Abstract: A continuously electrically-conductive container contains an electrically-insulating support for holding an electric-field-sensitive article, such as a reticle, so that the article is shielded from external electric fields and is not in electrical contact with a conductive container wall. A SMIF pod comprises an electrically conductive container for holding an electric-field-sensitive article. A system has boundary walls that form a chamber for a controlled environment. The system includes a load port for receiving a SMIF pod and an end effector made of insulating material for moving a field-sensitive article within the chamber to and from the SMIF pod. An ionizer neutralizes electric charges on the field-sensitive article.

Abstract: A semiconductor reticle transportation container includes a box and a base, the box having an opening and the base including a reticle support. The reticle is placed on the support and the box is placed on the base so that the reticle passes through the opening while being lifted off of the support by plungers contacting the lower edge of the reticle. After the box is closed, the reticle is compliantly constrained horizontally and vertically and is held away from the support.

Abstract: A reticle includes an image area having one or more electrically conductive portions susceptible to damage by an electric field and an electric field sensor feature, the sensor feature adapted to be at least as susceptible to being altered by the electric field as the electrically conductive portions of the image area, the sensor feature being located in a position which is more readily viewable to show alteration than the electrically conductive portions of the image area.

Abstract: A semiconductor reticle transportation container includes a box and a base, the box having an opening and the base including a reticle support. The reticle is placed on the support and the box is placed on the base so that the reticle passes through the opening while being lifted off of the support by plungers contacting the lower edge of the reticle. After the box is closed, the reticle is compliantly constrained horizontally and vertically and is held away from the support.

Abstract: An illumination system for a microlithographic exposure apparatus comprises an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.

Abstract: An illumination system for a microlithographic exposure apparatus comprises an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.

Abstract: An illumination system for a microlithographic exposure apparatus comprises an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.

Abstract: An illumination system for a microlithographic exposure apparatus comprised of an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.

Abstract: An illumination system for a microlithographic exposure apparatus comprises an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.