Patents by Inventor Gek Soon Chua
Gek Soon Chua has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9673111Abstract: Methods for extreme ultraviolet (EUV) mask defect mitigation by using multi-patterning lithography techniques. In one exemplary embodiment, a method for fabricating an integrated circuit including identifying a position of a defect in a first EUV photolithographic mask, the photolithographic mask including a desired pattern and transferring the desired pattern to a photoresist material disposed on a semiconductor substrate. Transferring the desired pattern further transfers an error pattern feature to the photoresist material as a result of the defect in the first EUV photolithographic mask. The method further includes, using a second photolithographic mask, transferring a trim pattern to the photoresist material, wherein the trim pattern removes the error pattern feature from the photoresist material.Type: GrantFiled: February 3, 2016Date of Patent: June 6, 2017Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.Inventors: Gek Soon Chua, Tan Soon Yoeng
-
Patent number: 9395621Abstract: A pellicle is provided for use with a lithographic photomask during manufacture of semiconductor devices, printed circuit boards, liquid crystal displays, etc. The pellicle has a pellicle frame comprising four pellicle walls that define a trapezoidal area sized and shaped to correspond to a pattern area of a lithographic photomask; and a pellicle film extending across the trapezoidal area and affixed to a film-side edge of the pellicle frame; wherein any one of the four pellicle walls has a vent hole therethrough, the vent hole being located proximate a corner of the frame and if matter passes through the vent hole, the foreign matter will not obstruct the pattern area during use of the lithographic photomask.Type: GrantFiled: November 17, 2014Date of Patent: July 19, 2016Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.Inventors: Gek Soon Chua, Soon Yoeng Tan, Ngar Chen Stella Lau, Sia Kim Tan
-
Publication number: 20160148848Abstract: Methods for extreme ultraviolet (EUV) mask defect mitigation by using multi-patterning lithography techniques. In one exemplary embodiment, a method for fabricating an integrated circuit including identifying a position of a defect in a first EUV photolithographic mask, the photolithographic mask including a desired pattern and transferring the desired pattern to a photoresist material disposed on a semiconductor substrate. Transferring the desired pattern further transfers an error pattern feature to the photoresist material as a result of the defect in the first EUV photolithographic mask. The method further includes, using a second photolithographic mask, transferring a trim pattern to the photoresist material, wherein the trim pattern removes the error pattern feature from the photoresist material.Type: ApplicationFiled: February 3, 2016Publication date: May 26, 2016Inventors: Gek Soon Chua, Tan Soon Yoeng
-
Publication number: 20160139502Abstract: A pellicle is provided for use with a lithographic photomask during manufacture of semiconductor devices, printed circuit boards, liquid crystal displays, etc. The pellicle has a pellicle frame comprising four pellicle walls that define a trapezoidal area sized and shaped to correspond to a pattern area of a lithographic photomask; and a pellicle film extending across the trapezoidal area and affixed to a film-side edge of the pellicle frame; wherein any one of the four pellicle walls has a vent hole therethrough, the vent hole being located proximate a corner of the frame and if matter passes through the vent hole, the foreign matter will not obstruct the pattern area during use of the lithographic photomask.Type: ApplicationFiled: November 17, 2014Publication date: May 19, 2016Inventors: Gek Soon Chua, Soon Yoeng Tan, Ngar Chen Stella Lau, Sia Kim Tan
-
Patent number: 9286435Abstract: System and methods for OPC model accuracy and disposition using quad matrix are presented. A method includes obtaining wafer data from a calibration test pattern. The method also classifies the wafer data into four quadrants of a quad matrix. The method further utilizes at least one of the four quadrants to quantify OPC model accuracy.Type: GrantFiled: June 4, 2015Date of Patent: March 15, 2016Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.Inventors: Yong Wah Jacky Cheng, Andrew Ker Ching Khoh, Yee Mei Foong, Gek Soon Chua
-
Patent number: 9257277Abstract: Methods for extreme ultraviolet (EUV) mask defect mitigation by using multi-patterning lithography techniques. In one exemplary embodiment, a method for fabricating an integrated circuit including identifying a position of a defect in a first EUV photolithographic mask, the photolithographic mask including a desired pattern and transferring the desired pattern to a photoresist material disposed on a semiconductor substrate. Transferring the desired pattern further transfers an error pattern feature to the photoresist material as a result of the defect in the first EUV photolithographic mask. The method further includes, using a second photolithographic mask, transferring a trim pattern to the photoresist material, wherein the trim pattern removes the error pattern feature from the photoresist material.Type: GrantFiled: April 15, 2014Date of Patent: February 9, 2016Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.Inventors: Gek Soon Chua, Tan Soon Yoeng
-
Publication number: 20150294858Abstract: Methods for extreme ultraviolet (EUV) mask defect mitigation by using multi-patterning lithography techniques. In one exemplary embodiment, a method for fabricating an integrated circuit including identifying a position of a defect in a first EUV photolithographic mask, the photolithographic mask including a desired pattern and transferring the desired pattern to a photoresist material disposed on a semiconductor substrate. Transferring the desired pattern further transfers an error pattern feature to the photoresist material as a result of the defect in the first EUV photolithographic mask. The method further includes, using a second photolithographic mask, transferring a trim pattern to the photoresist material, wherein the trim pattern removes the error pattern feature from the photoresist material.Type: ApplicationFiled: April 15, 2014Publication date: October 15, 2015Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.Inventors: Gek Soon Chua, Tan Soon Yoeng
-
Publication number: 20150269306Abstract: System and methods for OPC model accuracy and disposition using quad matrix are presented. A method includes obtaining wafer data from a calibration test pattern. The method also classifies the wafer data into four quadrants of a quad matrix. The method further utilizes at least one of the four quadrants to quantify OPC model accuracy.Type: ApplicationFiled: June 4, 2015Publication date: September 24, 2015Inventors: Yong Wah Jacky CHENG, Andrew Ker Ching KHOH, Yee Mei FOONG, Gek Soon CHUA
-
Patent number: 9122160Abstract: An approach is provided for enabling simulation of photomask contour shapes, performing verification on the simulated photomask shapes, and correcting errors in OPC correction or bad fracturing methods to perform photomask proximity correction in real time before physically writing of the photomask. Embodiments include performing optical proximity correction of a photomask of a semiconductor layout to generate a corrected photomask, simulating the corrected photomask to generate one or more simulated contour shapes within a simulated photomask, verifying the simulated contour shapes to determine errors associated with the simulated photomask, and correcting the errors in the simulated contour shapes of the simulated photomask to generate a final photomask.Type: GrantFiled: March 15, 2013Date of Patent: September 1, 2015Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.Inventors: Gek Soon Chua, Yi Zou, Wei-Long Wang, Byoung Il Choi
-
Publication number: 20150186577Abstract: System and methods for OPC model accuracy and disposition using quad matrix are presented. A method includes obtaining wafer data from a calibration test pattern. The method also classifies the wafer data into four quadrants of a quad matrix. The method further utilizes at least one of the four quadrants to quantify OPC model accuracy.Type: ApplicationFiled: December 30, 2013Publication date: July 2, 2015Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.Inventors: Yong Wah Jacky CHENG, Andrew Ker Ching KHOH, Yee Mei FOONG, Gek Soon CHUA
-
Patent number: 9053269Abstract: System and methods for OPC model accuracy and disposition using quad matrix are presented. A method includes obtaining wafer data from a calibration test pattern. The method also classifies the wafer data into four quadrants of a quad matrix. The method further utilizes at least one of the four quadrants to quantify OPC model accuracy.Type: GrantFiled: December 30, 2013Date of Patent: June 9, 2015Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.Inventors: Yong Wah Jacky Cheng, Andrew Ker Ching Khoh, Yee Mei Foong, Gek Soon Chua
-
Patent number: 8898597Abstract: An approach for methodology, and an associated apparatus, enabling a simulation process to check integrity of the design and predict a manufacturability of a resulting circuit that accounts for process latitude without a long turnaround time and/or a highly skilled engineer is disclosed. Embodiments include: determining first and second features of an IC design; determining a thickness of a resist layer of the IC design based on an aerial image of the IC design; determining a threshold value according to the thickness; and comparing the threshold value to a separation distance between the first and second features.Type: GrantFiled: March 15, 2013Date of Patent: November 25, 2014Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.Inventors: Qing Yang, Shyue Fong Quek, Gek Soon Chua, Yee Mei Foong, Dong Qing Zhang, Yun Tang
-
Publication number: 20140282286Abstract: An approach for methodology, and an associated apparatus, enabling a simulation process to check integrity of the design and predict a manufacturability of a resulting circuit that accounts for process latitude without a long turnaround time and/or a highly skilled engineer is disclosed. Embodiments include: determining first and second features of an IC design; determining a thickness of a resist layer of the IC design based on an aerial image of the IC design; determining a threshold value according to the thickness; and comparing the threshold value to a separation distance between the first and second features.Type: ApplicationFiled: March 15, 2013Publication date: September 18, 2014Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.Inventors: Qing YANG, Shyue Fong Quek, Gek Soon Chua, Yee Mei Foong, Dong Qing Zhang, Yun Tang
-
Publication number: 20140282299Abstract: An approach is provided for enabling simulation of photomask contour shapes, performing verification on the simulated photomask shapes, and correcting errors in OPC correction or bad fracturing methods to perform photomask proximity correction in real time before physically writing of the photomask. Embodiments include performing optical proximity correction of a photomask of a semiconductor layout to generate a corrected photomask, simulating the corrected photomask to generate one or more simulated contour shapes within a simulated photomask, verifying the simulated contour shapes to determine errors associated with the simulated photomask, and correcting the errors in the simulated contour shapes of the simulated photomask to generate a final photomask.Type: ApplicationFiled: March 15, 2013Publication date: September 18, 2014Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.Inventors: Gek Soon CHUA, Yi Zou, Wei-Long Wang, Byoung IL Choi
-
Patent number: 8450046Abstract: A method for fabricating a semiconductor device that includes: providing a substrate prepared with a photoresist layer; providing a photomask comprising a first and a second pattern having a respective first and second pitch range; providing a composite aperture comprising a first and a second off-axis illumination aperture pattern, the first off-axis aperture pattern having a configuration that improves the process window of the first pitch range and the second off-axis aperture pattern having a configuration that improves the process window for a second pitch range; exposing the photoresist layer on the substrate with radiation from an exposure source through the composite aperture and the photomask; and developing the photoresist layer to pattern the photoresist layer.Type: GrantFiled: February 24, 2009Date of Patent: May 28, 2013Assignees: GLOBALFOUNDRIES Singapore Pte. Ltd., National University of SingaporeInventors: Moh Lung Ling, Gek Soon Chua, Qunying Lin, Cho Jui Tay, Chenggen Quan
-
Patent number: 8413083Abstract: A method of manufacture of a mask system includes: providing design data; generating a substantially circular optical proximity correction target from the design data; biasing a segment of the substantially circular optical proximity correction target; and generating mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target.Type: GrantFiled: May 13, 2009Date of Patent: April 2, 2013Assignee: Globalfoundries Singapore Pte. Ltd.Inventors: Sia Kim Tan, Gek Soon Chua, Kwee Liang Martin Yeo, Ryan Khoon Khye Chong, Moh Lung Ling
-
Patent number: 8034543Abstract: A method for forming a semiconductor device is presented. The method includes providing a substrate having a photoresist thereon and transmitting a light source through a mask having a pattern onto the photoresist. The mask comprises a mask substrate having first, second and third regions, the third region is disposed between the first and second regions. The mask also includes a light reducing layer over the mask substrate having a first opening over the first region and a second opening over the second region. The first and second openings have layer sidewalls. The sidewalls of the light reducing layer are slanted at an angle less than 90 degrees from the plane of a top surface of the mask substrate. The method also includes developing the photoresist to transfer the pattern of the mask to the photoresist.Type: GrantFiled: January 29, 2010Date of Patent: October 11, 2011Assignee: GLOBAL FOUNDRIES Singapore Pte. Ltd.Inventors: Gek Soon Chua, Sia Kim Tan, Qunying Lin, Cho Jui Tay, Chenggen Quan
-
Patent number: 7923180Abstract: A method of fabricating a device is presented. The method includes forming a mask that includes multiple images. A substrate is patterned using the mask. An image of the multiple images corresponds to a respective patterning process. The substrate is processed further to complete the processing of the substrate to form the desired function of the device.Type: GrantFiled: February 11, 2009Date of Patent: April 12, 2011Assignee: Chartered Semiconductor Manufacturing, Ltd.Inventors: Sia Kim Tan, Guoxiang Ning, Gek Soon Chua, Soon Yoeng Tan, Byoung Il Choi, Jason Phua
-
Patent number: 7866224Abstract: Apparatus is provided for determining presence of contamination on a lithography mask, including: a fluid trap having a base and at least one wall member extending substantially perpendicularly to the base for trapping fluid on a portion of the base when fluid introduced during a cleaning process of the mask is removed.Type: GrantFiled: November 30, 2006Date of Patent: January 11, 2011Assignee: Chartered Semiconductor Manufacturing Ltd.Inventors: Sia Kim Tan, Gek Soon Chua, Qun Ying Lin, Martin Yeo
-
Patent number: 7867698Abstract: A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by grouping and pairing each of the image pattern onto the reticle system according to a multi-layer reticle grouping/pairing flow.Type: GrantFiled: May 19, 2008Date of Patent: January 11, 2011Assignee: Chartered Semiconductor Manufacturing Ltd.Inventors: Gek Soon Chua, Sia Kim Tan, Byoung-IL Choi, Ryan Chong, Martin Yeo