Abstract: A method of manufacturing a semiconductor device suitable for surface mounting whereby semiconductor elements are interconnected into a coherent row of semiconductor elements by means of conductive strips such that a connection point of a certain semiconductor element is connected to a connection point of a semiconductor element preceding it in the row by means of a strip, and another connection point of said certain semiconductor element is connected to a connection point of a semiconductor element following it in the row, and the row of semiconductor elements is enveloped in a protective material, and the semiconductor elements are mutually separated into individual semiconductor devices provided with two side faces, each side face having a portion of the strip which is processed into a connection conductor in that an electrically conducting layer is provided on the side faces contacting said portion of the strip.

Abstract: The invention relates to a method of manufacturing semiconductor devices in which a slice of semiconductor material is provided with a pn junction aligned parallel to the main surfaces of the slice. After the pn junctions is provided, depressions are provided in one main surface. These depressions cut through the pn junction, thereby dividing the main pn junction into mutually insulated pn junction portions. Before the slice is split up into separate semiconductor bodies, a layer of insulating material is provided. This method of manufacturing semiconductor devices allows for a simple application of the insulating layer to the walls of the depressions.

Abstract: A method of manufacturing semiconductor devices with a passivated semiconductor body (1) provided with an electrode (2) and fastened on an electrically conducting support body (3), in which method a slice of semiconductor material (5) is fastened on a surface (6) of an electrically conducting auxiliary slice (7), and mesa structures (8) are formed in the slice of semiconductor material (5) by the application of grooves (9) in the slice of semiconductor material (5) subsequently, a layer of insulating material (10) is provided on the walls of the grooves (9), electrodes (2) are provided on upper sides (11) of the mesa structures (8), and the auxiliary slice (7) with the mesa structures (8) is split up at the areas of the grooves (9) into individual semiconductor bodies (1) each fastened on its own support body (3).