Patents by Inventor Gayatri D. Keskar

Gayatri D. Keskar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8384372
    Abstract: A method and system is disclosed to detect and analyze an electric signal based on movement between an element and a counter electrode influenced by a nonlinear electric field produced by an electrical signal impressed between the element and counter electrode. Through detection of changes in the distance between the element and the counter electrode characteristics of the element and/or the environment of the element may be ascertained. Changes in the distance between the element and the counter electrode may be monitored based on changes in the value of capacitance between the element and counter electrode. The disclosed devices and methods may be employed to detect, for instance, presence of chemical/biological species in a sample or measure physical parameters of a sample such as pressure/acceleration, density, viscosity, magnetic force, temperature, and/or extremely small masses.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: February 26, 2013
    Assignee: Clemson University
    Inventors: Herbert W. Behlow, Jr., Bevan C. Elliott, Gayatri D. Keskar, Doyl E. Dickel, Malcolm J. Skove, Apparao M. Rao
  • Patent number: 7754183
    Abstract: The present invention discloses a relatively simple CVD method for forming specifically tailored carbon-based nanostructures. In general, the method is a chemical vapor deposition method in which at least a portion of the precursor materials are provided as a liquid at atmospheric conditions. The precursor materials include at least one carbon source and at least one catalyst source. Optionally, the precursor materials can also include one or more dopant sources. The carbon source and the optional dopant source can be injected as liquids into the system, and the liquid catalyst source can be either injected into the system or located on a substrate in the reactor prior to the process. Very high yield of nanostructures exhibiting particular characteristics can be attained by the process.
    Type: Grant
    Filed: May 20, 2005
    Date of Patent: July 13, 2010
    Assignee: Clemson University Research Foundation
    Inventors: Gayatri D. Keskar, Wei Wang, Apparao M. Rao
  • Publication number: 20100015033
    Abstract: The present invention discloses a relatively simple CVD method for forming specifically tailored carbon-based nanostructures. In general, the method is a chemical vapor deposition method in which at least a portion of the precursor materials are provided as a liquid at atmospheric conditions. The precursor materials include at least one carbon source and at least one catalyst source. Optionally, the precursor materials can also include one or more dopant sources. The carbon source and the optional dopant source can be injected as liquids into the system, and the liquid catalyst source can be either injected into the system or located on a substrate in the reactor prior to the process. Very high yield of nanostructures exhibiting particular characteristics can be attained by the process.
    Type: Application
    Filed: May 20, 2005
    Publication date: January 21, 2010
    Inventors: Gayatri D. Keskar, Wei Wang, Apparao M. Rao