Patents by Inventor Gen Fujii
Gen Fujii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11464762Abstract: A carcinogenesis inhibitor having no side effect and having an excellent effect by oral administration. A carcinogenesis inhibitor containing a hydantoin derivative or a pharmaceutically acceptable salt thereof as an active ingredient shows an inhibiting action for polyp formation and for cell proliferation, and has no side effect and highly safe whereby it is very highly useful as a pharmaceutical agent and a food such as supplement which prevent the occurrence and progress of cancer, inhibits the recurrence and metastasis of cancer and further achieves the therapeutic effect.Type: GrantFiled: June 12, 2018Date of Patent: October 11, 2022Assignees: NATIONAL CANCER CENTER, NIPPON ZOKI PHARMACEUTICAL CO., LTD.Inventors: Michihiro Mutoh, Yurie Kurokawa, Gen Fujii, Shingo Miyamoto
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Patent number: 10818703Abstract: A method for manufacturing a semiconductor device includes: forming a photocatalytic layer and an organic compound layer in contact with the photocatalytic layer over a substrate having a light transmitting property; forming an element forming layer over the substrate having the light transmitting property with the photocatalytic layer and the organic compound layer in contact with the photocatalytic layer interposed therebetween; and separating the element forming layer from the substrate having the light transmitting property after the photocatalytic layer is irradiated with light through the substrate having the light transmitting property.Type: GrantFiled: July 20, 2016Date of Patent: October 27, 2020Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Masafumi Morisue, Yasuhiro Jinbo, Gen Fujii, Hajime Kimura
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Publication number: 20200276163Abstract: A carcinogenesis inhibitor having no side effect and having an excellent effect by oral administration. A carcinogenesis inhibitor containing a hydantoin derivative or a pharmaceutically acceptable salt thereof as an active ingredient shows an inhibiting action for polyp formation and for cell proliferation, and has no side effect and highly safe whereby it is very highly useful as a pharmaceutical agent and a food such as supplement which prevent the occurrence and progress of cancer, inhibits the recurrence and metastasis of cancer and further achieves the therapeutic effect.Type: ApplicationFiled: June 12, 2018Publication date: September 3, 2020Applicants: NATIONAL CANCER CENTER, NIPPON ZOKI PHARMACEUTICAL CO., LTD.Inventors: Michihiro MUTOH, Yurie KUROKAWA, Gen FUJII, Shingo MIYAMOTO
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Patent number: 10629813Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesives of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.Type: GrantFiled: September 11, 2018Date of Patent: April 21, 2020Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Osamu Nakamura, Gen Fujii, Fuminori Tateishi
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Publication number: 20190027688Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesives of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.Type: ApplicationFiled: September 11, 2018Publication date: January 24, 2019Inventors: Osamu NAKAMURA, Gen FUJII, Fuminori TATEISHI
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Patent number: 10153434Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.Type: GrantFiled: October 13, 2017Date of Patent: December 11, 2018Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Osamu Nakamura, Gen Fujii, Fuminori Tateishi
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Publication number: 20180053895Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.Type: ApplicationFiled: October 13, 2017Publication date: February 22, 2018Inventors: Osamu NAKAMURA, Gen FUJII, Fuminori TATEISHI
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Patent number: 9793482Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.Type: GrantFiled: September 29, 2016Date of Patent: October 17, 2017Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.Inventors: Osamu Nakamura, Gen Fujii, Fuminori Tateishi
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Patent number: 9620714Abstract: Oxidation treatment is performed to the surface of a substrate provided with a photocatalytic conductive film and an insulating film; treatment with a silane coupling agent is performed, so that a silane coupling agent film is formed and the surface of the substrate is modified to be liquid-repellent; and the surface of the substrate is irradiated with light of a wavelength (less than to equal to 390 nm) which has energy of greater than or equal to a band gap of a material for forming the photocatalytic conductive film, so that only the silane coupling agent film over the surface of the photocatalytic conductive film is decomposed and the surface of the photocatalytic conductive film can be modified to be lyophilic.Type: GrantFiled: August 19, 2011Date of Patent: April 11, 2017Assignee: Semiconductor Energy Laboratory Co., LTD.Inventors: Gen Fujii, Erika Takahashi
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Publication number: 20170018713Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.Type: ApplicationFiled: September 29, 2016Publication date: January 19, 2017Inventors: Osamu NAKAMURA, Gen FUJII, Fuminori TATEISHI
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Publication number: 20160329531Abstract: A method for manufacturing a semiconductor device includes: forming a photocatalytic layer and an organic compound layer in contact with the photocatalytic layer over a substrate having a light transmitting property; forming an element forming layer over the substrate having the light transmitting property with the photocatalytic layer and the organic compound layer in contact with the photocatalytic layer interposed therebetween; and separating the element forming layer from the substrate having the light transmitting property after the photocatalytic layer is irradiated with light through the substrate having the light transmitting property.Type: ApplicationFiled: July 20, 2016Publication date: November 10, 2016Inventors: Masafumi MORISUE, Yasuhiro JINBO, Gen FUJII, Hajime KIMURA
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Patent number: 9461076Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.Type: GrantFiled: January 20, 2016Date of Patent: October 4, 2016Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Osamu Nakamura, Gen Fujii, Fuminori Tateishi
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Patent number: 9419142Abstract: A method for manufacturing a semiconductor device includes: forming a photocatalytic layer and an organic compound layer in contact with the photocatalytic layer over a substrate having a light transmitting property; forming an element forming layer over the substrate having the light transmitting property with the photocatalytic layer and the organic compound layer in contact with the photocatalytic layer interposed therebetween; and separating the element forming layer from the substrate having the light transmitting property after the photocatalytic layer is irradiated with light through the substrate having the light transmitting property.Type: GrantFiled: March 27, 2012Date of Patent: August 16, 2016Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Masafumi Morisue, Yasuhiro Jinbo, Gen Fujii, Hajime Kimura
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Publication number: 20160133654Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.Type: ApplicationFiled: January 20, 2016Publication date: May 12, 2016Inventors: Osamu Nakamura, Gen Fujii, Fuminori Tateishi
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Patent number: 9245922Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.Type: GrantFiled: August 26, 2013Date of Patent: January 26, 2016Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Osamu Nakamura, Gen Fujii, Fuminori Tateishi
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Patent number: 8847482Abstract: To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.Type: GrantFiled: December 21, 2011Date of Patent: September 30, 2014Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Gen Fujii, Erika Takahashi, Erumu Kikuchi, Sachiko Kawakami
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Patent number: 8742421Abstract: An object of the present invention is to provide a display device which can be manufactured with usability of a material improved and with a manufacturing step simplified and to provide a manufacturing technique thereof. One feature of a display device of the present invention is to comprise an insulating layer having an opening, a first conductive layer formed in the opening, and a second conductive layer formed over the insulating layer and the first conductive layer, wherein the first conductive layer is wider and thicker than the second conductive layer, and the second conductive layer is formed by spraying a droplet including a conductive material.Type: GrantFiled: November 29, 2004Date of Patent: June 3, 2014Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei Yamazaki, Hideaki Kuwabara, Shinji Maekawa, Gen Fujii, Toshiyuki Isa
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Patent number: 8624252Abstract: The invention provides a manufacturing method of a substrate having a film pattern including an insulating film, a semiconductor film, a conductive film and the like by simple steps, and also a manufacturing method of a semiconductor device which is low in cost with high throughput and yield. According to the invention, after forming a first protective film which has low wettability on a substrate, a material which has high wettability is applied or discharged on an outer edge of a first mask pattern, thereby a film pattern and a substrate having the film pattern are formed.Type: GrantFiled: September 12, 2012Date of Patent: January 7, 2014Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shinji Maekawa, Gen Fujii, Hiroko Shiroguchi, Masafumi Morisue
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Publication number: 20130341630Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.Type: ApplicationFiled: August 26, 2013Publication date: December 26, 2013Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.Inventors: Osamu NAKAMURA, Gen FUJII, Fuminori TATEISHI
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Patent number: 8558227Abstract: The manufacturing method of the present invention includes steps of selectively forming a photocatalyst material or a material including an amino group by discharging a composition including the photocatalyst material or the material including an amino group; immersing the photocatalyst material or the material including an amino group in a solution including a plating catalyst material so as to adsorb or deposit the plating catalyst material onto the photocatalyst material or the material including an amino group; and immersing the plating catalyst material in a plating solution including a metal material so as to form a metal film on a surface of the photocatalyst material or the material including an amino group adsorbing or depositing the plating catalyst material, thereby manufacturing a semiconductor device. The pH of the solution including the plating catalyst material is adjusted in a range of 3 to 6.Type: GrantFiled: August 6, 2012Date of Patent: October 15, 2013Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventor: Gen Fujii