr, MgI, Sn(R?)3, where R? is C1-6 alkyl or —OC1-6 alkyl, boronic acid, boronic ester, —CH?CHR? (where R? is H or C1-6 alkyl), —OC1-6 alkyl, —COOC1-6 alkyl, —S—COR?? and —COR?? (where R?? is H or C1-6 alkyl), —C?CH, or polymerizable aromatic rings (such as phenyl, naphthalene, pyrrole, dithiophene, thienothiophene, thiophene and so forth.

Abstract: Compositions containing surfactant compounds according to formula (I) ROCH2CH(OH)CR1R2ZCR1R2CH(OH)CH2OR,??(I) wherein Z is S, SO, or SO2, can have a range of equilibrium and/or dynamic surface tensions and a range of foaming performance attributes, depending upon the particular values of Z, R, R1, and R2. The compounds of formula (I) may be prepared by a process that includes reaction of a sulfide source such as a metal sulfide or bisulfide with an alkyl glycidyl ether.